JPS63147814U - - Google Patents
Info
- Publication number
- JPS63147814U JPS63147814U JP4013387U JP4013387U JPS63147814U JP S63147814 U JPS63147814 U JP S63147814U JP 4013387 U JP4013387 U JP 4013387U JP 4013387 U JP4013387 U JP 4013387U JP S63147814 U JPS63147814 U JP S63147814U
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- heater block
- vapor deposition
- atmospheric pressure
- chemical vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
Description
第１図ａ，ｂは本考案の平面図及び側面図、第
２図ａ，ｂは従来の常圧化学気相成長装置の一例
の平面図及び側面図である。
１，１Ａ……サセプター、２……固定ねじ、３
……サセプター固定台、５……ヒータブロツク、
６……ウエーハ、７……空気の流れ、８……デイ
スパージヨンヘツド、９……反応ガス、１１……
ウイング、１２……すきま。
1A and 1B are a plan view and a side view of the present invention, and FIGS. 2A and 2B are a plan view and a side view of an example of a conventional atmospheric pressure chemical vapor deposition apparatus. 1,1A...Susceptor, 2...Fixing screw, 3
...Susceptor fixing base, 5...Heater block,
6... wafer, 7... air flow, 8... dispersion head, 9... reaction gas, 11...
Wing, 12...Gap.
Claims (1)
するためのヒータブロツクと、前記ヒータブロツ
ク上に設けられヒータブロツクより広い面積を有
するサセプターと、前記サセプタの端部に設けら
れた複数のサセプター固定台とを含むことを特徴
とする常圧化学気相成長装置。 a heater block for heating a semiconductor wafer placed on the susceptor; a susceptor provided on the heater block and having a larger area than the heater block; and a plurality of susceptor fixing bases provided at the ends of the susceptor. An atmospheric pressure chemical vapor deposition apparatus comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987040133U JPH0539627Y2 (en) | 1987-03-18 | 1987-03-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987040133U JPH0539627Y2 (en) | 1987-03-18 | 1987-03-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63147814U true JPS63147814U (en) | 1988-09-29 |
| JPH0539627Y2 JPH0539627Y2 (en) | 1993-10-07 |
Family
ID=30853945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987040133U Expired - Lifetime JPH0539627Y2 (en) | 1987-03-18 | 1987-03-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0539627Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887814A (en) * | 1981-11-20 | 1983-05-25 | Seiko Epson Corp | Apparatus for producting amorphous semiconductor film |
-
1987
- 1987-03-18 JP JP1987040133U patent/JPH0539627Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5887814A (en) * | 1981-11-20 | 1983-05-25 | Seiko Epson Corp | Apparatus for producting amorphous semiconductor film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0539627Y2 (en) | 1993-10-07 |