JPS63103031A - レ−ザ−ウラン濃縮用のウラン原子蒸気発生方法とウラン原子蒸気発生装置及び金属ウランタ−ゲツト体 - Google Patents
レ−ザ−ウラン濃縮用のウラン原子蒸気発生方法とウラン原子蒸気発生装置及び金属ウランタ−ゲツト体Info
- Publication number
- JPS63103031A JPS63103031A JP24824086A JP24824086A JPS63103031A JP S63103031 A JPS63103031 A JP S63103031A JP 24824086 A JP24824086 A JP 24824086A JP 24824086 A JP24824086 A JP 24824086A JP S63103031 A JPS63103031 A JP S63103031A
- Authority
- JP
- Japan
- Prior art keywords
- uranium
- laser
- target body
- metallic
- atomic vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052770 Uranium Inorganic materials 0.000 title claims abstract description 192
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 title claims abstract description 191
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 52
- 239000002184 metal Substances 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims description 11
- 150000001224 Uranium Chemical group 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 15
- 230000005284 excitation Effects 0.000 claims description 13
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 230000007246 mechanism Effects 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 3
- 239000004698 Polyethylene Substances 0.000 claims description 2
- -1 polyethylene Polymers 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 claims description 2
- 229920003002 synthetic resin Polymers 0.000 claims 1
- 239000000057 synthetic resin Substances 0.000 claims 1
- 238000010408 sweeping Methods 0.000 abstract description 4
- 238000010894 electron beam technology Methods 0.000 description 14
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 230000006378 damage Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000006837 decompression Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- KUKDDTFBSTXDTC-UHFFFAOYSA-N uranium;hexanitrate Chemical compound [U].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O KUKDDTFBSTXDTC-UHFFFAOYSA-N 0.000 description 1
- 229910002007 uranyl nitrate Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24824086A JPS63103031A (ja) | 1986-10-17 | 1986-10-17 | レ−ザ−ウラン濃縮用のウラン原子蒸気発生方法とウラン原子蒸気発生装置及び金属ウランタ−ゲツト体 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24824086A JPS63103031A (ja) | 1986-10-17 | 1986-10-17 | レ−ザ−ウラン濃縮用のウラン原子蒸気発生方法とウラン原子蒸気発生装置及び金属ウランタ−ゲツト体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63103031A true JPS63103031A (ja) | 1988-05-07 |
| JPH0478694B2 JPH0478694B2 (enrdf_load_stackoverflow) | 1992-12-11 |
Family
ID=17175243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24824086A Granted JPS63103031A (ja) | 1986-10-17 | 1986-10-17 | レ−ザ−ウラン濃縮用のウラン原子蒸気発生方法とウラン原子蒸気発生装置及び金属ウランタ−ゲツト体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63103031A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0361366A (ja) * | 1989-07-28 | 1991-03-18 | Matsushita Electric Ind Co Ltd | レーザースパッタリング装置 |
| JPH04232258A (ja) * | 1990-07-18 | 1992-08-20 | Deutsche Forsch & Vers Luft Raumfahrt Ev | パルスレーザビームを用いる基板上の層の形成方法 |
| JP2010525172A (ja) * | 2007-04-23 | 2010-07-22 | フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー | 真空内で基板上にコーティングを形成するためのアセンブリ |
-
1986
- 1986-10-17 JP JP24824086A patent/JPS63103031A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0361366A (ja) * | 1989-07-28 | 1991-03-18 | Matsushita Electric Ind Co Ltd | レーザースパッタリング装置 |
| JPH04232258A (ja) * | 1990-07-18 | 1992-08-20 | Deutsche Forsch & Vers Luft Raumfahrt Ev | パルスレーザビームを用いる基板上の層の形成方法 |
| JP2010525172A (ja) * | 2007-04-23 | 2010-07-22 | フラウンホッファー−ゲゼルシャフト ツァー フェーデルング デア アンゲバンテン フォルシュング エー ファー | 真空内で基板上にコーティングを形成するためのアセンブリ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0478694B2 (enrdf_load_stackoverflow) | 1992-12-11 |
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