JPS63118075A - グロ−放電による被覆方法 - Google Patents

グロ−放電による被覆方法

Info

Publication number
JPS63118075A
JPS63118075A JP26523786A JP26523786A JPS63118075A JP S63118075 A JPS63118075 A JP S63118075A JP 26523786 A JP26523786 A JP 26523786A JP 26523786 A JP26523786 A JP 26523786A JP S63118075 A JPS63118075 A JP S63118075A
Authority
JP
Japan
Prior art keywords
gas
film
halide
glow discharge
gaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26523786A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0527707B2 (enrdf_load_stackoverflow
Inventor
Shizuka Yamaguchi
静 山口
Masayuki Doi
昌之 土井
Masao Shimizu
政男 清水
Kazuyoshi Terakado
一佳 寺門
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP26523786A priority Critical patent/JPS63118075A/ja
Publication of JPS63118075A publication Critical patent/JPS63118075A/ja
Publication of JPH0527707B2 publication Critical patent/JPH0527707B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP26523786A 1986-11-07 1986-11-07 グロ−放電による被覆方法 Granted JPS63118075A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26523786A JPS63118075A (ja) 1986-11-07 1986-11-07 グロ−放電による被覆方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26523786A JPS63118075A (ja) 1986-11-07 1986-11-07 グロ−放電による被覆方法

Publications (2)

Publication Number Publication Date
JPS63118075A true JPS63118075A (ja) 1988-05-23
JPH0527707B2 JPH0527707B2 (enrdf_load_stackoverflow) 1993-04-22

Family

ID=17414426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26523786A Granted JPS63118075A (ja) 1986-11-07 1986-11-07 グロ−放電による被覆方法

Country Status (1)

Country Link
JP (1) JPS63118075A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003021650A1 (fr) * 2001-09-03 2003-03-13 Tokyo Electron Limited Procede de formation d'un film
JP2016176127A (ja) * 2015-03-20 2016-10-06 株式会社豊田中央研究所 成膜装置および成膜方法
WO2025089154A1 (ja) * 2023-10-25 2025-05-01 東京エレクトロン株式会社 成膜方法及び成膜装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6148567A (ja) * 1984-08-10 1986-03-10 Hitachi Ltd ガス流量制御方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6148567A (ja) * 1984-08-10 1986-03-10 Hitachi Ltd ガス流量制御方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003021650A1 (fr) * 2001-09-03 2003-03-13 Tokyo Electron Limited Procede de formation d'un film
US7935384B2 (en) 2001-09-03 2011-05-03 Tokyo Electron Limited Film forming method
JP2016176127A (ja) * 2015-03-20 2016-10-06 株式会社豊田中央研究所 成膜装置および成膜方法
WO2025089154A1 (ja) * 2023-10-25 2025-05-01 東京エレクトロン株式会社 成膜方法及び成膜装置

Also Published As

Publication number Publication date
JPH0527707B2 (enrdf_load_stackoverflow) 1993-04-22

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