JPS6316901B2 - - Google Patents
Info
- Publication number
- JPS6316901B2 JPS6316901B2 JP57155917A JP15591782A JPS6316901B2 JP S6316901 B2 JPS6316901 B2 JP S6316901B2 JP 57155917 A JP57155917 A JP 57155917A JP 15591782 A JP15591782 A JP 15591782A JP S6316901 B2 JPS6316901 B2 JP S6316901B2
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- hydrogen peroxide
- ammonia
- solenoid valve
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P72/0416—
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57155917A JPS5946032A (ja) | 1982-09-09 | 1982-09-09 | 洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57155917A JPS5946032A (ja) | 1982-09-09 | 1982-09-09 | 洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5946032A JPS5946032A (ja) | 1984-03-15 |
| JPS6316901B2 true JPS6316901B2 (OSRAM) | 1988-04-11 |
Family
ID=15616331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57155917A Granted JPS5946032A (ja) | 1982-09-09 | 1982-09-09 | 洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5946032A (OSRAM) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02722U (OSRAM) * | 1988-06-10 | 1990-01-05 | ||
| JP2807069B2 (ja) * | 1990-08-14 | 1998-09-30 | 川崎製鉄株式会社 | 半導体装置の製造方法 |
| US5275184A (en) * | 1990-10-19 | 1994-01-04 | Dainippon Screen Mfg. Co., Ltd. | Apparatus and system for treating surface of a wafer by dipping the same in a treatment solution and a gate device for chemical agent used in the apparatus and the system |
| JP3146841B2 (ja) * | 1994-03-28 | 2001-03-19 | 信越半導体株式会社 | ウエーハのリンス装置 |
| US5472516A (en) * | 1994-04-15 | 1995-12-05 | At&T Corp. | Process and apparatus for semiconductor device fabrication |
| JP4590700B2 (ja) | 2000-07-14 | 2010-12-01 | ソニー株式会社 | 基板洗浄方法及び基板洗浄装置 |
| WO2023034320A1 (en) * | 2021-09-01 | 2023-03-09 | Cardioquip, Llc | System and method for in-line optical sensing of hydrogen peroxide |
-
1982
- 1982-09-09 JP JP57155917A patent/JPS5946032A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5946032A (ja) | 1984-03-15 |
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