JPS6298632A - パタ−ン検査方法および装置 - Google Patents

パタ−ン検査方法および装置

Info

Publication number
JPS6298632A
JPS6298632A JP60237209A JP23720985A JPS6298632A JP S6298632 A JPS6298632 A JP S6298632A JP 60237209 A JP60237209 A JP 60237209A JP 23720985 A JP23720985 A JP 23720985A JP S6298632 A JPS6298632 A JP S6298632A
Authority
JP
Japan
Prior art keywords
pattern
circuit
outline
contour
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60237209A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564857B2 (de
Inventor
Satoshi Fushimi
智 伏見
Yasuhiko Hara
靖彦 原
Yoshimasa Oshima
良正 大島
Mitsuyoshi Koizumi
小泉　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60237209A priority Critical patent/JPS6298632A/ja
Publication of JPS6298632A publication Critical patent/JPS6298632A/ja
Publication of JPH0564857B2 publication Critical patent/JPH0564857B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
JP60237209A 1985-10-25 1985-10-25 パタ−ン検査方法および装置 Granted JPS6298632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60237209A JPS6298632A (ja) 1985-10-25 1985-10-25 パタ−ン検査方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60237209A JPS6298632A (ja) 1985-10-25 1985-10-25 パタ−ン検査方法および装置

Publications (2)

Publication Number Publication Date
JPS6298632A true JPS6298632A (ja) 1987-05-08
JPH0564857B2 JPH0564857B2 (de) 1993-09-16

Family

ID=17011997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60237209A Granted JPS6298632A (ja) 1985-10-25 1985-10-25 パタ−ン検査方法および装置

Country Status (1)

Country Link
JP (1) JPS6298632A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63244753A (ja) * 1987-03-31 1988-10-12 Toshiba Corp 結晶欠陥認識処理方法
JP2003065971A (ja) * 2001-08-21 2003-03-05 Ibiden Co Ltd パターン検査方法および検査装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63244753A (ja) * 1987-03-31 1988-10-12 Toshiba Corp 結晶欠陥認識処理方法
JP2003065971A (ja) * 2001-08-21 2003-03-05 Ibiden Co Ltd パターン検査方法および検査装置

Also Published As

Publication number Publication date
JPH0564857B2 (de) 1993-09-16

Similar Documents

Publication Publication Date Title
KR900005349B1 (ko) Ic 구조용 다층 패턴의 기하학 체크를 위한 방법 및 장치
US6317512B1 (en) Pattern checking method and checking apparatus
US6347150B1 (en) Method and system for inspecting a pattern
US20070036422A1 (en) Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections
JPS59157505A (ja) パタ−ン検査装置
JP2971628B2 (ja) パターン検査方法及び装置
JPS61212708A (ja) 多層パターン欠陥検出方法及びその装置
JPS6298632A (ja) パタ−ン検査方法および装置
JP2002168799A (ja) パターン欠陥検査方法
US20040228516A1 (en) Defect detection method
JPS6061604A (ja) パタ−ン検査装置
JPS61151410A (ja) パタ−ン欠陥検出方法及びその装置
JPH043820B2 (de)
JPS60154104A (ja) パタ−ン欠陥検査方法及び装置
JP3198105B2 (ja) 自動外観検査装置
JPH063541B2 (ja) パターン検査装置
JPS61140804A (ja) パタ−ン検査装置
JP2819905B2 (ja) 配線パターン検査装置
JPH0617875B2 (ja) パターン検査方法およびその装置
JPH058762B2 (de)
JP2765339B2 (ja) スルーホール検査装置
JP3221861B2 (ja) パターン検査方法及び装置
JPS6138450A (ja) パタ−ン欠陥検査方法および装置
JPH05180618A (ja) 対象物の位置認識方法
JPH02263108A (ja) 欠陥検出方法