JPS63153530U - - Google Patents
Info
- Publication number
- JPS63153530U JPS63153530U JP4729487U JP4729487U JPS63153530U JP S63153530 U JPS63153530 U JP S63153530U JP 4729487 U JP4729487 U JP 4729487U JP 4729487 U JP4729487 U JP 4729487U JP S63153530 U JPS63153530 U JP S63153530U
- Authority
- JP
- Japan
- Prior art keywords
- tank
- cleaning
- ultrasonic waves
- wafers
- multiple wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 8
- 230000007246 mechanism Effects 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本考案の第１の実施例の洗浄槽の縦断
面図、第２図は第２の実施例の洗浄槽の縦断面図
である。 １，３，４……超音波発生機構、２……ウエハ
ー、５……洗浄槽。
面図、第２図は第２の実施例の洗浄槽の縦断面図
である。 １，３，４……超音波発生機構、２……ウエハ
ー、５……洗浄槽。
Claims (1)
- 洗浄槽内に複数枚のウエハーを収容し、槽内の
洗浄液中に超音波を照射し、発生させたキヤビテ
ーシヨンにより複数のウエハーを同時に処理する
半導体装置製造用ウエハー洗浄装置において、ウ
エハーに対する超音波の照射方向を異ならせた複
数台の超音波発生機構を洗浄槽に装備したことを
特徴とする半導体装置製造用ウエハー洗浄装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4729487U JPS63153530U (ja) | 1987-03-30 | 1987-03-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4729487U JPS63153530U (ja) | 1987-03-30 | 1987-03-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63153530U true JPS63153530U (ja) | 1988-10-07 |
Family
ID=30867765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4729487U Pending JPS63153530U (ja) | 1987-03-30 | 1987-03-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63153530U (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0232525A (ja) * | 1988-07-21 | 1990-02-02 | Toshiba Corp | 超音波洗浄装置 |
-
1987
- 1987-03-30 JP JP4729487U patent/JPS63153530U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0232525A (ja) * | 1988-07-21 | 1990-02-02 | Toshiba Corp | 超音波洗浄装置 |