JPS63164220U - - Google Patents
Info
- Publication number
- JPS63164220U JPS63164220U JP5713787U JP5713787U JPS63164220U JP S63164220 U JPS63164220 U JP S63164220U JP 5713787 U JP5713787 U JP 5713787U JP 5713787 U JP5713787 U JP 5713787U JP S63164220 U JPS63164220 U JP S63164220U
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- wafer
- hot plate
- heat source
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す概略構成図、
第２図は従来のＣＶＤ装置を示す概略構成図であ
る。
１：基台、２：ホツトプレート、３：ノズル、
４：ウエーハ、５：加熱源。
FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention;
FIG. 2 is a schematic configuration diagram showing a conventional CVD apparatus. 1: Base, 2: Hot plate, 3: Nozzle,
4: wafer, 5: heating source.
Claims (1)
ートに−族化合物半導体ウエーハをセツトす
る場合、前記ホツトプレートと対向する位置に、
輻射熱を利用する加熱源を設けたことを特徴とす
るＣＶＤ装置。 (2) 加熱源は、ウエーハをセツトするときのみ
作動し、前記ウエーハのセツト終了後には前記加
熱源を装置外部へ移動させる機構を有する実用新
案登録請求の範囲第１項記載のＣＶＤ装置。[Claims for Utility Model Registration] (1) In a vertical atmospheric pressure CVD apparatus, when a - group compound semiconductor wafer is set on a hot plate, at a position opposite to the hot plate,
A CVD apparatus characterized by being provided with a heating source that uses radiant heat. (2) The CVD apparatus according to claim 1, wherein the heat source is activated only when setting the wafer, and has a mechanism for moving the heat source to the outside of the apparatus after the wafer is set.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5713787U JPS63164220U (en) | 1987-04-15 | 1987-04-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5713787U JPS63164220U (en) | 1987-04-15 | 1987-04-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63164220U true JPS63164220U (en) | 1988-10-26 |
Family
ID=30886569
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5713787U Pending JPS63164220U (en) | 1987-04-15 | 1987-04-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63164220U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019102523A1 (en) * | 2017-11-21 | 2019-05-31 | 佐伯 午郎 | Diffusion device |
-
1987
- 1987-04-15 JP JP5713787U patent/JPS63164220U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2019102523A1 (en) * | 2017-11-21 | 2019-05-31 | 佐伯 午郎 | Diffusion device |