JPS6318734B2 - - Google Patents

Info

Publication number
JPS6318734B2
JPS6318734B2 JP11537180A JP11537180A JPS6318734B2 JP S6318734 B2 JPS6318734 B2 JP S6318734B2 JP 11537180 A JP11537180 A JP 11537180A JP 11537180 A JP11537180 A JP 11537180A JP S6318734 B2 JPS6318734 B2 JP S6318734B2
Authority
JP
Japan
Prior art keywords
opening
cassette
reticle
closing member
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11537180A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5739537A (en
Inventor
Nobutoshi Abe
Yukio Kakizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP11537180A priority Critical patent/JPS5739537A/ja
Publication of JPS5739537A publication Critical patent/JPS5739537A/ja
Publication of JPS6318734B2 publication Critical patent/JPS6318734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11537180A 1980-08-22 1980-08-22 Dust-proof cassette for photo-masking or reticule Granted JPS5739537A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11537180A JPS5739537A (en) 1980-08-22 1980-08-22 Dust-proof cassette for photo-masking or reticule

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11537180A JPS5739537A (en) 1980-08-22 1980-08-22 Dust-proof cassette for photo-masking or reticule

Publications (2)

Publication Number Publication Date
JPS5739537A JPS5739537A (en) 1982-03-04
JPS6318734B2 true JPS6318734B2 (cg-RX-API-DMAC7.html) 1988-04-20

Family

ID=14660866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11537180A Granted JPS5739537A (en) 1980-08-22 1980-08-22 Dust-proof cassette for photo-masking or reticule

Country Status (1)

Country Link
JP (1) JPS5739537A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6067947A (ja) * 1983-09-22 1985-04-18 Fuotopori Ouka Kk 製版における露光方法及び露光装置
JPH061372B2 (ja) * 1984-05-23 1994-01-05 株式会社ニコン 基板の収納ケース、及び該収納ケースの装着装置
JP2796131B2 (ja) * 1989-06-29 1998-09-10 沖電気工業株式会社 ホトマスクケース及びホトマスクの保管方法
US5594236A (en) * 1993-12-14 1997-01-14 Nippondenso Co., Ltd. Sunlight sensor

Also Published As

Publication number Publication date
JPS5739537A (en) 1982-03-04

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