JPS6381267U - - Google Patents
Info
- Publication number
- JPS6381267U JPS6381267U JP17543986U JP17543986U JPS6381267U JP S6381267 U JPS6381267 U JP S6381267U JP 17543986 U JP17543986 U JP 17543986U JP 17543986 U JP17543986 U JP 17543986U JP S6381267 U JPS6381267 U JP S6381267U
- Authority
- JP
- Japan
- Prior art keywords
- constant
- temperature
- temperature chamber
- ion
- storage device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 claims description 6
- 238000010586 diagram Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第１図は本考案に係る恒温保管装置の一実施例
を示す概略構成図である。
１……恒温保管装置、２……恒温槽、３……ワ
ーク〔半導体デバイス〕、４……イオン発生手段
、ａ，ｂ……イオン、Ａ……イオン流。
FIG. 1 is a schematic diagram showing an embodiment of a constant temperature storage device according to the present invention. 1... constant temperature storage device, 2... constant temperature bath, 3... workpiece [semiconductor device], 4... ion generating means, a, b... ions, A... ion flow.
Claims (1)
に保持された恒温槽に、イオンを発生させて上記
恒温槽内へイオン流を送り込むイオン発生手段を
連設したことを特徴とする恒温保管装置。 A constant-temperature storage device characterized in that a constant-temperature chamber in which workpieces are housed and maintained in a constant high-temperature atmosphere is connected to an ion generating means for generating ions and sending an ion flow into the constant-temperature chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17543986U JPS6381267U (en) | 1986-11-14 | 1986-11-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17543986U JPS6381267U (en) | 1986-11-14 | 1986-11-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6381267U true JPS6381267U (en) | 1988-05-28 |
Family
ID=31114762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17543986U Pending JPS6381267U (en) | 1986-11-14 | 1986-11-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6381267U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200142140A (en) * | 2019-06-11 | 2020-12-22 | 세메스 주식회사 | Apparatus for treating substrate |
-
1986
- 1986-11-14 JP JP17543986U patent/JPS6381267U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200142140A (en) * | 2019-06-11 | 2020-12-22 | 세메스 주식회사 | Apparatus for treating substrate |
| US11442363B2 (en) | 2019-06-11 | 2022-09-13 | Semes Co., Ltd. | Apparatus for treating substrate |