JPS63152603A - 光硬化可能な樹脂組成物 - Google Patents

光硬化可能な樹脂組成物

Info

Publication number
JPS63152603A
JPS63152603A JP29884886A JP29884886A JPS63152603A JP S63152603 A JPS63152603 A JP S63152603A JP 29884886 A JP29884886 A JP 29884886A JP 29884886 A JP29884886 A JP 29884886A JP S63152603 A JPS63152603 A JP S63152603A
Authority
JP
Japan
Prior art keywords
meth
white
polymer
acrylate
oligomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29884886A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0580921B2 (enrdf_load_stackoverflow
Inventor
Eiichiro Takiyama
栄一郎 滝山
Katsuhisa Morita
森田 勝久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Highpolymer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Highpolymer Co Ltd filed Critical Showa Highpolymer Co Ltd
Priority to JP29884886A priority Critical patent/JPS63152603A/ja
Publication of JPS63152603A publication Critical patent/JPS63152603A/ja
Publication of JPH0580921B2 publication Critical patent/JPH0580921B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
JP29884886A 1986-12-17 1986-12-17 光硬化可能な樹脂組成物 Granted JPS63152603A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29884886A JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29884886A JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Publications (2)

Publication Number Publication Date
JPS63152603A true JPS63152603A (ja) 1988-06-25
JPH0580921B2 JPH0580921B2 (enrdf_load_stackoverflow) 1993-11-10

Family

ID=17864987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29884886A Granted JPS63152603A (ja) 1986-12-17 1986-12-17 光硬化可能な樹脂組成物

Country Status (1)

Country Link
JP (1) JPS63152603A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152201A (en) * 1988-11-30 1992-10-06 Star Micronics Co., Ltd. Headstock-reciprocating-type automatic lathe and machining method using the same
US5722442A (en) * 1994-01-07 1998-03-03 Startec Ventures, Inc. On-site generation of ultra-high-purity buffered-HF for semiconductor processing
US5846387A (en) * 1994-01-07 1998-12-08 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
USRE36290E (en) * 1991-03-19 1999-09-07 Air Liquide Electronics Chemicals & Services, Inc. Manufacture of high precision electronic components with ultra-high purity liquids
US6001223A (en) * 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
US6015477A (en) * 1994-01-07 2000-01-18 Air Liquide America Corporation Point-of-use ammonia purification for electronic component manufacture
US6063356A (en) * 1994-01-07 2000-05-16 Air Liquide America Corporation On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
US6214173B1 (en) 1996-06-05 2001-04-10 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity nitric acid
US6350425B2 (en) 1994-01-07 2002-02-26 Air Liquide America Corporation On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
CN103627301A (zh) * 2013-11-12 2014-03-12 惠州市长润发涂料有限公司 一种相片uv固化罩光涂料

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51125475A (en) * 1975-03-04 1976-11-01 Fuji Photo Film Co Ltd Photo-polymerizable compositions
JPS61161248A (ja) * 1985-01-10 1986-07-21 Kanegafuchi Chem Ind Co Ltd アクリルアミド系オリゴマ−およびその製法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51125475A (en) * 1975-03-04 1976-11-01 Fuji Photo Film Co Ltd Photo-polymerizable compositions
JPS61161248A (ja) * 1985-01-10 1986-07-21 Kanegafuchi Chem Ind Co Ltd アクリルアミド系オリゴマ−およびその製法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152201A (en) * 1988-11-30 1992-10-06 Star Micronics Co., Ltd. Headstock-reciprocating-type automatic lathe and machining method using the same
USRE36290E (en) * 1991-03-19 1999-09-07 Air Liquide Electronics Chemicals & Services, Inc. Manufacture of high precision electronic components with ultra-high purity liquids
USRE37972E1 (en) 1991-03-19 2003-02-04 American Air Liquide, Inc. Manufacture of high precision electronic components with ultra-high purity liquids
US5722442A (en) * 1994-01-07 1998-03-03 Startec Ventures, Inc. On-site generation of ultra-high-purity buffered-HF for semiconductor processing
US5846387A (en) * 1994-01-07 1998-12-08 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity hydrochloric acid for semiconductor processing
US6015477A (en) * 1994-01-07 2000-01-18 Air Liquide America Corporation Point-of-use ammonia purification for electronic component manufacture
US6063356A (en) * 1994-01-07 2000-05-16 Air Liquide America Corporation On-site manufacture of ultra-high-purity hydrofluoric acid for semiconductor processing
US6350425B2 (en) 1994-01-07 2002-02-26 Air Liquide America Corporation On-site generation of ultra-high-purity buffered-HF and ammonium fluoride
US6001223A (en) * 1995-07-07 1999-12-14 Air Liquide America Corporation On-site ammonia purification for semiconductor manufacture
US6214173B1 (en) 1996-06-05 2001-04-10 Air Liquide Electronics Chemicals & Services, Inc. On-site manufacture of ultra-high-purity nitric acid
CN103627301A (zh) * 2013-11-12 2014-03-12 惠州市长润发涂料有限公司 一种相片uv固化罩光涂料

Also Published As

Publication number Publication date
JPH0580921B2 (enrdf_load_stackoverflow) 1993-11-10

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