JPS63145769A - Laser coating device - Google Patents

Abstract

PURPOSE:To make control at an increased heating rate and stabilized heating temp. and to prevent contamination of a vapor deposition atmosphere and decrease in the vacuum degree thereof with a laser coating device, by projecting spectrally split laser light to a material to be deposited by evaporation and substrate for vapor deposition thereby heating said material and substrate. CONSTITUTION:Part of the laser light 2 from a CO2 laser oscillator 1 through a window 5 of a vacuum chamber 6 is spectrally split by a beam splitter 12 to the 2nd laser light 2A which is focused through a condenser lens 4 and the window 5 to the material 13 to be deposited by evaporation and is projected thereto to heat and evaporate said material. The material 13 is thus deposited by evaporation on the surface of the substrate 8. The material 13 and the substrate 8 are required to be previously heated in this case and, therefore, the 1st laser light 2B obtd. by spectrally splitting the laser light 2 by the splitter 12 is introduced through a reflecting mirror 14 and a window 15 into the vacuum vessel 1 and made into the 1st laser light 2C, 2D by changing the angle of a movable reflecting mirror 11. The beams of said light are projected to the material 13 and the substrate 8 to quickly heat the same. The beams are projected to an absorbent 16 at need to adequately control the heating temp. Generation of the contaminating gas from the heat source for heating, the contamination of the vapor deposition atmosphere and the decrease in the vacuum degree are obviated.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a laser evaporation device for depositing ceramics or the like onto various substrates using a high-output laser 1, such as a CO2 laser.

[Conventional technology]

A focused laser beam is irradiated onto the irradiated material placed in a vacuum, the irradiated particles are evaporated, and the evaporated particles are attached to a metal substrate, etc.
There are several reported examples of laser distillation systems capable of depositing and forming films.

FIG. 3 is a conceptual configuration diagram showing a conventional example similar to the laser evaporation apparatus fζ shown in, for example, Japanese Patent Application Laid-Open No. 59-116373. In FIG.
For example, a CO2 laser oscillator, (2) is a laser oscillator (1
) is the parallel laser beam emitted from (3), and (3) is the laser beam (
2) to a desired direction; (41 is a reflector (41 is a condensing lens that condenses the laser beam whose optical path has been diverted by 31; The chamber (transparent window leading to 62 circles, (7) is the transparent window (
A rotating cylindrical irradiated material is irradiated with the incoming laser light guided from 51, (8: is the condensed irradiation of the laser light -
Thus, the substrate to which particles evaporated from the irradiated material (7) are attached and deposited, (911j base plate (81) is a heater that heats the irradiated material (7) to a predetermined temperature, and αG is a heater that heats the irradiated material (7) to a predetermined temperature. be.

Next, the operation will be explained. The n parallel laser beam (2) emitted from the laser oscillator (1) is 1 antiri:l1 (31
The light is diverted from the original path and condensed through the condensing lens (41).

It passes through the transmission window (51) and is introduced into the vacuum chamber (61).

A rotating cylindrical irradiated material (7) is irradiated. The focus of the laser beam (2) condensed by the condensing lens (41) is set near the top of the irradiated material (7), and the focused irradiation of this laser beam causes the irradiated material (7) to be focused on the irradiated material (7). The evaporated particles are evaporated in the direction Cζ where the evaporated particles fly out. A substrate (81) is arranged, and one evaporated substance adheres and accumulates on this substrate.

In laser deposition, in order to form a dense and adhesive film on a substrate, the substrate temperature must be kept at a certain temperature (for example, 2
00°C) or higher.

Conventional laser evaporation equipment R (heating of the substrate and heating of the irradiated material) used a heating source 9 that utilized thermal radiation, for example, a heater. An example of this is shown in Figure 3. The heater (9) heats the substrate and the heater αG heats the irradiated material using thermal radiation I, and the temperature of the substrate (81 and irradiated material (7) changes by turning on and off the heater (9) and αG. control.

[Problems that the invention attempts to address]

With the conventional method as described above (E), since the heating source uses thermal radiation, it takes time to raise the temperature of the substrate (8) and the irradiated material (7). Material (
The fact that the temperature side of 7) is too low is unreasonable for the device, especially when the substrate is thick or has a low thermal conductivity, and the temperature increases due to attached/deposited evaporated particles and the substrate. There is a problem in that raising the temperature to a high temperature for the purpose of diffusion during the heating process is highly unreasonable. Furthermore, when a heater is used as a heat source, gas is generated from the heater itself and the jig, contaminating the deposition atmosphere and reducing the degree of vacuum, resulting in a reduction in film quality.

This invention was developed in order to solve the above-mentioned problems, and it is possible to raise the temperature of the substrate (81, irradiated material (7) to a high temperature in a short time, in some cases to a high temperature). (7) The temperature of the irradiated material (pulling temperature) should be kept at 1 blJ
The object of the present invention is to provide an apparatus that can be controlled, eliminate the generation of scum from heating sources and jigs, and eliminate contamination of the vapor deposition atmosphere and the reduction of air space.

[Means for solving problems]

The laser coating device of this invention includes a laser oscillator,
A beam splitter that divides the laser beam oscillated by the laser oscillator into a first laser source and a second laser beam, and a vacuum chamber that accommodates a material to be irradiated and a substrate on which evaporated particles of the material to be irradiated are attached and deposited.

a heating means for heating the irradiated material (♂) substrate by irradiating with a first laser beam; and an evaporation device for irradiating with a second laser beam to evaporate particles from the irradiated material to adhere and deposit them on the substrate. It is equipped with the following.

[Effect]

In this invention, since the irradiated material and the substrate are heated with laser light, the substrate and the irradiated material can be heated in a short time, and the temperature can be easily controlled over a wide temperature range. It is possible to eliminate the decline in

[lol example]

Hereinafter, an embodiment of this invention will be explained with reference to the drawings. 1st
In the schematic configuration diagram shown in the figure, (1) is a laser oscillator, (2
1 is a laser beam emitted from a laser oscillator (1), 02
is a beam splitter that splits the laser beam (2) into a reflected second laser beam (2A) and a transmitted first laser beam (2B) at a certain ratio.t4+ +2 beam splitter 1
3 is a condenser lens that condenses the second laser beam (2A) whose optical path has been changed; (51 is a transmission window that guides the laser beam condensed by the condenser lens (4) into the vacuum chamber (61; 0 is a transmission window); window(
(8) is a substrate to which particles evaporated from the irradiated material u:I are attached and deposited by the focused irradiation of the second laser beam; It is. α is a reflector that changes the optical path of the first laser source (transmitted laser beam) (2B) separated by the beam splitter 13;
The transmission window αυ that guides the laser light into the vacuum chamber (6) is a movable reflecting mirror that changes the optical path of the first laser light guided from the upper part of the transmission window 3 to an arbitrary direction.

(20), (2DJ, and (2K) are the optical paths of the first laser source whose optical paths have been changed by the movable reflector an+c, respectively, (20) is the optical path of the irradiated material Q3, and (2D) is the substrate (
8) is irradiated and heated (2K months; this is the optical path when the first laser beam is irradiated and absorbed by the laser absorbing material σe).

In the laser evaporation apparatus constructed as described above, the first beam is divided into arbitrary ratios by the beam splitter α2.
Of the second laser beams (2B) and (2A), the second laser beam (2A) irradiates the irradiated material α1ζ along the same path as the conventional method shown in FIG. 3, and the evaporated irradiated material 03 is The particles are
Adheres and deposits on the substrate (81).

On the other hand, the first laser beam (2B) is diverted by the reflecting mirror 04 and reaches the movable reflecting mirror aυ, but this movable reflecting mirror f#
, (by changing the angle of the LD, the first laser beam (2
B) is changed in the optical path in an arbitrary direction 9, for example (2C), (2D), and the irradiated material and the substrate (81) are intermittently or continuously irradiated, heating the irradiated material and the substrate.

In addition, while heating of the irradiated material α3 and the substrate (8) is not required, the laser beam (2B) is changed to the optical path of (2K) by the movable reflector U, and the absorbing material ClF31 is irradiated and absorbed. put.

In addition, in vapor deposition, it is necessary to heat the substrate (8) and the irradiated material a3 before the irradiated material α3Iζ first laser light (two persons) is focused and irradiated. Therefore, when heating only the substrate (8) and the irradiated material 03, the beam splitter α2 is removed from the optical path of the laser beam (2) and the second laser beam (2A )
It is possible to prevent this from occurring.

As described above, in this device, the movable reflecting mirror 00
By changing the angle of the substrate (81, irradiated material 0) at any time and by changing the transmittance of the beam splitter u3.

Since the amount of heat input by the first laser beam per unit time can be set arbitrarily fζ, the rate of temperature increase and the temperature range to be maintained can be set to required values. In addition, using direct laser irradiation as the heating source is reasonable, especially if the holding temperature of the substrate (81) is set to a high temperature for one hour, even if the thermal efficiency is low. Regarding the heating lζ of the irradiated material u3, uniform heating can be achieved at the same time by moving the movable reflecting mirror α0 at high speed.

In addition, when it is desired to temporarily stop the heating of the substrate (8) and the irradiated material α3, the second
Direction of laser beam (2B) to laser absorber uG (2E)
Since it is only necessary to change the Cζ optical path, there is no need to stop the evaporation even if the laser evaporation is in progress (and the laser oscillator (1)
) The device has a configuration that can instantly stop heating irradiation without having to stop the heating irradiation, making temperature control easier than with the conventional *W.

A series of steps can be performed continuously.

Furthermore, the removal of scraps, which is a problem when a heater is used as a heating source, does not occur when laser heating is used, so this single device can provide stable surface quality in a constant vacuum and in an atmosphere free of contaminated debris. Film formation can be performed with good reproducibility.

In the above embodiment, the laser beam (2D) irradiated onto the substrate (7) is a parallel beam source, but its optical path f
By arranging this condensing lens, local heating of the substrate (8) becomes possible. An example thereof is shown in the schematic diagram of FIG. 2. By arranging a condenser lens σD at a position where the laser beam (2D) focuses near the top of the substrate (81), the point on the substrate (81) can be locally heated.

Talented. The movable condenser lens α71 allows continuous local heating of any point.

〔Effect of the invention〕

As described above, according to the present invention, there is provided a laser oscillator, a beam splitter that divides the laser beam emitted from the laser oscillator into a first laser beam and a second laser beam, a material to be irradiated, and evaporated particles of the material to be irradiated. a vacuum chamber containing a substrate to which particles are attached and deposited; a heating means for heating the irradiated material and the substrate by irradiating a first laser beam; and evaporating particles from the irradiated material by irradiating a second laser beam. By making it equipped with a vapor deposition means for attaching and depositing it on the substrate,
Rapid heating of substrates and irradiated materials, easy temperature control over a wide temperature range from low to high temperatures, no reduction in vacuum degree and no contamination of the evaporation atmosphere, and stable production of high-quality coated products with good reproducibility. This has the effect of providing a laser coating device that can be used.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of a laser coating apparatus according to an embodiment of the present invention, and the second figure is a schematic diagram of a laser coating ILT according to another embodiment of the invention. FIG. 3 is a schematic diagram of a conventional laser coating apparatus. In the figure, (1) is a laser pump, and (2) is a laser beam. (2A) is the second laser beam, (2B) is the second laser beam, (6: is the vacuum chamber, (7) is the irradiated material, (8) is the substrate, a is the beam splitter, and J is the irradiated object. The same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

[Claims] a laser oscillator, a beam splitter that divides the laser beam oscillated by the laser oscillator into a first laser beam and a second laser beam, a vacuum chamber that accommodates an irradiated material and a substrate on which evaporated particles of the irradiated material are attached and deposited; A laser comprising a heating means for heating the irradiated material and the substrate by irradiating a first laser beam, and a vapor deposition means for irradiating a second laser beam to evaporate particles from the irradiated material and deposit them on the substrate. Coating equipment.