JPS63126297A - Multilayer printed interconnection board and manufacture of the same - Google Patents

Multilayer printed interconnection board and manufacture of the same

Info

Publication number
JPS63126297A
JPS63126297A JP27227086A JP27227086A JPS63126297A JP S63126297 A JPS63126297 A JP S63126297A JP 27227086 A JP27227086 A JP 27227086A JP 27227086 A JP27227086 A JP 27227086A JP S63126297 A JPS63126297 A JP S63126297A
Authority
JP
Japan
Prior art keywords
multilayer printed
resin
printed wiring
wiring board
particulate matter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27227086A
Other languages
Japanese (ja)
Other versions
JPH0455555B2 (en
Inventor
亮 榎本
敏彦 安江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Priority to JP27227086A priority Critical patent/JPS63126297A/en
Publication of JPS63126297A publication Critical patent/JPS63126297A/en
Publication of JPH0455555B2 publication Critical patent/JPH0455555B2/ja
Granted legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、多層プリント配線板及びその製造方法に関す
るものてあり、特に本発明は、無電解メッキ膜からなる
導体回路と耐熱性に優れた樹脂からなる絶縁層とが交互
に積層された多層プリント配線板及びその製造方法に関
する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a multilayer printed wiring board and a method for manufacturing the same. The present invention relates to a multilayer printed wiring board in which insulating layers made of resin are alternately laminated, and a method for manufacturing the same.

(従来の技術) 近年、電子技術の進歩に伴い、大型コンピューターなど
の電子機器に対する高密度化あるいは演算a能の高速化
か進められている。その結果、プリント配線板において
も高密度化をLl的として配線回路か多層に形成された
多層プリント配線板か使用されている。
(Prior Art) In recent years, with the progress of electronic technology, efforts have been made to increase the density and speed of arithmetic operations for electronic devices such as large-sized computers. As a result, even in printed wiring boards, a multilayer printed wiring board formed of wiring circuits or multilayers is used, with the aim of increasing density.

従来、多層プリント配線板としては、例えば内層回路が
形成された複数の回路板をプリプレグを絶縁層として積
層しプレスした後、スルーホールによって各内層回路間
を接続し導通せしめた多層プリント配線板か使用されて
いた。
Conventionally, multilayer printed wiring boards have been produced by, for example, laminating and pressing a plurality of circuit boards on which inner layer circuits are formed using prepreg as an insulating layer, and then connecting each inner layer circuit with through holes to provide continuity. It was used.

しかしながら、前述の如き多層プリント配線板は複数の
内層回路にスルーホールを形成して内層回路を接続し、
導通させたものであるため、複雑な配線回路を形成して
高密度化あるいは高速化を実現することは困難であった
However, in the multilayer printed wiring board as described above, through holes are formed in a plurality of inner layer circuits to connect the inner layer circuits.
Since it is electrically conductive, it is difficult to form a complicated wiring circuit to achieve higher density or higher speed.

このような困難さを克服することのできる多層プリンl
−配線板として最近になって導体回路と有機絶縁膜とを
交互にビルドアップした多層プリント配線板の開発が活
発に進められている。この多層プリント配線板は超高密
度化と高速化に適したものであるが、有機絶縁膜1−に
無電解メッキ膜を信頼性よく形成させることか困難であ
るため、前記多層プリント配線板における導体回路は、
蒸看やスパッタリンクなどのPVD法もしくは前記PV
D法と無電解メッキとの併用で形成されているか、この
ようなPVD法による導体回路形成方法は生産性が悪く
コストが高い欠点を有していた。
A multilayer pudding that can overcome these difficulties
-Recently, as wiring boards, the development of multilayer printed wiring boards in which conductive circuits and organic insulating films are alternately built up has been actively progressed. Although this multilayer printed wiring board is suitable for ultra-high density and high speed, it is difficult to reliably form an electroless plating film on the organic insulating film 1-. The conductor circuit is
PVD method such as steam vaporization or sputter link or the above PV
The conductor circuit formation method using the PVD method, which is formed by a combination of the D method and electroless plating, has the disadvantage of poor productivity and high cost.

(発1jllか解決しようとする問題点)前述の如く、
従来、無電解メッキ膜からなる導体回路と有機絶縁膜と
が交尾にビルドアップされた多層構造を有する多層プリ
ント配線板は知られていない。
(Problem to be solved) As mentioned above,
Conventionally, a multilayer printed wiring board having a multilayer structure in which a conductor circuit made of an electroless plated film and an organic insulating film are built up in a mating manner has not been known.

本ffi I!I+は前述の如き従来の多層プリン1〜
配線板の右する欠点を解消し、無電解メッキ膜からなる
導体回路と有機絶縁膜とが交互にピルドア・シブされた
多層プリント配線板を容易にかつ安価に供給することを
「l的とするものである。
Honffi I! I+ is the conventional multilayer pudding 1~
Our goal is to eliminate the drawbacks of wiring boards and easily and inexpensively provide multilayer printed wiring boards in which conductive circuits made of electroless plated films and organic insulating films are alternately pill-shielded. It is something.

(問題点を解決するための手段) 本発明者等は、前記の如き問題点を解決すべく種々研究
した結果、無電解メッキ膜からなる導体回路と耐熱性に
優れた樹脂層とが交互に積層された多層プリント配線板
、および硬化後の特性か特定の薬液に対して難溶性であ
る未硬化の感光性樹脂液中に、前記薬液に対して可溶性
の粒子−状物質を分散させた混合液を、導体層を右する
ノ、(板に塗711シて感光性樹脂層を形成する工程、
前記感光性樹脂層の表面の所定の箇所を露光した後、現
像、エツチングする工程、前記特定の薬液を使用して樹
脂層の表面部分に存在している前記粒子状物質を溶解除
去し、樹脂層の表面を粗化する工程、無電解メッキによ
り、導体層を形成する工程を少なくとも有することを特
徴とする多層プリント配線板の製造方法によって、前記
問題点を解決できることを見出して本発明を完成したも
のである。
(Means for Solving the Problems) As a result of various studies aimed at solving the above-mentioned problems, the present inventors found that a conductor circuit made of an electroless plating film and a resin layer with excellent heat resistance are alternately formed. A mixture of a laminated multilayer printed wiring board and an uncured photosensitive resin liquid that is hardly soluble in a specific chemical liquid due to its properties after curing, in which particulate matter soluble in the chemical liquid is dispersed. Applying the liquid to the conductor layer (coating 711 on the board to form a photosensitive resin layer,
After exposing a predetermined location on the surface of the photosensitive resin layer, a step of developing and etching is performed, using the specific chemical solution to dissolve and remove the particulate matter present on the surface portion of the resin layer, and remove the resin. The present invention was completed by discovering that the above-mentioned problems can be solved by a method for manufacturing a multilayer printed wiring board, which comprises at least the steps of roughening the surface of the layer and forming a conductor layer by electroless plating. This is what I did.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明の多層プリント配線板は、無電解メッキ膜からな
る導体回路と耐熱性に優れた樹脂からなる絶縁層とが交
互に積層された多層プリント配線板である。
The multilayer printed wiring board of the present invention is a multilayer printed wiring board in which conductor circuits made of electroless plated films and insulating layers made of resin with excellent heat resistance are alternately laminated.

前記多層プリント配線板の導体回路か無電解メッキ膜で
あることか必要な理由は、iij:産対応が容易てあり
、しかも高密度配線に適するからである。
The reason why it is necessary to use the conductor circuit of the multilayer printed wiring board or the electroless plated film is that it is easy to use in production and is suitable for high-density wiring.

また、前記絶縁層か耐熱性に優れた樹脂からなることが
必要な理由は、樹脂により形成される絶縁層は誘電率が
低く、しかも膜厚を厚くすることがてきるため、高速度
化に適するからである。
In addition, the reason why the insulating layer needs to be made of resin with excellent heat resistance is that the insulating layer formed of resin has a low dielectric constant and can be made thicker, which makes it possible to increase speed. This is because it is suitable.

本発明の絶縁層は無電解メッキ■りとの密着性に優れる
ことか極めて重要てあり、前記多層プリント配線板の絶
縁層は、特定の薬液に対してiT(溶性の粒子状物質を
含有しており、かつ無電解メッキ膜との界面は、前記可
溶性の粒子状物質が特定の薬液によって溶解された結果
形成された凹部を有しており、前記凹部には無電解メッ
キのアンカーが形成されてなることが必要である。
It is extremely important that the insulating layer of the present invention has excellent adhesion to electroless plating. and the interface with the electroless plating film has a recess formed as a result of the soluble particulate matter being dissolved by a specific chemical solution, and an electroless plating anchor is formed in the recess. It is necessary to become

以下、本発明の多層プリント配線板の製造方法を併せて
詳細に説明する。
Hereinafter, the method for manufacturing a multilayer printed wiring board of the present invention will also be described in detail.

本発明によれば、硬化後の特性か特定の薬液に対して難
溶性である未硬化の感光性樹脂液中に、前記薬液に対し
て可溶性の粒子状物質を分散させた混合液を導体層を有
する基板に塗布して感光性樹脂層を形成することが必要
である。このような感光性樹脂層を形成する理由は、前
記感光性樹脂層は、特定の薬液に対して可溶性の粒子状
物質が分散した状態の絶縁層を形成するものであり、し
かも感光性を有する樹脂がマトリックスであるため、所
定の箇所を露光した後、現像、エツチングすることによ
り多層化に不可欠なバイアーホール等を容易に形成する
ことかてき、かつ、前記粒子状物質と硬化後の感光性樹
脂とは特定の薬液に対する溶解性に差異があるため、前
記硬化後の感光性樹脂層を特定の薬液て処理することに
より、樹脂層の表面部分に存在している粒子状物質を溶
解除去することができ、樹脂層の表面を粗化することか
てきるからである。この結果、無電解メッキ膜との密着
性に優れた絶縁層を形成することかできる。
According to the present invention, a conductive layer is formed by dispersing a mixed liquid in which particulate matter soluble in the chemical liquid is dispersed in an uncured photosensitive resin liquid that is poorly soluble in a specific chemical liquid due to its properties after curing. It is necessary to form a photosensitive resin layer by coating the photosensitive resin layer on a substrate having a photosensitive resin. The reason for forming such a photosensitive resin layer is that the photosensitive resin layer forms an insulating layer in which particulate matter soluble in a specific chemical solution is dispersed, and is photosensitive. Since the resin is a matrix, it is possible to easily form via holes, etc., which are essential for multilayering, by exposing a predetermined area to light, developing, and etching. Since resins have different solubility in specific chemical solutions, by treating the photosensitive resin layer after curing with a specific chemical solution, particulate matter present on the surface of the resin layer can be dissolved and removed. This is because the surface of the resin layer can be roughened. As a result, an insulating layer with excellent adhesion to the electroless plating film can be formed.

前記特定の薬液に対してr+[溶性の粒子状物質は、予
め硬化処理された耐熱性樹脂微粉末あるいは無機質微粒
子のいずれか少なくとも1種を使用することか好ましい
The particulate matter soluble in the specific chemical solution is preferably at least one of heat-resistant resin fine powder or inorganic fine particles which have been cured in advance.

前記粒子−状物質として予め硬化処理された耐熱性樹脂
微粉末を使用することか好ましい理由は、+iij記耐
熱記構熱性樹脂微粉末処理されていない状態ては、感光
性樹脂液あるいはこの樹脂を溶剤を用い溶解した液中に
添加された際に樹脂液中に溶解してしまうため、特定の
薬液に対する溶解性の差異がなくなるので、樹脂層の表
面を粗化することがてきなくなるからである。これに対
し、前記耐熱性樹脂微粉末が予め硬化処理されていると
感光性樹脂あるいはこの樹脂を溶解する溶剤に対して難
溶性となるため、感光性樹脂中に耐熱性樹脂微粉末か均
一に分散している状態の感光性樹脂層を形成てきるから
である。
The reason why it is preferable to use heat-resistant resin fine powder that has been pre-cured as the particulate material is as follows. This is because when added to a liquid dissolved using a solvent, it dissolves in the resin liquid, so there is no difference in solubility for specific chemical solutions, and it is no longer possible to roughen the surface of the resin layer. . On the other hand, if the heat-resistant resin fine powder is cured in advance, it becomes poorly soluble in the photosensitive resin or the solvent that dissolves this resin, so the heat-resistant resin fine powder is uniformly dispersed in the photosensitive resin. This is because a photosensitive resin layer in a dispersed state can be formed.

前記耐熱性樹脂微粉末の材質は、耐熱性と電気絶縁性に
優れ、通常の薬品に対して安定てあり、予め硬化処理す
ることにより感光性樹脂液あるいはこの樹脂を溶解する
溶剤に対して難溶性となすことかてき、さらにクロム酸
などの特定の薬液により溶解することがてきる特性を具
備する樹脂てあれば使用することかてき、特にエポキシ
樹脂、ポリエステル樹脂、ビスマレイミド−トリアジン
樹脂のなかから選ばれる何れか少なくとも1種であるこ
とが好ましく、なかでもエポキシ樹脂は特性的にも優れ
ており最も好適である。前記硬化処理する方法としては
、加熱により硬化させる方法あるいは触媒を添加して硬
化させる方法などを用いることかてき、特に加熱硬化さ
せる方法は最も実用的である。なお、前記耐熱性樹脂微
粉末を溶解除去する特定の薬液としては、例えばクロム
酸、クロム酸塩、 過マンガン酸塩、オゾンなどの酸化
剤かあり、特にクロム酸と硫酸の混合水溶液を有利に使
用することかてきる。
The material of the heat-resistant resin fine powder has excellent heat resistance and electrical insulation properties, is stable against ordinary chemicals, and is resistant to photosensitive resin liquid or solvents that dissolve this resin by being hardened in advance. Resins that are soluble and can be dissolved by specific chemicals such as chromic acid may be used, especially epoxy resins, polyester resins, and bismaleimide-triazine resins. It is preferable to use at least one selected from the following, and among them, epoxy resin is the most preferable because it has excellent characteristics. As the method of curing, a method of curing by heating or a method of curing by adding a catalyst can be used, and in particular, a method of curing by heating is the most practical. Note that specific chemical solutions for dissolving and removing the heat-resistant resin fine powder include oxidizing agents such as chromic acid, chromates, permanganates, and ozone, and a mixed aqueous solution of chromic acid and sulfuric acid is particularly advantageous. You can use it.

前記粒子状物質として無機質微粒子を使用することが好
ましい理由は、=a?j微粒子は一般に塩酸、硫酸、硝
酸、フッ化水素酸あるいはそれらの混合物などの強酸溶
液あるいは水酸化ナトリウムなどの強アルカリ溶液に可
溶で、感光性樹脂との間に前記強酸溶液あるいは強アル
カリ溶液に対する溶解性の差異を有するからである。前
記無機質微粒子としては、例えば塩酸、硫酸、硝酸、フ
ッ化水素酸あるいはそれらの混合物などの強酸溶液ある
いは水酸化ナトリウムなどの強アルカリ溶液に可溶であ
り、かつ耐熱性、電気絶縁性、前記強酸および強アルカ
リ以外の薬品に対する安定性を有しているものてあれば
好適に使用てき、例えば、シリカ、酸化チタン、ジルコ
ニア、酸化亜鉛、ガラスなどを挙げることかてき、特に
例えば、結晶性シリカ、溶融シリカ、ムライト、シリマ
ナイト、シリカ系ガラスなどのSiO2を主として含有
する無機質微粒子はフッ化水素酸水溶液に容易に溶解さ
せることができ、特性的にも優れているので有利である
The reason why it is preferable to use inorganic fine particles as the particulate material is because =a? j Fine particles are generally soluble in a strong acid solution such as hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, or a mixture thereof, or a strong alkaline solution such as sodium hydroxide, and the above-mentioned strong acid solution or strong alkaline solution is used between the photosensitive resin and the photosensitive resin. This is because there is a difference in solubility between the two. The inorganic fine particles are soluble in a strong acid solution such as hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, or a mixture thereof, or a strong alkaline solution such as sodium hydroxide, and have heat resistance, electrical insulation properties, and the above-mentioned strong acid. It is preferable to use materials that have stability against chemicals other than strong alkalis, such as silica, titanium oxide, zirconia, zinc oxide, glass, etc. In particular, for example, crystalline silica, Inorganic fine particles mainly containing SiO2, such as fused silica, mullite, sillimanite, and silica-based glass, are advantageous because they can be easily dissolved in an aqueous hydrofluoric acid solution and have excellent properties.

前記粒子状物質の粒度としては、平均粒径が]0gm以
下であることが好ましく、特に5uLm以下であること
か好適である。その理由は、平均粒径かl[1gmより
も大きいと、溶解除去して形成されるアンカーの密度が
低くなり、かつ不均一になり易いため、密着強度とその
信頼性か低下し、さらに絶縁層表面の凹凸か激しくなる
ので導体回路の微細パターンか得に<<、かつ部品など
を実装する1−ても好ましくないからである。このよう
な粒度を右する耐熱性樹脂微粉末は、例えば耐熱性樹脂
な熱硬化させてからシェツトミルや凍結粉砕機などを用
いて微粉砕したり、硬化処理する11siに耐熱性樹脂
溶液な噴霧乾燥して直接微粉末にするなとの各種の手段
により得ることかできる。
As for the particle size of the particulate matter, it is preferable that the average particle size is 0 gm or less, and particularly preferably 5 uLm or less. The reason for this is that if the average particle size is larger than 1 gm, the density of the anchor formed by dissolving and removing it will be low and likely to be non-uniform, resulting in a decrease in adhesion strength and reliability, and furthermore, insulating This is because the unevenness of the surface of the layer becomes severe, making it particularly undesirable for fine patterns of conductor circuits, and for mounting parts and the like. The heat-resistant resin fine powder that determines the particle size is, for example, heat-cured heat-resistant resin and then finely pulverized using a shet mill or freeze-pulverizer, or spray-dried heat-resistant resin solution after curing treatment. It can be obtained by various means such as directly turning it into a fine powder.

本発明で使用する粒子状物質か分散されている感光性樹
脂は、耐熱性、電気絶縁性、化学安定性および接着性に
優れ、かつ硬化後の特性か特定の薬液に対して難溶性て
あり感光性を有する樹脂てあれば使用することかてき、
特にエポキシ樹脂、エポキシ変成ポリイミド樹脂、ポリ
イミド樹脂、フェノール樹脂のなかから選ばれる何れか
少なくとも1種であることか好ましい。
The photosensitive resin in which the particulate material used in the present invention is dispersed has excellent heat resistance, electrical insulation, chemical stability, and adhesive properties, and has properties after curing that make it poorly soluble in certain chemicals. If you have a photosensitive resin, you can use it.
In particular, at least one selected from epoxy resins, epoxy-modified polyimide resins, polyimide resins, and phenol resins is preferred.

このように、粒子状物質と、硬化処理された後のマトリ
ックス感光性樹脂とには特定の薬液に対する溶解性に大
きな差異かあるため、前記樹脂層の表面部分に分散して
いる粒子状物質を特定の薬液を用いて溶解除去すると、
前記特定の薬液に対して難溶性のマトリックス感光性樹
脂はほとんど溶解されずに基材として残り明確なアンカ
ーか樹脂層の表面に形成される。なお、粒子状物質とし
て耐熱性樹脂を使用する場合において回し種類の樹脂で
あっても、例えば耐熱性樹脂微粉末として酸化剤に溶は
易いエポキシ樹脂を用い、他方前記マトリックス感光性
樹脂として酸化剤に対して比較的溶は難いエポキシ樹脂
を組合せて使用することもてきる。
As described above, since there is a large difference in solubility in specific chemical solutions between the particulate matter and the matrix photosensitive resin after curing treatment, it is necessary to remove the particulate matter dispersed on the surface of the resin layer. When dissolved and removed using a specific chemical solution,
The matrix photosensitive resin, which is sparingly soluble in the specific chemical solution, is hardly dissolved and remains as a base material, forming a clear anchor on the surface of the resin layer. In addition, when using a heat-resistant resin as the particulate material, even if it is a rotary type resin, for example, an epoxy resin that is easily soluble in an oxidizing agent is used as the heat-resistant resin fine powder, and on the other hand, an oxidizing agent is used as the matrix photosensitive resin. It is also possible to use a combination of epoxy resins, which are relatively difficult to dissolve.

本発明て使用する前記粒子状物質か分散されている感光
性樹脂液としては、溶剤を含まない感光性樹脂液をその
まま使用することもできるか、感光性樹脂を溶剤に溶解
してなる感光性樹脂液は低粘度となすことかできるため
、粒子状物質を均一に分散させることが容易であり、ま
た塗布し易いのて有利に使用することができる。前記感
光性樹脂を溶解するのに使用する溶剤としては、通常の
溶剤を用いることかでき、例えばメチルエチルケトン、
メチルセロソルブ、エチルセロソルツ、ブチルカルピl
−−ル、ブチルセロソルブ、テトラリン、ジメチルホル
ムアミド、N−メチルピロリドンなどを挙げることかで
きる。また、前記マトリックスとなる感光性樹脂液に、
絶縁層の熱放散性を向]−させることを「1的として、
lti記粒子粒子状物質に熱伝導性に優れ、かつ電気絶
縁性に優れたフィラー、例えば、アルミナ、ベリリア、
シリコンナイトライド、ボロシナイトライドなどの無機
質フィラーを添加することがてきる。
As the photosensitive resin liquid in which the particulate matter used in the present invention is dispersed, a photosensitive resin liquid containing no solvent may be used as it is, or a photosensitive resin liquid prepared by dissolving the photosensitive resin in a solvent may be used. Since the resin liquid can have a low viscosity, it is easy to uniformly disperse particulate matter, and it is easy to apply, so it can be used advantageously. As the solvent used to dissolve the photosensitive resin, ordinary solvents can be used, such as methyl ethyl ketone,
Methyl cellosolve, ethyl cellosolve, butyl carpil
--l, butyl cellosolve, tetralin, dimethylformamide, N-methylpyrrolidone, and the like. In addition, in the photosensitive resin liquid serving as the matrix,
Improving the heat dissipation properties of the insulating layer is the first objective.
Fillers with excellent thermal conductivity and electrical insulation properties, such as alumina, beryllia,
Inorganic fillers such as silicon nitride and borosininitride can be added.

前記マトリックス感光性vA脂に対する粒子状物質の配
合!、+、は、マトリックス感光性樹脂固形分100重
j11部に対して5〜350重jQ3部の範囲か好まし
く、特に2()〜201)組品一部の範囲か無電解メッ
キ膜との高い密着強度を得ることかてきるので好適であ
る。その理由は粒子状物質の配合量が5重量部より少な
いと溶解除去して形成されるアンカーの密度か低くなり
無電解メッキ膜との充分な密着強度が得られず、一方3
50重1一部よりも多くなると樹脂層のほとんどが溶解
されるので充分な絶縁層を形成することか困難になるか
らである。
Addition of particulate matter to the matrix photosensitive vA fat! , + is preferably in the range of 5 to 350 parts by weight per 11 parts by weight of the matrix photosensitive resin solid content, particularly in the range of a part of the assembly 2() to 201), or in the range of 3 parts by weight or higher with respect to the electroless plating film. This is preferable because it can provide adhesion strength. The reason for this is that if the amount of particulate matter is less than 5 parts by weight, the density of the anchors formed by dissolution and removal will be low, making it impossible to obtain sufficient adhesion strength with the electroless plating film.
This is because if the amount exceeds 50 parts by weight, most of the resin layer will be dissolved, making it difficult to form a sufficient insulating layer.

次に本発明の多層プリント配線板の製造方法について具
体的に説明する。
Next, a method for manufacturing a multilayer printed wiring board according to the present invention will be specifically explained.

本発明によれば、前記粒子状物質がマトリックスとなる
感光性樹脂液中に分散されてなる混合液を導体層を右す
るノ、虹板に塗布する。この方法としては、例えばロー
ラコート法、ディップコート法、スプレーコート法、ス
ピナーコート法、カーテンコート法、スクリーン印刷法
などの各種の手段を適用することかてきる。
According to the present invention, a liquid mixture in which the particulate matter is dispersed in a photosensitive resin liquid serving as a matrix is applied to the rainbow plate on the side of the conductor layer. As this method, various methods such as a roller coating method, a dip coating method, a spray coating method, a spinner coating method, a curtain coating method, and a screen printing method can be applied.

曲記塗1iされた樹脂層の厚さは通常20〜l()Og
m程度であるか、特に高い絶縁性が要求される場合には
それ以りに厚く塗布することもできる。
The thickness of the resin layer coated with 1i is usually 20~l()Og
It can be applied to a thickness of about m or even thicker if particularly high insulation is required.

次いて、前記塗/iされた感光性樹脂層の表面の所定の
個所を露光した後、現像、エツチングすることにより、
絶縁層を形成する。この場合、現像、エツチングされる
ことにより、樹脂層が除去された部分は一般的に導体層
間を接続するためのバイアーホールか設けられる。
Next, by exposing a predetermined portion of the surface of the photosensitive resin layer coated with light, developing and etching,
Form an insulating layer. In this case, the portion where the resin layer has been removed by development and etching is generally provided with a via hole for connecting the conductor layers.

末完IJfに使用する基板としては、例えばプラスチッ
ク基板、セラミツクツ、を板、金属基板、フイルムノ、
(板などを使用することができ、具体的にはガラスエポ
キシ基板、ガラスポリイミド基板、アルミナノ、(板、
低温焼成セラミック基板、窒化アルミニラムノ、(板、
アルミニウム基板、鉄基板、ポリイミトフイルムノ、(
板などを使用することかできる。
Substrates used for final IJf include, for example, plastic substrates, ceramic plates, metal substrates, film substrates,
(plates etc. can be used, specifically glass epoxy substrates, glass polyimide substrates, aluminum nano, (plates,
Low-temperature fired ceramic substrate, aluminum nitride laminated, (plate,
Aluminum substrate, iron substrate, polyimide film, (
You can also use a board etc.

次に、(111記樹脂層の表面部分に存在している前記
粒子状物質を特定の薬液を用いて溶解除去する。この方
法としては、前記樹脂層が形成されたノ1(板を薬液中
に浸漬するか、あるいは、樹脂層の表面に薬液をスプレ
ーするなどの方法を適用することができ、その結果樹脂
層の表面を粗化することかできる。なお、前記粒子状物
質の溶解除去を効果的に行なわせることを目的として、
予め前記樹脂層の表面部分を例えば微粉研摩剤を用いて
ボリシングや液体ホーニングする研摩り段によって軽く
除去することは有利である。
Next, (111) the particulate matter present on the surface of the resin layer is dissolved and removed using a specific chemical solution. Alternatively, the surface of the resin layer can be roughened by dipping it in water or by spraying a chemical onto the surface of the resin layer. With the aim of making it effective,
It is advantageous beforehand to lightly remove the surface portions of the resin layer, for example by means of a polishing step using a finely powdered abrasive, such as by boring or liquid honing.

末完IJJによれば、樹脂層の表面を粗化した後無電解
メッキにより導体層か形成する。前記無電解メッキとし
ては、例えば無電解銅メッキ、無電解ニッケルメッキ、
無電解スズメッキ、無電解金メッキ、無電解銀メッキな
どを挙げることかでき、特に無電解銅メッキ、無’+b
:解ニウヶルメッキ、無電解金メッキの何れか少なくと
も1種であることか好適である。
According to Shukan IJJ, after roughening the surface of the resin layer, a conductor layer is formed by electroless plating. Examples of the electroless plating include electroless copper plating, electroless nickel plating,
Examples include electroless tin plating, electroless gold plating, electroless silver plating, etc. In particular, electroless copper plating, electroless '+b
: Preferably, at least one of electrolytic gold plating and electroless gold plating is used.

なお、前記無電解メッキを施した一Lに更に異なる種類
の無電解メッキあるいは電気メッキを行なったり、ハン
ダをコートしたりすることかできる。
Note that the electroless plated L can be further subjected to different types of electroless plating or electroplating, or can be coated with solder.

なお、本発明によれば、従来知られたプリント配線板に
ついて行なわれている種々の方法で導体回路を形成する
ことかてき、例えば基板に無電解メッキを施してから回
路をエツチングする方法、無電解メッキを施す際に直接
回路を形成する方法などを適用することかてきる。
According to the present invention, conductor circuits can be formed using various methods conventionally used for printed wiring boards, such as a method of electroless plating the circuit board and then etching the circuit; It is possible to apply a method of directly forming a circuit when applying electrolytic plating.

次に、本発明を実施例によって説明する。Next, the present invention will be explained by examples.

実施例1 (1)感光性ポリイミド樹脂(ロケ化成工業製、商品名
; T−14)固形分100重賃部に対して、エポキシ
樹脂微粉末(東し製、商品名;トレバールEP−B)を
120 重量部の割合で配合し、さらにN−メチルピロ
リドン溶剤を添加しながらホモディスパー分散機で粘t
ff5000c p Sに調整し1次いて三木ロールて
混練して絶縁層相フェスを11)だ。
Example 1 (1) Fine epoxy resin powder (manufactured by Toshi, trade name: Treval EP-B) was added to 100 parts by weight of photosensitive polyimide resin (manufactured by Roke Kasei Kogyo Co., Ltd., trade name: T-14) solid content. were blended at a ratio of 120 parts by weight, and while adding N-methylpyrrolidone solvent, the viscosity was mixed with a homodisper disperser.
Adjust to ff5000cpS, then knead with a Miki roll to form an insulating layer phase 11).

(2)次いで、銅張積層板(ガラス布基材ポリイミド樹
脂)の表面銅箔な常法によりフォトエツチングして得ら
れた印刷配線板上に、前記絶縁層相フェスをスピナー(
1000r p m )を用いて塗布し、水モ状態て6
0分間室温放置した後、80°Cで10分間乾燥させて
厚さ60ILmの絶縁層を形成した。
(2) Next, the insulating layer phase face is placed on the printed wiring board obtained by photoetching the surface of the copper clad laminate (glass cloth base material polyimide resin) using a conventional method.
1000rpm) and soaked in water for 6 minutes.
After being left at room temperature for 0 minutes, it was dried at 80° C. for 10 minutes to form an insulating layer with a thickness of 60 ILm.

(3)次いで、これに 100ルmφの黒丸か形成され
たフォトマスクを密着させ、超高圧水銀灯で30秒間露
光した。これを、N−メチルピロリドン−メタノール(
3:1)混合溶媒で1分間現像処理することにより、印
刷配線板上にI[10gmφのバイアーホールを形成し
た。次いて、この配線板を、超高圧水銀灯で5分間露光
し、さらに、 200℃で30分間加熱処理することに
より、絶縁層を完全に硬化させた。
(3) Next, a photomask in which a black circle of 100 mφ was formed was closely attached to this, and the film was exposed for 30 seconds using an ultra-high pressure mercury lamp. This was mixed with N-methylpyrrolidone-methanol (
3:1) A via hole of 10 gmφ was formed on the printed wiring board by developing with a mixed solvent for 1 minute. Next, this wiring board was exposed to light using an ultra-high pressure mercury lamp for 5 minutes, and then heat-treated at 200° C. for 30 minutes to completely cure the insulating layer.

(4)この絶縁層の表面な#tonoのアルミナ微粉研
庁材を用いて回転ブラシ研摩機で軽く研摩した基板を、
クロム酸(Cr O:l )  800g/ fL水溶
液中からなる酸化剤に60°Cで2分間浸漬して絶縁層
の表面を粗化してから、中和溶液(シブレイ社製、商品
名;PM950)に浸漬し、水洗した。
(4) The surface of this insulating layer was lightly polished with a rotary brush polisher using #tono alumina fine powder polishing material.
After roughening the surface of the insulating layer by immersing it in an oxidizing agent consisting of 800 g/fL aqueous solution of chromic acid (CrO:l) at 60°C for 2 minutes, a neutralizing solution (manufactured by Sibley, trade name: PM950) was applied. Soaked in water and washed with water.

(5)絶縁層の表面を粗化したプリント配線板に、パラ
ジウム触媒(シブレイ社製、商品名:キャタボジット4
4)を付与して絶縁層の表面を活性化させた後、アディ
ティブ法用無電解ニッケルメッキ液(ワールドメタル製
、商品名:ニボロン−5)に3時間浸漬して、メッキ膜
の厚さ約10pmの無電解ニラケルメッキを施した。
(5) Add a palladium catalyst (manufactured by Sibley, product name: Catabosite 4) to the printed wiring board with a roughened surface of the insulating layer.
4) to activate the surface of the insulating layer, and then immersed in an electroless nickel plating solution for additive method (World Metal, trade name: Niboron-5) for 3 hours until the thickness of the plated film was approximately 10 pm electroless Nilacel plating was applied.

(6)以」−のようにして製造された多層プリント配線
板の、絶縁層とニッケルメッキ膜との密着強度を111
1定したところプル強度は、 1.5kg/mrn’で
あり、また、表面温度を300°Cに保持したホットプ
レートに多層プリント配線板の表面を密着させて【0分
間加熱する耐熱性試験を行った後にも全く異常は認めら
れなかった。
(6) The adhesion strength between the insulating layer and the nickel plating film of the multilayer printed wiring board manufactured as described below is 111.
The pull strength was 1.5 kg/mrn', and a heat resistance test was conducted in which the surface of the multilayer printed wiring board was brought into close contact with a hot plate whose surface temperature was maintained at 300°C and heated for 0 minutes. No abnormalities were observed after the test.

実施例2 (1)エポキシ樹脂(三井石油化学工業製、商品名;T
A−1800)を?S風乾燥器内にて 150℃て1時
間、引き続いて 180 °Cて4時間乾燥して硬化さ
せ、この硬化させたエポキシ樹脂を粗粉砕してから、液
体窒素て凍結させなから超i”f速ジェット粉砕機を用
いて微粉砕し、さらに風力分級機を使用して分級し、平
均粒径1.6Bmのエポキシ樹脂微粉末を作った。
Example 2 (1) Epoxy resin (manufactured by Mitsui Petrochemical Industries, product name: T
A-1800)? Harden by drying in an S-air dryer at 150°C for 1 hour, then at 180°C for 4 hours, coarsely crush the hardened epoxy resin, and then freeze it with liquid nitrogen. The mixture was pulverized using an f-speed jet pulverizer and further classified using an air classifier to produce epoxy resin fine powder with an average particle size of 1.6 Bm.

感光性ポリイミド樹脂(日立化成工業製、商品名: T
−14)固形分+00重y11,8′8に対して、前記
エポキシ樹脂微粉末を + [10重積部の割合て配合
し、さらにN−メチルピロリドン溶液を添加しながらホ
モディスパー分散機て粘度5000c p sに調整し
、次いて3木ロールて混練して絶縁層相フェスを得た。
Photosensitive polyimide resin (manufactured by Hitachi Chemical, product name: T
-14) Blend the above-mentioned epoxy resin fine powder at a ratio of + [10 parts by weight to the solid content + 00 weight y11,8'8, and further add the N-methylpyrrolidone solution while measuring the viscosity using a homodisper disperser. The mixture was adjusted to 5000 cps, and then kneaded using a three-piece roll to obtain an insulating layer phase face.

(2)この絶縁層相フェスを実施例1と同様にして、印
刷配線板上に塗41シて、厚さ60ルmの絶縁層を形成
した。
(2) This insulating layer layer was coated on a printed wiring board in the same manner as in Example 1 to form an insulating layer with a thickness of 60 μm.

(3)この絶縁層に実施例1と同様にしてバイアーホー
ルを形成した後、絶縁層を完全硬化し、表面を粗化して
から無電解ニッケルメッキを施した。
(3) After forming via holes in this insulating layer in the same manner as in Example 1, the insulating layer was completely cured, the surface was roughened, and electroless nickel plating was applied.

このようにして得られた多層プリント配線板の絶縁層と
ニッケルメッキ膜との密着強度はプル強度で 1.7k
g/mばであった。
The adhesion strength between the insulating layer and the nickel plating film of the multilayer printed wiring board thus obtained was 1.7k in terms of pull strength.
g/mba.

(発明の効果) 以上述へた如く、本発明の多層プリント配線板及びその
製造方法によれば、無電解メッキ膜からなる導体回路と
絶縁層との密着性か極めて優れ、かつ耐熱性の高い多層
プリント配線板を得ることができ、産業−ヒ極めて有用
である。
(Effects of the Invention) As described above, according to the multilayer printed wiring board and the manufacturing method thereof of the present invention, the adhesion between the conductive circuit made of the electroless plated film and the insulating layer is extremely excellent, and the heat resistance is high. A multilayer printed wiring board can be obtained, which is extremely useful in industry.

Claims (1)

【特許請求の範囲】 1)、無電解メッキ膜からなる導体回路と耐熱性に優れ
た樹脂からなる絶縁層とが交互に積層された構造であっ
て、前記絶縁層は、特定の薬液に対して難溶性である感
光性樹脂中に、前記薬液に対して可溶性の粒子状物質を
含有しており、かつ無電解メッキ膜との界面は、前記粒
子状物質が特定の薬液によって溶解された結果形成され
た凹部を有しており、前記凹部には無電解メッキ膜のア
ンカーが形成されてなる多層プリント配線板。 2)、前記感光性樹脂は、エポキシ樹脂、エポキシ変性
ポリイミド樹脂、ポリイミド樹脂、フェノール樹脂の中
から選ばれる何れか少なくとも1種である特許請求の範
囲第1項記載の多層プリント配線板。 3)前記粒子状物質は、予め硬化処理された耐熱性樹脂
微粉末あるいは無機質微粒子のいずれか少なくとも1種
である特許請求の範囲第1項あるいは第2項記載の多層
プリント配線板。 4)前記粒子状物質の平均粒径は10μm以下である特
許請求の範囲第1〜3項のいずれかに記載の多層プリン
ト配線板。 5)前記粒子状物質は、前記感光性樹脂固形分100重
量部に対して5〜350重量部配合されてなる特許請求
の範囲第1〜4項のいずれかに記載の多層プリント配線
板。 6)前記特定の薬液は、クロム酸、クロム酸塩、過マン
ガン酸塩、オゾンの中から選ばれる何れか少なくとも1
種を含むものである特許請求の範囲第1〜5項のいずれ
かに記載の多層プリント配線板。 7)前記無電解メッキは、無電解銅メッキ、無電解ニッ
ケルメッキ、無電解金メッキの何れか少なくとも1種で
ある特許請求の範囲第1〜6項のいずれかに記載の多層
プリント配線板。 8)、少なくとも下記(a)〜(d)工程を有すること
を特徴とする多層プリント配線板の製造方法。 (a)硬化後の特性が特定の薬液に対して難溶性である
未硬化の感光性樹脂中に、前記薬液に対して可溶性の粒
子状物質を分散させた混合液を、導体層を有する基板に
塗布して感光性樹脂を形成する工程; (b)前記感光性樹脂の表面の所定の箇所を露光した後
、現像、エッチングする工程; (c)前記特定の薬液を使用して樹脂層の表面部分に存
在している前記粒子状物質を溶解除去し、樹脂層の表面
を粗化する工程; (d)無電解メッキにより導体層を形成する工程。
[Claims] 1) A structure in which a conductor circuit made of an electroless plating film and an insulating layer made of a resin with excellent heat resistance are alternately laminated, and the insulating layer is resistant to a specific chemical solution. The photosensitive resin, which is poorly soluble in water, contains particulate matter that is soluble in the chemical solution, and the interface with the electroless plating film is a result of the particulate matter being dissolved by the specific chemical solution. A multilayer printed wiring board having a recess formed therein, and an anchor of an electroless plating film formed in the recess. 2) The multilayer printed wiring board according to claim 1, wherein the photosensitive resin is at least one selected from epoxy resin, epoxy-modified polyimide resin, polyimide resin, and phenol resin. 3) The multilayer printed wiring board according to claim 1 or 2, wherein the particulate matter is at least one of heat-resistant resin fine powder and inorganic fine particles that have been cured in advance. 4) The multilayer printed wiring board according to any one of claims 1 to 3, wherein the particulate matter has an average particle size of 10 μm or less. 5) The multilayer printed wiring board according to any one of claims 1 to 4, wherein the particulate matter is blended in an amount of 5 to 350 parts by weight based on 100 parts by weight of the photosensitive resin solid content. 6) The specific chemical solution contains at least one selected from chromic acid, chromate, permanganate, and ozone.
The multilayer printed wiring board according to any one of claims 1 to 5, which contains seeds. 7) The multilayer printed wiring board according to any one of claims 1 to 6, wherein the electroless plating is at least one of electroless copper plating, electroless nickel plating, and electroless gold plating. 8) A method for manufacturing a multilayer printed wiring board, comprising at least the following steps (a) to (d). (a) A liquid mixture in which particulate matter soluble in the chemical liquid is dispersed in an uncured photosensitive resin whose properties after curing are poorly soluble in a specific chemical liquid is applied to a substrate having a conductor layer. (b) After exposing a predetermined location on the surface of the photosensitive resin, developing and etching it; (c) Using the specific chemical solution to form a photosensitive resin; A step of dissolving and removing the particulate matter existing on the surface portion and roughening the surface of the resin layer; (d) A step of forming a conductor layer by electroless plating.
JP27227086A 1986-11-14 1986-11-14 Multilayer printed interconnection board and manufacture of the same Granted JPS63126297A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27227086A JPS63126297A (en) 1986-11-14 1986-11-14 Multilayer printed interconnection board and manufacture of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27227086A JPS63126297A (en) 1986-11-14 1986-11-14 Multilayer printed interconnection board and manufacture of the same

Publications (2)

Publication Number Publication Date
JPS63126297A true JPS63126297A (en) 1988-05-30
JPH0455555B2 JPH0455555B2 (en) 1992-09-03

Family

ID=17511507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27227086A Granted JPS63126297A (en) 1986-11-14 1986-11-14 Multilayer printed interconnection board and manufacture of the same

Country Status (1)

Country Link
JP (1) JPS63126297A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3913966A1 (en) * 1988-04-28 1989-11-09 Ibiden Co Ltd ADHESIVE FOR ELECTRO-PLATING AND PRINTED SWITCHING USING THIS ADHESIVE
JPH0298995A (en) * 1988-10-06 1990-04-11 Ibiden Co Ltd Manufacture of multilayer wiring board
JPH02143492A (en) * 1988-11-24 1990-06-01 Ibiden Co Ltd Manufacture of high-density multilayered printed-wiring board
JPH02188992A (en) * 1989-01-18 1990-07-25 Ibiden Co Ltd Multilayer printed wiring board and manufacture thereof
US5344893A (en) * 1991-07-23 1994-09-06 Ibiden Co., Ltd. Epoxy/amino powder resin adhesive for printed circuit board
WO1998047329A1 (en) * 1997-04-15 1998-10-22 Ibiden Co., Ltd. Adhesive for electroless plating, feedstock composition for preparing adhesive for electroless plating, and printed wiring board
US5976762A (en) * 1996-03-06 1999-11-02 Fuji Photo Film Co., Ltd. Photosensitive element and process for producing multilayer printed wiring board
JP2000068642A (en) * 1998-08-25 2000-03-03 Fujitsu Ltd Manufacture of multilayer circuit board
US6835895B1 (en) 1996-12-19 2004-12-28 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7291385B2 (en) 2003-08-05 2007-11-06 Fujifilm Corporation Conductive film and method for preparing the same

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DE3913966B4 (en) * 1988-04-28 2005-06-02 Ibiden Co., Ltd., Ogaki Adhesive dispersion for electroless plating, and use for producing a printed circuit
US5589255A (en) * 1988-04-28 1996-12-31 Ibiden Co., Ltd. Adhesive for electroless plating, printed circuit boards and method of producing the same
DE3913966A1 (en) * 1988-04-28 1989-11-09 Ibiden Co Ltd ADHESIVE FOR ELECTRO-PLATING AND PRINTED SWITCHING USING THIS ADHESIVE
JPH0298995A (en) * 1988-10-06 1990-04-11 Ibiden Co Ltd Manufacture of multilayer wiring board
JPH02143492A (en) * 1988-11-24 1990-06-01 Ibiden Co Ltd Manufacture of high-density multilayered printed-wiring board
JPH02188992A (en) * 1989-01-18 1990-07-25 Ibiden Co Ltd Multilayer printed wiring board and manufacture thereof
US5344893A (en) * 1991-07-23 1994-09-06 Ibiden Co., Ltd. Epoxy/amino powder resin adhesive for printed circuit board
US5447996A (en) * 1991-07-23 1995-09-05 Ibiden Co., Ltd. Adhesive comprising cured amino resin powder for printed circuit board
US5688583A (en) * 1991-07-23 1997-11-18 Ibiden Co., Ltd. Adhesive for printed circuit board
US5741575A (en) * 1991-07-23 1998-04-21 Ibiden Co., Ltd. Adhesive for printed circuit board
US5795618A (en) * 1991-07-23 1998-08-18 Ibiden Co., Ltd Polymerizable adhesive (comprising cured amino resin powder) for print ed circuit board
US5976762A (en) * 1996-03-06 1999-11-02 Fuji Photo Film Co., Ltd. Photosensitive element and process for producing multilayer printed wiring board
US7371976B2 (en) 1996-12-19 2008-05-13 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7585541B2 (en) 1996-12-19 2009-09-08 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
USRE43509E1 (en) 1996-12-19 2012-07-17 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US6930255B2 (en) 1996-12-19 2005-08-16 Ibiden Co., Ltd Printed circuit boards and method of producing the same
US7712212B2 (en) 1996-12-19 2010-05-11 Ibiden Co., Ltd. Method for manufacturing printed wiring board
US7361849B2 (en) 1996-12-19 2008-04-22 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7615162B2 (en) 1996-12-19 2009-11-10 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7385146B2 (en) 1996-12-19 2008-06-10 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7388159B2 (en) 1996-12-19 2008-06-17 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
US7449791B2 (en) 1996-12-19 2008-11-11 Ibiden Co., Ltd. Printed circuit boards and method of producing the same
US6835895B1 (en) 1996-12-19 2004-12-28 Ibiden Co., Ltd. Printed wiring board and method for manufacturing the same
WO1998047329A1 (en) * 1997-04-15 1998-10-22 Ibiden Co., Ltd. Adhesive for electroless plating, feedstock composition for preparing adhesive for electroless plating, and printed wiring board
JP2000068642A (en) * 1998-08-25 2000-03-03 Fujitsu Ltd Manufacture of multilayer circuit board
US7291385B2 (en) 2003-08-05 2007-11-06 Fujifilm Corporation Conductive film and method for preparing the same

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