JPS63137163A - Apparatus for forming composite film by vapor deposition with laser - Google Patents
Apparatus for forming composite film by vapor deposition with laserInfo
- Publication number
- JPS63137163A JPS63137163A JP28372286A JP28372286A JPS63137163A JP S63137163 A JPS63137163 A JP S63137163A JP 28372286 A JP28372286 A JP 28372286A JP 28372286 A JP28372286 A JP 28372286A JP S63137163 A JPS63137163 A JP S63137163A
- Authority
- JP
- Japan
- Prior art keywords
- irradiated
- laser
- composite film
- laser beam
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002131 composite material Substances 0.000 title claims abstract description 28
- 238000007740 vapor deposition Methods 0.000 title claims description 16
- 239000000463 material Substances 0.000 claims abstract description 43
- 239000002245 particle Substances 0.000 claims abstract description 19
- 238000001704 evaporation Methods 0.000 claims abstract description 15
- 230000008020 evaporation Effects 0.000 claims abstract description 9
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 21
- 239000000126 substance Substances 0.000 description 18
- 239000000203 mixture Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 10
- 239000000919 ceramic Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は1例えばC02レーザを用いて、異種類のセ
ラミックス等を基材に蒸着させ複合膜を形成させるレー
ザ蒸着式複合膜形成装置に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a laser vapor deposition type composite film forming apparatus that uses, for example, a C02 laser to vapor deposit different types of ceramics onto a base material to form a composite film. It is.
基材に膜を形成させる技術としては、物理蒸着(PVD
)法、化学蒸着(CV D) B、 mMiLなど様々
な方法があり2例えば特開昭59−116373号公報
に、レーザ蒸着装置について記載されている。これらの
成膜法で、2種以上の物質を複合して膜形成を行う方法
としては、成膜後熱処理を施し拡散による複合膜を形成
する方法、成膜したい2種以上の物質を同時に基板に供
給する方法がある。Physical vapor deposition (PVD) is a technique for forming a film on a base material.
) method, chemical vapor deposition (CVD) B, mMiL, etc. 2 For example, Japanese Patent Application Laid-open No. 116373/1983 describes a laser vapor deposition apparatus. With these film-forming methods, methods for forming a film by combining two or more types of substances include a method in which heat treatment is performed after film formation and a composite film is formed by diffusion, and a method in which two or more types of substances to be film-formed are simultaneously deposited on a substrate. There is a way to supply it.
成膜後熱処理を施す場合、膜中の原子と、他の膜あるい
は基板中の原子とが十分に相互拡散して混ざり合うこと
ができる温度域に保持することにより、複合膜を形成さ
せることができる。When heat treatment is performed after film formation, a composite film can be formed by maintaining the temperature in a temperature range where atoms in the film and atoms in other films or substrates can sufficiently interdiffuse and mix. can.
成膜したい2種以上の物質を同時に基板に供給する場合
は蒸着物質供給源を、2種以上の物質の混合物として、
同時に蒸発させ、基板上に供給する方法、2つ以上の蒸
発物質供給源を用いて2種以上の物質を別々に蒸発させ
、これらを基板上に同時に供給する方法があり、同時に
供給する物質の比率を制御することによって任意の複合
膜を形成させることができる。If two or more substances to be deposited are simultaneously supplied to the substrate, the vapor deposition substance supply source is a mixture of the two or more substances.
There is a method of simultaneously evaporating two or more substances and supplying them onto the substrate, and a method of separately evaporating two or more substances using two or more evaporation substance supply sources and simultaneously supplying them onto the substrate. Any composite membrane can be formed by controlling the ratio.
上記のような方法のうち、成膜後熱処理を施す方法では
、膜及び基材を原子の相互拡散が所要な範囲でSこり得
る高温域(セラミックスρjえばTiCであれば130
0’c程度)に保持する必要があり、膜及び基材の質(
例えば結晶構造)や特性(例えば強度〕などが変化して
しまう場合がある。Among the above methods, in the method of performing heat treatment after film formation, the film and the base material are heated in a high temperature range where S can be damaged within the required range for interdiffusion of atoms (for ceramics, ρj is 130% for TiC).
It is necessary to maintain the temperature at around 0'c), and the quality of the membrane and base material (
For example, crystal structure) or properties (for example, strength) may change.
また、できた複合膜の組成や組成分布を制御できない。Furthermore, the composition and composition distribution of the resulting composite film cannot be controlled.
成膜したい2種以上の物質を、同時に基板に供給する方
法では、蒸着物質供給源を2種以上の物質の混合物とし
た場合、所要の組成及び膜質の複合膜を得られる様に蒸
着物質供給源の混合物を組成を変えて作らなければなら
ない。In the method of simultaneously supplying two or more substances to the substrate to form a film, when the vapor deposition material supply source is a mixture of two or more substances, the vapor deposition material is supplied so as to obtain a composite film with the desired composition and film quality. Source mixtures must be made with varying compositions.
これらの方法に比べて、基板に蒸着したい物質を同時に
保給する方法のうち、2つ以上の蒸発物質供給源を用い
て、蒸発したい物質を別々に蒸発させ、これらを基板上
に同時に供給する方法は。Compared to these methods, among the methods of simultaneously retaining the substances to be evaporated onto the substrate, two or more evaporation substance supply sources are used to evaporate the substances to be evaporated separately and supply them onto the substrate at the same time. How?
蒸発物質供給源の物質が単一組成で良いこと、成膜後の
熱処理が必要でなく、蒸発速度や供給速度を制御すれば
組性及び組成分布が制御できることから、複合膜の形成
方法としては最も膜質を制御できる方法である。This method is recommended as a method for forming composite films because the evaporative substance supply source material only needs to have a single composition, no heat treatment is required after film formation, and the assemblage and composition distribution can be controlled by controlling the evaporation rate and supply rate. This is the method that allows the most control over film quality.
しかしながら、2種以上の蒸着物質供給源を1つのチャ
ンバー内に設置すると、装!構成が複雑かつ高コストに
なり、蒸着条件9例えば蒸着雰囲気の制御が複雑になる
。蒸着させることができる物質が蒸発物質の生成法及び
蒸着雰囲気によって制限される。適時、任意の比率で蒸
発物質を基板上に供給させる制御法が複雑になるといっ
た問題点があった。However, if two or more vapor deposition material sources are installed in one chamber, The configuration becomes complicated and expensive, and control of the vapor deposition conditions 9, such as the vapor deposition atmosphere, becomes complicated. The substances that can be deposited are limited by the method of producing the evaporated substance and the deposition atmosphere. There is a problem in that the control method for supplying the evaporated substance onto the substrate at an appropriate time and at an arbitrary ratio becomes complicated.
この発明はかかる問題点を解決するためになされたもの
で、簡略かつ低コストで、多種類の複合膜が容易に制御
良く形成できるレーザ蒸着式複合膜形成装置を得ること
を目的とする。The present invention has been made to solve these problems, and an object of the present invention is to provide a laser vapor deposition type composite film forming apparatus that is simple, low cost, and can form many types of composite films easily and with good control.
この発明のレーザ蒸着式複合膜形成装置は、真空雰囲気
中で被照射材にレーザビームを集光照射し、被照射材の
粒子を蒸発さ電その粒子が蒸着される位置に配置した基
材に、その粒子の蒸着膜を形成させるものに8いて、異
種類の被照射材をレーザビームによってそれぞれ蒸発さ
せ、同時に蒸着することによって複合膜を形成するよう
にしたことを特徴とするものである。The laser vapor deposition type composite film forming apparatus of the present invention irradiates a material to be irradiated with a focused laser beam in a vacuum atmosphere, evaporates particles of the material to be irradiated, and deposits the particles on a base material placed at a position where the particles are deposited. In this method, a composite film is formed by evaporating different types of irradiated materials using a laser beam and depositing them simultaneously.
この発明においては、レーザビームを、同時に蒸着させ
たい被照射材に集光照射することにより。In this invention, a laser beam is focused and irradiated onto the irradiated materials to be simultaneously vapor-deposited.
複合膜の種類を制御することができ、装置が極めて簡略
となる。The type of composite membrane can be controlled, and the apparatus becomes extremely simple.
また、被照射材としては高融点のセラミックスを含む広
い範囲の物質を使うことができることにより1例えば金
属とセラミックス、セラミックスとセラミックスといっ
た広い種類の複合膜の形成が可能になる。Furthermore, since a wide range of substances including high melting point ceramics can be used as the irradiation material, it is possible to form a wide variety of composite films, such as metal and ceramics, ceramics and ceramics, for example.
以下、この発明の一実施例を図について説明する。 An embodiment of the present invention will be described below with reference to the drawings.
第1図は、この発明の一実施例の構成図であり図に2い
てfil +21は、別々の発振B(ダ1えばco2レ
ーザ発振器)より発振されたレーザ光、 +31141
はレーザ光fll+21を集光する集光レンズ、 1F
51f61は+31 +41で集光されたレーザ光を真
空チャンバG[l内に導く透過窓、 +71+81は(
51161により導かれた集光されたレーザ光を照射さ
れる各々異種類の第1.第2被照射材、(9)はレーザ
光の集光照射により(7)(8)より蒸発した粒子を付
着・堆積させる基材である。FIG. 1 is a block diagram of an embodiment of the present invention. In FIG. 2, fil +21 is a laser beam oscillated from a separate oscillation B (for example, a CO2 laser oscillator), +31141
is a condensing lens that condenses the laser beam fll+21, 1F
51f61 is a transmission window that guides the laser beam focused at +31 +41 into the vacuum chamber G[l, +71+81 is (
51161, each different type of first. The second irradiated material (9) is a base material to which particles evaporated from (7) and (8) are attached and deposited by condensed laser beam irradiation.
上記のように構成されたレーザ蒸着式複合膜形成装置に
おいては例えばtOtorrに排気された真空雰囲気中
で、レーザ光(11は集光レンズ(3)により集光され
、透過窓(5)より真空チャンバーα〔内に導かれ第1
被照射材(7)に集光照射され、第1被照射材(7)の
粒子が蒸発する。同様にレーザ光(2)は集光レンズ1
4)により集光され透過窓(6)より真空チャンバー0
1内に導かれ、第2被照射材(81に集光照射され、第
2被照射材(8)の粒子が蒸発する。第1被照射材(7
)及び第2被照射材(8)は、蒸発する粒子が基材(9
)の方向へ向かう様な角変に傾けてあり、蒸発した粒子
は基材(9)上に同時に蒸着される。In the laser vapor deposition type composite film forming apparatus configured as described above, the laser beam (11) is focused by the condenser lens (3) in a vacuum atmosphere evacuated to tOtorr, and is transmitted through the transmission window (5) into the vacuum atmosphere. The first chamber α
The irradiated material (7) is irradiated with concentrated light, and the particles of the first irradiated material (7) are evaporated. Similarly, the laser beam (2) is transmitted through the condensing lens 1.
4) The light is focused by the transmission window (6) and sent to the vacuum chamber 0.
1, the second irradiated material (81) is irradiated with condensed light, and the particles of the second irradiated material (8) evaporate.
) and the second irradiated material (8), the particles to be evaporated are the base material (9).
), and the evaporated particles are simultaneously deposited on the substrate (9).
蒸発する粒子の蒸発j!(蒸発速腐)は、第1゜第2被
照射材tel [81に集光照射するレーザ光の出力。Evaporation of evaporating particles! (Evaporative decay) is the output of the laser beam focused and irradiated on the 1st degree second irradiated material tel [81.
すなわちレーザ光(1)(2)の出力を制御することに
より、適時、変えることができる。よって、レーザ光f
l++21の出力比、すなわち蒸発する粒子の蒸発量(
蒸発速度〕比を適時変えることにより、蒸着複合膜の組
成を一定にすることも、変化させていくこともできるの
で、膜組成が自由に制御可能である。That is, by controlling the output of the laser beams (1) and (2), it can be changed at any time. Therefore, the laser beam f
The output ratio of l++21, that is, the amount of evaporated particles (
By appropriately changing the evaporation rate] ratio, the composition of the vapor-deposited composite film can be kept constant or changed, so the film composition can be freely controlled.
なお、上記実施例では、被照射材の蒸発度(蒸発速度)
比はレーザ光fi+ 121の出力比を変えることによ
って変えているが、集光レンズ+31 +41の位置を
移動し、被照射材に照射されるレーザ光のパワー密度(
W/7)を変えることにより蒸発粒子の蒸発量を制御す
ることもできる。第2図は、この発明の他の実施例のレ
ーザ蒸着式複合膜形成装置の構成図であり、上記−例で
あり、集光レンズ+31 +41が上下に可動になって
Sす、この位置を変えることにより、レーザ光の焦点位
置を変え、被照射材上でのレーザ光のパワー密II’
(W/c7It)を制御する。In the above example, the evaporation degree (evaporation rate) of the irradiated material
The ratio is changed by changing the output ratio of the laser beam fi+121, but by moving the positions of the condensing lenses +31 and +41, the power density (
The amount of evaporated particles can also be controlled by changing W/7). FIG. 2 is a configuration diagram of a laser vapor deposition type composite film forming apparatus according to another embodiment of the present invention. By changing the focus position of the laser beam, the power density of the laser beam on the irradiated material can be changed.
(W/c7It).
また、上記実施例では、2本のビームは別々の発振器よ
り得ているが、第2図に示すように、1基のレーザ発振
503. F!IIえばC02レーザ発振器より発振さ
れたレーザ光0着を、ビームスプリッタ−03によりレ
ーザ光il+及びレーザ光(2)に分光し。Further, in the above embodiment, the two beams are obtained from separate oscillators, but as shown in FIG. 2, one laser oscillation unit 503. F! II. For example, the laser beam 0 oscillated by the C02 laser oscillator is split into laser beam il+ and laser beam (2) by the beam splitter 03.
透過させた方のレーザ光(IIは9反射鏡allで光路
転換して、2本のレーザ光を真空チャンバー内に導くよ
うにしてもよい。この方法を用いれば、ビームスプリッ
タ−を使って1本のレーザ光をい(っにも分光できるの
で、1基のレーザ発振器だけで2種以上の被照射材をい
くつでも同時に蒸発させることができるため、複合膜形
成装置として極めて合理的である。The transmitted laser beam (II) may be guided into the vacuum chamber by changing the optical path using all 9 reflecting mirrors. If this method is used, a beam splitter can be used to guide the two laser beams into the vacuum chamber. Since the laser beam can be divided into multiple spectra, it is possible to evaporate two or more types of irradiated materials at the same time using just one laser oscillator, making it extremely rational as a composite film forming device.
なお、レーザ光としては、co2レーザ以外にYAGレ
ーザ等を用いてもよい。Note that as the laser light, a YAG laser or the like may be used in addition to the CO2 laser.
又、被照射材としては9例えば種々のセラミックスおよ
び種々の金属等広い種類の材料を用いることができる。Further, as the material to be irradiated, a wide variety of materials can be used, such as various ceramics and various metals.
この発明は9以上説明したと8つ、真空雰囲気中で被照
射材にレーザビームを集光照射し、被照射材の粒子を蒸
発さ電その粒子が蒸着される位置に配置した基材に、そ
の粒子の蒸着膜を形成させるものにおいて、異種類の被
照射材をレーザビームによってそれぞれ蒸発させ、同時
に蒸着することによって複合膜を形成するようにしたこ
とを特徴とするものを用いることにより、簡略かつ低コ
ストで、多種類の複合膜が容易に制御長(形成できるレ
ーザ蒸着式複合膜形成装置を得ることができる。As described above, the present invention is based on the following points: A laser beam is focused on a material to be irradiated in a vacuum atmosphere, particles of the material to be irradiated are evaporated, and the particles are placed on a base material at a position where the particles are deposited. By using a device for forming a vapor-deposited film of particles, the method is characterized in that different types of irradiated materials are vaporized by a laser beam, and a composite film is formed by simultaneously vapor-depositing them. Moreover, it is possible to obtain a laser vapor deposition type composite film forming apparatus that can easily form various types of composite films with controlled lengths at low cost.
第1図はこの発明の一実施例の構成図、第2図はこの発
明の他の実施例の構成図である。
図において、 +II、 +21はレーザ光、(7ン、
(8)は第1゜第2被照射材、(9)は基材、αQは真
空チャンバーである。
なお、各図中同一符号は同−又は相当部分を示す。FIG. 1 is a block diagram of one embodiment of this invention, and FIG. 2 is a block diagram of another embodiment of this invention. In the figure, +II and +21 are laser beams, (7n,
(8) is the first and second irradiated materials, (9) is the base material, and αQ is the vacuum chamber. Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
射し、被照射材の粒子を蒸発さ電その粒子が蒸着される
位置に配置した基材に、その粒子の蒸着膜を形成させる
ものにおいて、異種類の被照射材をレーザビームによつ
てそれぞれ蒸発させ、 同時に蒸着することによつて複合膜を形成するようにし
たことを特徴とするレーザ蒸着式複合膜形成装置。 (2)それぞれの被照射材に照射するレーザビーム密度
を制御することにより、それぞれの被照射材の蒸発量の
比率を制御する特許請求の範囲第1項記載のレーザ蒸着
式複合膜形成装置。 (3)レーザビームの密度の制御は、レーザビームの焦
点位置を制御することにより行なう特許請求の範囲第2
項記載のレーザ蒸着式複合膜形成装置。[Claims] (11) A laser beam is focused on a material to be irradiated in a vacuum atmosphere, and the particles of the material to be irradiated are evaporated. A laser evaporation method for forming a composite film, which is characterized in that a composite film is formed by evaporating different types of irradiated materials using a laser beam and simultaneously depositing them. Apparatus. (2) Laser vapor deposition composite film formation according to claim 1, which controls the ratio of evaporation amount of each irradiated material by controlling the laser beam density irradiated to each irradiated material. Apparatus. (3) The density of the laser beam is controlled by controlling the focal position of the laser beam.
The laser vapor deposition type composite film forming apparatus described in 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28372286A JPS63137163A (en) | 1986-11-28 | 1986-11-28 | Apparatus for forming composite film by vapor deposition with laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28372286A JPS63137163A (en) | 1986-11-28 | 1986-11-28 | Apparatus for forming composite film by vapor deposition with laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63137163A true JPS63137163A (en) | 1988-06-09 |
Family
ID=17669240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28372286A Pending JPS63137163A (en) | 1986-11-28 | 1986-11-28 | Apparatus for forming composite film by vapor deposition with laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63137163A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS648266A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Electric Corp | Laser beam vapor deposition method |
JPH03191055A (en) * | 1989-12-13 | 1991-08-21 | Internatl Business Mach Corp <Ibm> | Adhesion method using high energy source |
-
1986
- 1986-11-28 JP JP28372286A patent/JPS63137163A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS648266A (en) * | 1987-06-30 | 1989-01-12 | Mitsubishi Electric Corp | Laser beam vapor deposition method |
JPH03191055A (en) * | 1989-12-13 | 1991-08-21 | Internatl Business Mach Corp <Ibm> | Adhesion method using high energy source |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6090458A (en) | Method and apparatus for film formation by chemical vapor deposition | |
JPH02310363A (en) | Vapor deposition device by laser | |
JPS63137163A (en) | Apparatus for forming composite film by vapor deposition with laser | |
JPH04232258A (en) | Formation of layer on substrate using pulsed laser beam | |
JPH02270962A (en) | Sputtering device | |
JP3351477B2 (en) | Solid laser crystal thin film forming method and solid laser crystal thin film forming apparatus | |
JPH04295851A (en) | Photomask correcting device | |
JPH03122283A (en) | Apparatus for coating surface of base sheet | |
Kreutz et al. | Large area pulsed laser deposition of ceramic films | |
JPH03174307A (en) | Production of oxide superconductor | |
JPS63145769A (en) | Laser coating device | |
JPH0248627B2 (en) | HAKUMAKUKEISEIBUHINNOSEIZOHOHOOYOBISOCHI | |
KR100403799B1 (en) | Manufacturing apparatus of high temperature superconductive thin film | |
JPH03142921A (en) | Manufacturing device for iii-v compound semiconductor thin film | |
JPH04182317A (en) | Formation of oxide superconducting thin film | |
JPH07331422A (en) | Laser abrasion device | |
US20090087581A1 (en) | Manufacturing diffractive optical elements | |
JPS60241219A (en) | Method for forming thin film by utilizing laser | |
JPS62224669A (en) | Ceramic coating method with laser | |
JPH02221120A (en) | Production of superconducting thin film | |
JPH01208454A (en) | Formation of vacuum vapor deposited film by laser beam heating | |
JPH02104658A (en) | Formation of oxide superconducting film by co2 laser vapor deposition method | |
JPH01208455A (en) | Laser vacuum vapor deposition apparatus | |
JPH0446082A (en) | Formation of high-quality oxide superconducting thin film | |
JPH0575825B2 (en) |