JPS59202632A - フオトマスク - Google Patents

フオトマスク

Info

Publication number
JPS59202632A
JPS59202632A JP58076772A JP7677283A JPS59202632A JP S59202632 A JPS59202632 A JP S59202632A JP 58076772 A JP58076772 A JP 58076772A JP 7677283 A JP7677283 A JP 7677283A JP S59202632 A JPS59202632 A JP S59202632A
Authority
JP
Japan
Prior art keywords
pattern
size
photomask
resolved
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58076772A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320013B2 (enExample
Inventor
Takayuki Konuma
小沼　孝行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP58076772A priority Critical patent/JPS59202632A/ja
Publication of JPS59202632A publication Critical patent/JPS59202632A/ja
Publication of JPS6320013B2 publication Critical patent/JPS6320013B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58076772A 1983-04-30 1983-04-30 フオトマスク Granted JPS59202632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Publications (2)

Publication Number Publication Date
JPS59202632A true JPS59202632A (ja) 1984-11-16
JPS6320013B2 JPS6320013B2 (enExample) 1988-04-26

Family

ID=13614872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076772A Granted JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Country Status (1)

Country Link
JP (1) JPS59202632A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
JPH04330710A (ja) * 1990-03-12 1992-11-18 Fujitsu Ltd レーザトリミング用位置合わせマーク、半導体装置、及び半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
JPH04330710A (ja) * 1990-03-12 1992-11-18 Fujitsu Ltd レーザトリミング用位置合わせマーク、半導体装置、及び半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6320013B2 (enExample) 1988-04-26

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