JPS6318341B2 - - Google Patents

Info

Publication number
JPS6318341B2
JPS6318341B2 JP58215322A JP21532283A JPS6318341B2 JP S6318341 B2 JPS6318341 B2 JP S6318341B2 JP 58215322 A JP58215322 A JP 58215322A JP 21532283 A JP21532283 A JP 21532283A JP S6318341 B2 JPS6318341 B2 JP S6318341B2
Authority
JP
Japan
Prior art keywords
scribe line
array
base material
image sensor
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58215322A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60106167A (ja
Inventor
Hideo Saeki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP58215322A priority Critical patent/JPS60106167A/ja
Publication of JPS60106167A publication Critical patent/JPS60106167A/ja
Publication of JPS6318341B2 publication Critical patent/JPS6318341B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP58215322A 1983-11-14 1983-11-14 カラ−イメ−ジセンサの製造方法 Granted JPS60106167A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58215322A JPS60106167A (ja) 1983-11-14 1983-11-14 カラ−イメ−ジセンサの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58215322A JPS60106167A (ja) 1983-11-14 1983-11-14 カラ−イメ−ジセンサの製造方法

Publications (2)

Publication Number Publication Date
JPS60106167A JPS60106167A (ja) 1985-06-11
JPS6318341B2 true JPS6318341B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-04-18

Family

ID=16670383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58215322A Granted JPS60106167A (ja) 1983-11-14 1983-11-14 カラ−イメ−ジセンサの製造方法

Country Status (1)

Country Link
JP (1) JPS60106167A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62299070A (ja) * 1986-06-18 1987-12-26 Matsushita Electronics Corp カラ−固体撮像装置の製造方法
JP2605312B2 (ja) * 1987-11-28 1997-04-30 凸版印刷株式会社 カラー固体撮像素子表面の平担化方法
JPH0294475A (ja) * 1988-09-29 1990-04-05 Mitsubishi Electric Corp カラーフィルタの製造方法
KR100489351B1 (ko) * 1998-12-30 2005-08-03 매그나칩 반도체 유한회사 평탄화 공정이 적용된 보호막을 갖는 이미지센서 제조방법
KR100902597B1 (ko) 2007-10-04 2009-06-11 주식회사 동부하이텍 씨모스 이미지 센서 제조 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120183A (en) * 1979-03-09 1980-09-16 Dainippon Printing Co Ltd Color solid image pickup element board and method of fabricating the same

Also Published As

Publication number Publication date
JPS60106167A (ja) 1985-06-11

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