JPS63115221U - - Google Patents
Info
- Publication number
- JPS63115221U JPS63115221U JP726787U JP726787U JPS63115221U JP S63115221 U JPS63115221 U JP S63115221U JP 726787 U JP726787 U JP 726787U JP 726787 U JP726787 U JP 726787U JP S63115221 U JPS63115221 U JP S63115221U
- Authority
- JP
- Japan
- Prior art keywords
- section
- wafer
- test
- carrier
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 230000003749 cleanliness Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 6
- 238000005406 washing Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
Landscapes
- Sampling And Sample Adjustment (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP726787U JPS63115221U (de) | 1987-01-20 | 1987-01-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP726787U JPS63115221U (de) | 1987-01-20 | 1987-01-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63115221U true JPS63115221U (de) | 1988-07-25 |
Family
ID=30790559
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP726787U Pending JPS63115221U (de) | 1987-01-20 | 1987-01-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63115221U (de) |
-
1987
- 1987-01-20 JP JP726787U patent/JPS63115221U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100390300B1 (ko) | 폴리싱 장치와 폴리싱 방법 및 반도체장치 제조방법 | |
US7063600B2 (en) | Polishing apparatus | |
US4770680A (en) | Wafer carrier for a semiconductor device fabrication, having means for sending clean air stream to the wafers stored therein | |
JP2010010718A (ja) | 半導体基板洗浄システム | |
EP1197990A3 (de) | Waferbehandlungssystem | |
JPS63115221U (de) | ||
US11699609B2 (en) | Automated nozzle cleaning system | |
JPH0560660B2 (de) | ||
JP2019216152A (ja) | 基板搬送システムのためのティーチング装置およびティーチング方法 | |
JPH0866865A (ja) | ポリッシング装置 | |
JPS57211746A (en) | Wafer conveying apparatus | |
US6669750B2 (en) | Access port for house vacuum equipped with removable trap | |
JPS6294627U (de) | ||
JPH0614473Y2 (ja) | 可搬式クリーンベンチ | |
JPS6295712U (de) | ||
JPH0878499A (ja) | ウェーハキャリア自動搬送装置 | |
WO2023084977A1 (ja) | 基板処理装置 | |
KR200189973Y1 (ko) | 다이클리닝 장치 | |
KR0175013B1 (ko) | 진공 트위저를 사용하는 반도체 제조장치 | |
TWI406326B (zh) | 集塵裝置、自動清潔裝置及自動清潔方法 | |
JPS63177035U (de) | ||
JPH11274262A (ja) | ウェーハ搬送システム及び搬送処理方法 | |
JP3628307B2 (ja) | ポリッシング装置及び方法 | |
JPS5840341U (ja) | ウエハ吸着装置 | |
JP3005507U (ja) | キャリアレスウエハ洗浄装置 |