JPS63131517A - レジスト塗布膜厚制御装置 - Google Patents

レジスト塗布膜厚制御装置

Info

Publication number
JPS63131517A
JPS63131517A JP61278328A JP27832886A JPS63131517A JP S63131517 A JPS63131517 A JP S63131517A JP 61278328 A JP61278328 A JP 61278328A JP 27832886 A JP27832886 A JP 27832886A JP S63131517 A JPS63131517 A JP S63131517A
Authority
JP
Japan
Prior art keywords
wafer
coating
resist
film thickness
resist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61278328A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0563010B2 (enExample
Inventor
Sachiko Ogawa
小川　佐知子
Masayuki Nakajima
真之 中島
Akira Kawai
河合　晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP61278328A priority Critical patent/JPS63131517A/ja
Publication of JPS63131517A publication Critical patent/JPS63131517A/ja
Publication of JPH0563010B2 publication Critical patent/JPH0563010B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61278328A 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置 Granted JPS63131517A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61278328A JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61278328A JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6206922A Division JP2613183B2 (ja) 1994-08-31 1994-08-31 レジスト膜形成装置

Publications (2)

Publication Number Publication Date
JPS63131517A true JPS63131517A (ja) 1988-06-03
JPH0563010B2 JPH0563010B2 (enExample) 1993-09-09

Family

ID=17595796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61278328A Granted JPS63131517A (ja) 1986-11-20 1986-11-20 レジスト塗布膜厚制御装置

Country Status (1)

Country Link
JP (1) JPS63131517A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0239520A (ja) * 1988-07-29 1990-02-08 Tokyo Electron Ltd レジスト膜厚の測定方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257136A (ja) * 1984-06-01 1985-12-18 Hitachi Ltd フオトレジストの膜厚測定装置
JPS62235734A (ja) * 1986-04-04 1987-10-15 Nec Corp 半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60257136A (ja) * 1984-06-01 1985-12-18 Hitachi Ltd フオトレジストの膜厚測定装置
JPS62235734A (ja) * 1986-04-04 1987-10-15 Nec Corp 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0239520A (ja) * 1988-07-29 1990-02-08 Tokyo Electron Ltd レジスト膜厚の測定方法

Also Published As

Publication number Publication date
JPH0563010B2 (enExample) 1993-09-09

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