JPS6297324A - 気相成長装置 - Google Patents

気相成長装置

Info

Publication number
JPS6297324A
JPS6297324A JP60238037A JP23803785A JPS6297324A JP S6297324 A JPS6297324 A JP S6297324A JP 60238037 A JP60238037 A JP 60238037A JP 23803785 A JP23803785 A JP 23803785A JP S6297324 A JPS6297324 A JP S6297324A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
transparent quartz
infrared ray
quartz tube
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60238037A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0554691B2 (enExample
Inventor
Mikio Takebayashi
幹男 竹林
Masaki Suzuki
正樹 鈴木
Kazuhiro Karatsu
唐津　和裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60238037A priority Critical patent/JPS6297324A/ja
Publication of JPS6297324A publication Critical patent/JPS6297324A/ja
Publication of JPH0554691B2 publication Critical patent/JPH0554691B2/ja
Granted legal-status Critical Current

Links

JP60238037A 1985-10-24 1985-10-24 気相成長装置 Granted JPS6297324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60238037A JPS6297324A (ja) 1985-10-24 1985-10-24 気相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60238037A JPS6297324A (ja) 1985-10-24 1985-10-24 気相成長装置

Publications (2)

Publication Number Publication Date
JPS6297324A true JPS6297324A (ja) 1987-05-06
JPH0554691B2 JPH0554691B2 (enExample) 1993-08-13

Family

ID=17024231

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60238037A Granted JPS6297324A (ja) 1985-10-24 1985-10-24 気相成長装置

Country Status (1)

Country Link
JP (1) JPS6297324A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4790092B1 (ja) * 2010-04-30 2011-10-12 日本碍子株式会社 塗膜乾燥炉
JP2019168669A (ja) * 2018-03-23 2019-10-03 北京創▲いく▼科技有限公司 加熱部材

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158914A (ja) * 1982-03-16 1983-09-21 Semiconductor Res Found 半導体製造装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158914A (ja) * 1982-03-16 1983-09-21 Semiconductor Res Found 半導体製造装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4790092B1 (ja) * 2010-04-30 2011-10-12 日本碍子株式会社 塗膜乾燥炉
WO2011136041A1 (ja) * 2010-04-30 2011-11-03 日本碍子株式会社 塗膜乾燥炉
US8983280B2 (en) 2010-04-30 2015-03-17 Ngk Insulators, Ltd. Coated film drying furnace
EP2566295B1 (en) * 2010-04-30 2019-10-16 NGK Insulators, Ltd. Coating film drying furnace
JP2019168669A (ja) * 2018-03-23 2019-10-03 北京創▲いく▼科技有限公司 加熱部材

Also Published As

Publication number Publication date
JPH0554691B2 (enExample) 1993-08-13

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