JPS63149396A - 弁金属の陽極酸化前処理方法 - Google Patents
弁金属の陽極酸化前処理方法Info
- Publication number
- JPS63149396A JPS63149396A JP29710386A JP29710386A JPS63149396A JP S63149396 A JPS63149396 A JP S63149396A JP 29710386 A JP29710386 A JP 29710386A JP 29710386 A JP29710386 A JP 29710386A JP S63149396 A JPS63149396 A JP S63149396A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- treatment
- valve metal
- hydrofluoric acid
- nitric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 22
- 239000002184 metal Substances 0.000 title claims abstract description 22
- 230000003647 oxidation Effects 0.000 title abstract description 15
- 238000007254 oxidation reaction Methods 0.000 title abstract description 15
- 238000002203 pretreatment Methods 0.000 title abstract description 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 52
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000013078 crystal Substances 0.000 claims abstract description 17
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910017604 nitric acid Inorganic materials 0.000 claims abstract description 14
- 229960002050 hydrofluoric acid Drugs 0.000 claims description 34
- 239000007864 aqueous solution Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 16
- 238000007743 anodising Methods 0.000 claims description 13
- 150000002739 metals Chemical class 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 abstract description 30
- 238000011282 treatment Methods 0.000 abstract description 16
- 238000004040 coloring Methods 0.000 abstract description 8
- 239000000956 alloy Substances 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 229910052715 tantalum Inorganic materials 0.000 abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 abstract description 3
- 238000005530 etching Methods 0.000 abstract 1
- 239000010936 titanium Substances 0.000 description 29
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 28
- 230000000694 effects Effects 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 238000005554 pickling Methods 0.000 description 13
- 239000002253 acid Substances 0.000 description 5
- 238000010306 acid treatment Methods 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000003086 colorant Substances 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
- C23G1/106—Other heavy metals refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29710386A JPS63149396A (ja) | 1986-12-12 | 1986-12-12 | 弁金属の陽極酸化前処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29710386A JPS63149396A (ja) | 1986-12-12 | 1986-12-12 | 弁金属の陽極酸化前処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63149396A true JPS63149396A (ja) | 1988-06-22 |
| JPH0527719B2 JPH0527719B2 (enrdf_load_stackoverflow) | 1993-04-22 |
Family
ID=17842246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29710386A Granted JPS63149396A (ja) | 1986-12-12 | 1986-12-12 | 弁金属の陽極酸化前処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63149396A (enrdf_load_stackoverflow) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1038321C (zh) * | 1993-02-06 | 1998-05-13 | 宁甲保 | 钛、锆金属的溶解方法 |
| WO2000040784A3 (en) * | 1999-01-08 | 2000-12-07 | Scimed Life Systems Inc | Methods for coating metallic articles |
| JP2002129387A (ja) * | 2000-10-19 | 2002-05-09 | R & D Inst Of Metals & Composites For Future Industries | チタン−ニッケル合金材の表面処理方法 |
| US6902627B2 (en) | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Cleaning chamber surfaces to recover metal-containing compounds |
| WO2005068681A3 (en) * | 2003-12-19 | 2005-09-15 | Applied Materials Inc | Cleaning tantalum-containing deposits from process chamber components |
| JP2007126731A (ja) * | 2005-11-07 | 2007-05-24 | Yamaguchi Univ | 真空装置におけるチタンまたはチタン合金並びにその製造方法 |
| CN100390322C (zh) * | 2005-09-21 | 2008-05-28 | 中国海洋大学 | 用于钛及钛合金的化学蚀刻溶液 |
| US7579067B2 (en) | 2004-11-24 | 2009-08-25 | Applied Materials, Inc. | Process chamber component with layered coating and method |
| US9068273B2 (en) | 2002-11-25 | 2015-06-30 | Quantum Global Technologies LLC | Electrochemical removal of tantalum-containing materials |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5658990A (en) * | 1979-10-15 | 1981-05-22 | Ryobi Ltd | Surface treating method of titanium and titanium alloy |
-
1986
- 1986-12-12 JP JP29710386A patent/JPS63149396A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5658990A (en) * | 1979-10-15 | 1981-05-22 | Ryobi Ltd | Surface treating method of titanium and titanium alloy |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1038321C (zh) * | 1993-02-06 | 1998-05-13 | 宁甲保 | 钛、锆金属的溶解方法 |
| WO2000040784A3 (en) * | 1999-01-08 | 2000-12-07 | Scimed Life Systems Inc | Methods for coating metallic articles |
| US6447664B1 (en) | 1999-01-08 | 2002-09-10 | Scimed Life Systems, Inc. | Methods for coating metallic articles |
| JP2002129387A (ja) * | 2000-10-19 | 2002-05-09 | R & D Inst Of Metals & Composites For Future Industries | チタン−ニッケル合金材の表面処理方法 |
| US6902627B2 (en) | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Cleaning chamber surfaces to recover metal-containing compounds |
| US9068273B2 (en) | 2002-11-25 | 2015-06-30 | Quantum Global Technologies LLC | Electrochemical removal of tantalum-containing materials |
| WO2005068681A3 (en) * | 2003-12-19 | 2005-09-15 | Applied Materials Inc | Cleaning tantalum-containing deposits from process chamber components |
| JP2007528938A (ja) * | 2003-12-19 | 2007-10-18 | アプライド マテリアルズ インコーポレイテッド | プロセスチャンバ構成要素からの、タンタル含有堆積物の洗浄 |
| US7579067B2 (en) | 2004-11-24 | 2009-08-25 | Applied Materials, Inc. | Process chamber component with layered coating and method |
| CN100390322C (zh) * | 2005-09-21 | 2008-05-28 | 中国海洋大学 | 用于钛及钛合金的化学蚀刻溶液 |
| JP2007126731A (ja) * | 2005-11-07 | 2007-05-24 | Yamaguchi Univ | 真空装置におけるチタンまたはチタン合金並びにその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0527719B2 (enrdf_load_stackoverflow) | 1993-04-22 |
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