JPS63128722U - - Google Patents
Info
- Publication number
- JPS63128722U JPS63128722U JP1987020851U JP2085187U JPS63128722U JP S63128722 U JPS63128722 U JP S63128722U JP 1987020851 U JP1987020851 U JP 1987020851U JP 2085187 U JP2085187 U JP 2085187U JP S63128722 U JPS63128722 U JP S63128722U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- jig
- surrounding space
- heat treatment
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987020851U JPS63128722U (enExample) | 1987-02-17 | 1987-02-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987020851U JPS63128722U (enExample) | 1987-02-17 | 1987-02-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63128722U true JPS63128722U (enExample) | 1988-08-23 |
Family
ID=30816745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987020851U Pending JPS63128722U (enExample) | 1987-02-17 | 1987-02-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63128722U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02161745A (ja) * | 1988-12-14 | 1990-06-21 | Nec Corp | 半導体ウェーハ用キャリア |
| JPH02177425A (ja) * | 1988-12-28 | 1990-07-10 | Shinetsu Sekiei Kk | ウエーハ熱処理装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607122A (ja) * | 1983-06-01 | 1985-01-14 | アムテック・システムズ・インコーポレーテッド | 炉中での複数の半導体ウェハを処理する方法および装置 |
-
1987
- 1987-02-17 JP JP1987020851U patent/JPS63128722U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607122A (ja) * | 1983-06-01 | 1985-01-14 | アムテック・システムズ・インコーポレーテッド | 炉中での複数の半導体ウェハを処理する方法および装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02161745A (ja) * | 1988-12-14 | 1990-06-21 | Nec Corp | 半導体ウェーハ用キャリア |
| JPH02177425A (ja) * | 1988-12-28 | 1990-07-10 | Shinetsu Sekiei Kk | ウエーハ熱処理装置 |