JPS63102236U - - Google Patents
Info
- Publication number
- JPS63102236U JPS63102236U JP19816186U JP19816186U JPS63102236U JP S63102236 U JPS63102236 U JP S63102236U JP 19816186 U JP19816186 U JP 19816186U JP 19816186 U JP19816186 U JP 19816186U JP S63102236 U JPS63102236 U JP S63102236U
- Authority
- JP
- Japan
- Prior art keywords
- plate
- shaped semiconductor
- accommodating part
- view
- supporting member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 16
- 235000012431 wafers Nutrition 0.000 description 9
- 238000000034 method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
Description
第1図〜第10図は本考案の実施例を示すもの
であつて、第1図は半導体ウエハ移換え装置の正
面図、第2図はカムの運動を説明するための第1
図の部分拡大図、第3図は半導体ウエハ支持具の
斜視図、第4図a,b,c,d,e及びfは半導
体ウエハをキヤリアカセツトからカートリツジに
移換える手順を示す断面図、第5図は半導体ウエ
ハを収容したキヤリアカセツトを示し、同図aは
平面図、同図bは正面図、第6図は半導体ウエハ
を収容したカートリツジを示し、同図aは平面図
、同図bは正面図、第7図は半導体ウエハをキヤ
リアカセツトからカートリツジに移換え、CVD
装置に装入する手順を示す概略平面図、第8図a
,b,c及びdは半導体ウエハ移換えの他の手順
を示す概略平面図、第9図は第8図aの概略部分
斜視図、第10図は他の半導体ウエハ移換え装置
の要部正面図である。第11図は市販のキヤリア
カセツトの部分斜視図である。第12図は一般の
カートリツジの斜視図である。
なお図面に示された符号において、1……カー
トリツジ、1a……支柱、1b……補助柱、1e
,2e,43a,44a……溝、1f,2c……
突部、1g,2d……開口部、2,22……キヤ
リアカセツト、3……半導体ウエハ移換え装置、
4……平板、13,14……カム、16……半導
体ウエハ、43,44……アーム、d1,d2…
…溝の幅、P……溝のピツチである。
1 to 10 show an embodiment of the present invention, in which FIG. 1 is a front view of a semiconductor wafer transfer device, and FIG. 2 is a first diagram showing the movement of the cam.
3 is a perspective view of the semiconductor wafer support; FIGS. 4 a, b, c, d, e, and f are sectional views showing the procedure for transferring semiconductor wafers from the carrier cassette to the cartridge; FIG. Figure 5 shows a carrier cassette containing semiconductor wafers, Figure a is a plan view, Figure b is a front view, and Figure 6 shows a cartridge housing semiconductor wafers, Figure a is a plan view and Figure b is a front view. is a front view, and Figure 7 shows the transfer of semiconductor wafers from the carrier cassette to the cartridge, and the CVD process.
Schematic plan view showing the procedure for loading the device, FIG. 8a
, b, c, and d are schematic plan views showing other steps of semiconductor wafer transfer, FIG. 9 is a schematic partial perspective view of FIG. It is a diagram. FIG. 11 is a partial perspective view of a commercially available carrier cassette. FIG. 12 is a perspective view of a general cartridge. In addition, in the symbols shown in the drawings, 1...cartridge, 1a...support column, 1b...auxiliary column, 1e
, 2e, 43a, 44a... groove, 1f, 2c...
Projection, 1g, 2d... Opening, 2, 2 2 ... Carrier cassette, 3... Semiconductor wafer transfer device,
4... Flat plate, 13, 14... Cam, 16... Semiconductor wafer, 43, 44... Arm, d 1 , d 2 ...
...Width of the groove, P...Pitch of the groove.
Claims (1)
々有する第一の収容部と第二の収容部との間で、
前記第一の収容部に収容された前記板状半導体を
取出した後にこの板状半導体を前記第二の収容部
に挿入して収容させる板状半導体移換え装置であ
つて、前記板状半導体を支持する支持部材と、前
記板状半導体の面に垂直方向に前記支持部材を位
置変更させる位置変更手段とを有し、前記第一の
収容部内と前記第二の収容部内とで前記支持部材
の前記位置変更の距離を異ならせる手段が前記位
置変更手段に設けられている板状半導体移換え装
置。 between a first accommodating part and a second accommodating part each having a space for inserting or taking out a plate-shaped semiconductor;
A plate-shaped semiconductor transfer device that takes out the plate-shaped semiconductor housed in the first housing part and then inserts and houses the plate-shaped semiconductor in the second housing part, wherein the plate-shaped semiconductor is It has a supporting member for supporting, and a position changing means for changing the position of the supporting member in a direction perpendicular to the surface of the plate-shaped semiconductor, and the supporting member is moved in the first accommodating part and in the second accommodating part. A plate-shaped semiconductor transfer device, wherein the position changing means is provided with means for varying the distance of the position change.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19816186U JPS63102236U (en) | 1986-12-23 | 1986-12-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19816186U JPS63102236U (en) | 1986-12-23 | 1986-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63102236U true JPS63102236U (en) | 1988-07-02 |
Family
ID=31158598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19816186U Pending JPS63102236U (en) | 1986-12-23 | 1986-12-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63102236U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02145240U (en) * | 1989-05-15 | 1990-12-10 | ||
JPH0348439A (en) * | 1989-07-17 | 1991-03-01 | Tokyo Electron Sagami Ltd | Shifting device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860553A (en) * | 1981-10-05 | 1983-04-11 | Tokyo Denshi Kagaku Kabushiki | Vertical-type automatic plasma processing device |
-
1986
- 1986-12-23 JP JP19816186U patent/JPS63102236U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860553A (en) * | 1981-10-05 | 1983-04-11 | Tokyo Denshi Kagaku Kabushiki | Vertical-type automatic plasma processing device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02145240U (en) * | 1989-05-15 | 1990-12-10 | ||
JPH0348439A (en) * | 1989-07-17 | 1991-03-01 | Tokyo Electron Sagami Ltd | Shifting device |
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