JPS6286845A - Manufacture of metal base chip carrier - Google Patents

Manufacture of metal base chip carrier

Info

Publication number
JPS6286845A
JPS6286845A JP22812485A JP22812485A JPS6286845A JP S6286845 A JPS6286845 A JP S6286845A JP 22812485 A JP22812485 A JP 22812485A JP 22812485 A JP22812485 A JP 22812485A JP S6286845 A JPS6286845 A JP S6286845A
Authority
JP
Japan
Prior art keywords
hole
chip carrier
land
holes
metal substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22812485A
Other languages
Japanese (ja)
Other versions
JPH0379867B2 (en
Inventor
Toru Higuchi
徹 樋口
Toshiyuki Yamaguchi
敏行 山口
Takeshi Kano
武司 加納
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP22812485A priority Critical patent/JPS6286845A/en
Publication of JPS6286845A publication Critical patent/JPS6286845A/en
Publication of JPH0379867B2 publication Critical patent/JPH0379867B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0097Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/44Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits

Abstract

PURPOSE:To secure an insulation among a conductor circuit, a through hole plating layer and a metal substrate by forming the outer diameter of a land for the through hole smaller than the inner diameter of the through hole. CONSTITUTION:An insulating layer 3 is laminated on the surface of a metal substrate 2 formed with a plurality of through holes 1, and insulating resin 4 is filled in the holes 1 to form a circuit board 5. Through holes 6 having smaller diameter than the holes 1 are formed concentrically with the holes 1 in the holes 1 of the board 5. A plating layer 7 is formed on the inner periphery of the hole 6, a land 8 continued to the layer 7 is formed on the resin 4, and a conductor circuit 9 continued to the layer 3 is formed on the layer 3, the board 5 is cut along a line passing the hole 6 to form a chip carrier A. In this case, the outer diameter of the land 8 is formed smaller than the inner diameter of the hole 1.

Description

【発明の詳細な説明】 [技術分野] 本発明は、ICパフケージなどの電子素子の基板としで
用いられる金属ベースチップキャリアの製造法に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for manufacturing metal-based chip carriers used as substrates for electronic devices such as IC puff cages.

[背景技術j ICパフケージなどのような電子素子は、半導体チップ
などの電子部品チップをリードフレームに取り付けた状
態で樹脂封止や気Wj封止してパッケージングすること
によって作成されている。そしてこのような電子素子に
あって、端子数の増加に伴って電子部品チップを支持す
るキャリアとしてリードフレームの替わりに配線板を用
いる試みがなされている。さらに端子数の増加に対応し
て端子をキャリアとしての配線板の四方から引き出すよ
うにした試みもなされている。
[Background Art j Electronic devices such as IC puff cages are produced by packaging electronic component chips such as semiconductor chips attached to lead frames by resin sealing or air sealing. As the number of terminals increases in such electronic devices, attempts have been made to use wiring boards instead of lead frames as carriers for supporting electronic component chips. Furthermore, in response to an increase in the number of terminals, attempts have been made to draw out the terminals from all sides of a wiring board serving as a carrier.

第4図はかかる端子を四方から引き出すようにしたチッ
プキャリアAの一例を示すものであり、配線基板5の表
面にリード線用の導体回路9を設けると共に配線基板5
の四方端部にそれぞれ設けた半円状のスルーホール6の
内周にスルーホールメッキ層7を形成してこのスルーホ
ールメッキ層7と導体回路9とを連続させ、配線基板5
の中央部に実装した半導体チップなどの電子部品チップ
11と各導体回路9とをワイヤーポンディングなどボン
ディング12よって後続することによって形成されてい
る。このチップキャリアAはプリント配線などが施され
た配線ボード等の表面に実装され、配線ボードの配線回
路に端子部となるスルーホールメッキ層7を半田付けな
どで接続することによって使用に供される。
FIG. 4 shows an example of a chip carrier A in which such terminals are drawn out from all sides, and a conductive circuit 9 for lead wires is provided on the surface of the wiring board 5.
A through-hole plating layer 7 is formed on the inner periphery of the semicircular through-holes 6 provided at each of the four ends of the wiring board 5, and the through-hole plating layer 7 and the conductor circuit 9 are continuous.
It is formed by bonding 12 such as wire bonding between an electronic component chip 11 such as a semiconductor chip mounted in the center and each conductor circuit 9. This chip carrier A is mounted on the surface of a wiring board etc. on which printed wiring etc. have been applied, and is put into use by connecting the through-hole plating layer 7, which will become a terminal part, to the wiring circuit of the wiring board by soldering etc. .

ここで1.近年の電子部品チップ11の高集積化は発熱
を伴い、この発熱を逃がす工夫が必要とされる。そこで
チップキャリアAを構成する配線基板5を金属板を基板
として作成し、金属基板2の良好な熱伝導性によって電
子部品チップ11の発熱を逃がすことが検討されるとこ
ろである。そしてこのように金属板を基板として第4図
のようなチップキャリアAを製造するにあたっては、金
属基板2とスルーホールメッキM7や導体回路9との絶
縁性を確保する必要があり、例え−trys図、第6図
に示すような方法が提案されている。
Here 1. The recent increase in the degree of integration of electronic component chips 11 is accompanied by heat generation, and it is necessary to devise ways to release this heat generation. Therefore, consideration is being given to creating the wiring board 5 constituting the chip carrier A using a metal plate as a substrate and allowing the heat generated by the electronic component chip 11 to escape due to the good thermal conductivity of the metal board 2. In manufacturing the chip carrier A as shown in FIG. 4 using a metal plate as a substrate, it is necessary to ensure insulation between the metal substrate 2 and the through-hole plating M7 and the conductor circuit 9. A method as shown in FIG. 6 has been proposed.

すなわち、まず第5図(a)及び第6図(a)に示すよ
うに銅板、鉄板、アルミニウム板さらにこれらの合金板
などで形成される金属基板2に貫通孔1を形成する。″
lt通孔1は四角の外形線上に沿って配列されるように
設けられるもので、チップキャリアAの端子数に応じた
個数で設けられる。次に第7図に示すようにこの金属基
板2の表面にプリプレグ13を介して銅箔やアルミニウ
ム箔などの金属箔14を重ね、加熱加圧成形する。プリ
プレグ13はガラス布などを基材としてこれにエポキシ
樹1ffiや7ヱノール樹脂など熱硬化性樹脂のフェス
を含浸して乾燥することによって作成される。
That is, first, as shown in FIGS. 5(a) and 6(a), a through hole 1 is formed in a metal substrate 2 made of a copper plate, an iron plate, an aluminum plate, or an alloy plate thereof. ″
The through holes 1 are provided so as to be arranged along the outline of the square, and are provided in a number corresponding to the number of terminals of the chip carrier A. Next, as shown in FIG. 7, a metal foil 14 such as copper foil or aluminum foil is layered on the surface of this metal substrate 2 via a prepreg 13, and molded under heat and pressure. The prepreg 13 is made by using glass cloth as a base material and impregnating it with a face of a thermosetting resin such as epoxy tree 1ffi or 7-enol resin, and drying it.

このように金属基板2にプリプレグ13と金属箔14と
を重ねて熱圧成形すると、第5図(b)や第6図(b)
に示すようにプリプレグ13内の樹脂が熔融して貫通孔
1内に流入して絶縁樹脂4として貫通孔1内を充填する
ことになると共にプリプレグ13が溶融硬化した絶縁層
3によって金属箔14は金属基板2に積層されることに
なり、配線基板5を作成することができる。そしてこの
配線基板5において貫通孔1の部分で貫通孔1よりも径
の小さいスルーホール6を貫通孔1と同心で貫通形成し
、次いでエツチングなどの常用手段で金属[14を処理
して不要部分を除去しで、第5図(c)のように導体回
路9、導体回路9と連続してスルーホール6の周縁部に
形成されるスルーホール部ランド8及びスルーホール部
ランド8と連続して形成されるメッキリード@15を設
け、さらにメッキリード線15からの通電で第6図(c
)のようにスルーホール6の内周に銅メッキなどの金属
メッキをおこなってスルーホールメッキ層7を設けるよ
うにする。この後に、第5図(c)の値線で示す各貫通
孔1を通る線lで配線基板5の外形打ち抜き加工をおこ
ない、第4図に示すような外周端面に半円状でスルーホ
ールメッキ層7が端子部として露出して形成されたチッ
プキャリアAを得るのである。このよう作成されるチッ
プキャリアAでは、絶縁層3によって導体回路9と金属
基板2との間の絶縁性が、絶縁樹脂4によってスルーホ
ールメッキ層7と金属基板2との間の絶縁性がそれぞれ
確保されることになる。
When the prepreg 13 and the metal foil 14 are stacked and hot-pressed on the metal substrate 2 in this way, the results shown in FIG. 5(b) and FIG. 6(b) are obtained.
As shown in the figure, the resin in the prepreg 13 melts and flows into the through hole 1, filling the through hole 1 as an insulating resin 4, and the metal foil 14 is It will be laminated on the metal substrate 2, and the wiring board 5 can be created. In this wiring board 5, a through hole 6 having a smaller diameter than the through hole 1 is formed concentrically with the through hole 1 at the through hole 1, and then the metal [14 is processed by a common method such as etching to remove unnecessary parts. As shown in FIG. 5(c), the conductor circuit 9 is connected to the through-hole land 8 formed at the periphery of the through-hole 6 and the through-hole land 8 is connected to the conductor circuit 9. A plated lead @ 15 is provided to be formed, and further electricity is supplied from the plated lead wire 15 to form the plated lead @ 15 as shown in Fig. 6 (c
), the inner periphery of the through hole 6 is plated with metal such as copper plating to provide the through hole plating layer 7. After this, the outer shape of the wiring board 5 is punched along the line l passing through each through hole 1 as shown by the value line in FIG. A chip carrier A is obtained in which the layer 7 is exposed as a terminal portion. In the chip carrier A created in this manner, the insulation layer 3 provides insulation between the conductor circuit 9 and the metal substrate 2, and the insulation resin 4 provides insulation between the through-hole plating layer 7 and the metal substrate 2. It will be secured.

しかしこのものにあって、チップキャリアAの側端面は
金属基板2を芯材とした配線基板5の切断端面であるた
めに、第8図に示すように金属基板2の端面が露出して
いることになるところ、外形打ち抜き加工の際にプレス
刃物の打ち抜外方向にスルーホール部ランド8の切断端
部や金属基板2の切Wft端部がだれとして垂れ下がり
、第9図に示すようにこのだれ16によってスルーホー
ル部ランド8と金属基板2との間に接触が生じで、スル
ーホール部ランド8と金属基板2との間が導通状態とな
り、導体回路9やスルーホールメッキ層7と金属基板2
との間の絶縁性が損なわれるおそれがあるという問題が
生じるものであった。
However, in this case, since the side end surface of the chip carrier A is a cut end surface of the wiring board 5 whose core material is the metal substrate 2, the end surface of the metal substrate 2 is exposed as shown in FIG. In particular, during the external punching process, the cut end of the through-hole land 8 and the cut Wft end of the metal substrate 2 hang down in the outward direction of the punching tool, as shown in FIG. Contact occurs between the through-hole land 8 and the metal substrate 2 due to the droop 16, and conduction is established between the through-hole land 8 and the metal substrate 2, and the conductor circuit 9, the through-hole plating layer 7, and the metal substrate 2
This poses a problem in that the insulation between the two may be impaired.

[発明の目的] 本発明は、上記の点に鑑みて為されたものであり、導体
回路やスルーホールメッキ層と金属基板との闇の絶縁性
が損なわれるおそれのないチップキャリアの製造法を提
供することを目的とするものである。
[Objective of the Invention] The present invention has been made in view of the above points, and provides a method for manufacturing a chip carrier that is free from the risk of impairing the insulation between the conductor circuit or through-hole plating layer and the metal substrate. The purpose is to provide

[発明の開示] しかして本発明に係るチップキャリアの製造法は、複数
の貫通孔1を設けた金属基板2の表面に絶縁層3を積層
すると共に各貫通孔1内に絶縁樹脂4を充填して配線基
板5を作成し、この配線基板5の貫通孔1内に貫通孔1
の径よりも小さなスルーホール6を貫通孔1と同心で貫
通形成し゛、スルーホール6の内周にスルーホールメッ
キ層7を、絶縁樹脂4の表面にスルーホールメッキJ1
17と連続するスルーホール部ランド8を、絶縁N3の
表面にスルーホール部ランド8と連続する導体回路9を
それぞれ設けた後に、配線基板5をスルーホール6を通
る線で切断してチップキャリアAを作成するにあたって
、スルーホール部ランド8の外径を貫通孔1の内径より
も小さな寸法に形成することを特徴とするものであり、
スルーホール部フンド8の外径を貫通孔1の内径よりも
小さな寸法に形成するようにして外形切断時のだれがス
ルーホール部ランド8と金属基板2どの間で作用するこ
とがないようにしたものであって、以下本発明を実施例
により詳述する。
[Disclosure of the Invention] The method for manufacturing a chip carrier according to the present invention includes laminating an insulating layer 3 on the surface of a metal substrate 2 provided with a plurality of through holes 1, and filling each through hole 1 with an insulating resin 4. to create a wiring board 5, and insert through holes 1 into through holes 1 of this wiring board 5.
A through hole 6 smaller in diameter than the through hole 6 is formed concentrically with the through hole 1, a through hole plating layer 7 is formed on the inner circumference of the through hole 6, and a through hole plating layer J1 is formed on the surface of the insulating resin 4.
After providing a through-hole land 8 continuous with the through-hole land 8 and a conductor circuit 9 continuous with the through-hole land 8 on the surface of the insulation N3, the wiring board 5 is cut along a line passing through the through-hole 6 to form a chip carrier A. In producing the through-hole land 8, the outer diameter of the through-hole land 8 is smaller than the inner diameter of the through-hole 1.
The outer diameter of the through-hole fund 8 is formed to be smaller than the inner diameter of the through-hole 1, so that there is no interference between the through-hole land 8 and the metal substrate 2 when the outer diameter is cut. The present invention will now be explained in detail with reference to Examples.

配線基板5は前述の第5 UjJ(a)(b)(c)や
第6図〈a)(bHc)、第7図に示したと同様にして
作成することができる。そして第5図(b)や第6図(
b)のように配線基板5を作成し、この配線基板5にお
いて円孔に形成される貫通孔1の中央にて貫通孔1と同
心に円孔のスルーホール6を9設し、次いでエツチング
などの常用手段で金属M14を処理して不要部分を除去
して、配線基板5の絶縁層3の表面に導体回路9を、絶
縁樹脂4の表面に導体回路9と連続してスルーホール6
の周縁部にリング状に形成されるスルーホール部ランド
8を、絶縁層3の表面にスルーホール部ランド8と連続
して形成されるメッキリード線15をそれぞれ設ける。
The wiring board 5 can be produced in the same manner as shown in the above-mentioned 5th UjJ (a), (b), and (c), FIGS. 6(a) (bHc), and FIG. 7. And Figures 5(b) and 6(
A wiring board 5 is prepared as shown in b), and nine circular through holes 6 are formed in the center of the through hole 1 formed in the circular hole in the wiring board 5 concentrically with the through hole 1, and then etching etc. The metal M14 is processed by a conventional method to remove unnecessary parts, and a conductor circuit 9 is formed on the surface of the insulating layer 3 of the wiring board 5, and a through hole 6 is formed on the surface of the insulating resin 4 continuously with the conductor circuit 9.
A through-hole land 8 formed in a ring shape is provided on the peripheral edge of the insulating layer 3, and a plated lead wire 15 is provided continuous with the through-hole land 8 on the surface of the insulating layer 3.

このとき、第2図に示すようにスルーホール部ランl/
8はその外形が貫通孔lと同心円になるように形成され
るもので、さらにスルーホール部ランド8の外径寸法は
貫通孔1の内径寸法よりも小さな寸法に形成されるもの
である。そしてメッキリード線15からの通電で第6図
(e)のようにスルーホール6の内周に銅メッキなどの
金属メッキをおこなってスルーホールメッキ層7を設け
るようにする。
At this time, as shown in FIG.
8 is formed so that its outer shape is concentric with the through hole l, and the outer diameter of the through hole land 8 is smaller than the inner diameter of the through hole 1. Then, by applying electricity from the plating lead wire 15, metal plating such as copper plating is applied to the inner periphery of the through hole 6 to form a through hole plating layer 7, as shown in FIG. 6(e).

このようにして配線基板5にスルーホールメッキ層7や
スルーホール部ランド8及び導体回路9を形成したのち
に、第5図(e)及び第2図に鎖線で示す各スルーホー
ル6を通る線lで配線基板5を打ち抜き切断加工して、
第4図のような外径加工されたチップキャリアAを得る
ことができるのである。そしてこのように配線基板5を
打ち抜きで切断加工するにあたって、チップキャリアA
の切断端面において打ち抜き方向に沿って第9図におい
て既に説明したようにスルーホール部ランド8の切断端
面や金属基板2の切断端面にだれ16が生じても、第1
図に示すようにスルーホール部ラン)8の外径aは貫通
孔1の内径すよりも小さく、スルーホール部ランド8と
金属基板2との間で表裏方向に重複する部分がなく、ス
ルーホール部ランド8の切断端面に発生するだれ16が
金属基板2の切断端面に接触したり、金属基板2の切断
端面に発生するだれ1Gがスルーホール部ランド8の切
断端面に接触したりすることを防止することができるこ
とになる。従ってスルーホール部ランド8と金属基板2
との間の短絡を防止して、導体回路9やスルーホールメ
ッキM 7と金属基板2との間の絶縁性が損なわれるこ
とを防止することができるものである。
After forming the through-hole plating layer 7, through-hole lands 8, and conductor circuits 9 on the wiring board 5 in this manner, a line passing through each through-hole 6 shown by a chain line in FIG. 5(e) and FIG. Punch and cut the wiring board 5 with l,
A chip carrier A whose outer diameter is machined as shown in FIG. 4 can be obtained. In this way, when cutting the wiring board 5 by punching, the chip carrier A
As already explained in FIG. 9, even if sag 16 occurs on the cut end surface of the through-hole portion land 8 or the cut end surface of the metal substrate 2 along the punching direction, the first
As shown in the figure, the outer diameter a of the through-hole land 8 is smaller than the inner diameter a of the through-hole 1, and there is no overlap between the through-hole land 8 and the metal substrate 2 in the front and back directions, and the through-hole This prevents the sag 16 generated on the cut end surface of the through-hole portion land 8 from coming into contact with the cut end surface of the metal substrate 2, and the sag 1G generated on the cut end surface of the metal substrate 2 coming into contact with the cut end surface of the through-hole portion land 8. This can be prevented. Therefore, through-hole land 8 and metal substrate 2
It is possible to prevent a short circuit between the metal substrate 2 and the conductive circuit 9 or the through-hole plating M 7 from being impaired.

そしてこのものでは、スルーホール部ランド8の外径を
貫通孔1の内径よりも小さく形成することでスルーホー
ル部ランド8と金属基板2との間の短絡を防止し、導体
回路9やスルーホールメッキ層7と金属基板2との間の
絶縁性が損なわれることを防止することができるもので
あって、スルーホール6の径を小さくするような必要は
なく、チップキャリアAの端子部となるスルーホールメ
ッキ層7の壁面面積は十分に確保することかでb、チッ
プキャリア八をプリントボードなどに実装する際の接続
信頼性を低下させることはないものである。さらにスル
ーホール部ランド8の外径が貫通孔1の内径よりも小さ
いために、スルーホール部ランド8と金属基板2との絶
縁距離を大きく確保できることになり、このスルーホー
ル部ランド8にメッキリード線15を接続してスルーホ
ールメッキ層7を形成する際のメッキリード線15と金
属基板2との間の短絡も確実に防止されることになる。
In this case, by forming the outer diameter of the through-hole land 8 smaller than the inner diameter of the through-hole 1, a short circuit between the through-hole land 8 and the metal substrate 2 is prevented, and the conductor circuit 9 and the through-hole This can prevent the insulation between the plating layer 7 and the metal substrate 2 from being impaired, and there is no need to reduce the diameter of the through hole 6, which serves as a terminal part of the chip carrier A. By ensuring a sufficient wall area of the through-hole plating layer 7, connection reliability will not be reduced when the chip carrier 8 is mounted on a printed board or the like. Furthermore, since the outer diameter of the through-hole land 8 is smaller than the inner diameter of the through-hole 1, it is possible to secure a large insulation distance between the through-hole land 8 and the metal substrate 2. A short circuit between the plated lead wire 15 and the metal substrate 2 when the through-hole plated layer 7 is formed by connecting the wire 15 is also reliably prevented.

[発明の効果] 上述のように本発明にあっては、配線基板をスルーホー
ルを通る線で切断してチップキャリアを作成するにあた
って、スルーホール部ランドの外径を貫通孔の内径より
も小さな寸法に形成するようにしたので、チップキャリ
アの切断端面において打ち抜き方向にスルーホール部ラ
ンドの切断端面や金属基板の切断端面にだれが生じても
、スルーホール部ランドと金属基板との間で表裏方向に
重複する部分がなく、スルーホール部ランドや金属基板
の切断端面に発生するだれでスルーホール部ランドと金
属基板との間の短絡が生じるおそれがないものであって
、導体回路やスルーホールメッキ層と金属基板との間の
絶縁性が損なわれることを防止することがで慇るもので
ある。
[Effects of the Invention] As described above, in the present invention, when cutting a wiring board along a line passing through a through hole to create a chip carrier, the outer diameter of the through hole land is made smaller than the inner diameter of the through hole. Since the cut end surface of the chip carrier is formed in the punching direction, even if there is a drop on the cut end surface of the through-hole land or the cut end surface of the metal substrate, there will be no difference between the front and back sides between the through-hole land and the metal substrate. There is no overlapping part in the direction, and there is no risk of short circuit between the through-hole land and the metal board due to droop that occurs on the through-hole land or the cut end surface of the metal board, and there is no risk of short circuit between the through-hole land and the metal board. It is advantageous to prevent the insulation between the plating layer and the metal substrate from being impaired.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によって製造したチップキャリアの一部
の拡大斜視図、#S2図は同上の一部の平面図、第3図
は同上の正面図、第4図はチップキャリアの斜視図、第
5図(a)(b)(c)はチップキャリアの製造の各工
程での平面図、第6図(a)(b)(c)は同上の製造
の各工程での一部の拡大断面図、第7図は同上の製造の
一工程での一部の拡大分解断面図、第8図は従来例のチ
ップキャリアの一部の拡大斜視図、$9図は18図のL
−L線の断面図である。 1は貫通孔、2は金属基板、3は絶縁層、4は絶縁樹脂
、5は配線基板、6はスルーホール、7はスルーホール
メッキ層、8はスルーホール部ランド、9は導体回路で
ある。
FIG. 1 is an enlarged perspective view of a part of a chip carrier manufactured according to the present invention, #S2 is a plan view of a part of the same, FIG. 3 is a front view of the same, and FIG. 4 is a perspective view of the chip carrier. Figure 5 (a), (b), and (c) are plan views of each step in the manufacturing of the chip carrier, and Figure 6 (a), (b), and (c) are enlarged views of parts of the same manufacturing steps. 7 is an enlarged exploded sectional view of a part of the same manufacturing process, FIG. 8 is an enlarged perspective view of a part of the conventional chip carrier, and Figure 9 is the L of Figure 18.
- It is a sectional view taken on the L line. 1 is a through hole, 2 is a metal substrate, 3 is an insulating layer, 4 is an insulating resin, 5 is a wiring board, 6 is a through hole, 7 is a through hole plating layer, 8 is a through hole land, and 9 is a conductor circuit. .

Claims (1)

【特許請求の範囲】[Claims] (1)複数の貫通孔を設けた金属基板の表面に絶縁層を
積層すると共に各貫通孔内に絶縁樹脂を充填して配線基
板を作成し、この配線基板の貫通孔内に貫通孔の径より
も小さなスルーホールを貫通孔と同心で貫通形成し、ス
ルーホールの内周にスルーホールメッキ層を、絶縁樹脂
の表面にスルーホールメッキ層と連続するスルーホール
部ランドを、絶縁層の表面にスルーホール部ランドと連
続する導体回路をそれぞれ設けた後に、配線基板をスル
ーホールを通る線で切断してチップキャリアを作成する
にあたって、スルーホール部ランドの外径を貫通孔の内
径よりも小さな寸法に形成することを特徴とする金属ベ
ースチップキャリアの製造法。
(1) Create a wiring board by laminating an insulating layer on the surface of a metal board with multiple through holes and filling each through hole with insulating resin. A smaller through hole is formed concentrically with the through hole, a through hole plating layer is formed on the inner periphery of the through hole, and a through hole land that is continuous with the through hole plating layer is placed on the surface of the insulating resin. After providing conductor circuits continuous with the through-hole lands, cut the wiring board along the lines passing through the through-holes to create a chip carrier. A method for manufacturing a metal-based chip carrier, characterized by forming a metal-based chip carrier.
JP22812485A 1985-10-14 1985-10-14 Manufacture of metal base chip carrier Granted JPS6286845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22812485A JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22812485A JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Publications (2)

Publication Number Publication Date
JPS6286845A true JPS6286845A (en) 1987-04-21
JPH0379867B2 JPH0379867B2 (en) 1991-12-20

Family

ID=16871586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22812485A Granted JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Country Status (1)

Country Link
JP (1) JPS6286845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100209263B1 (en) * 1996-12-31 1999-07-15 이해규 Chip carrier and its manufacturing method, semiconductor accessory using its chip carrier

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100209263B1 (en) * 1996-12-31 1999-07-15 이해규 Chip carrier and its manufacturing method, semiconductor accessory using its chip carrier

Also Published As

Publication number Publication date
JPH0379867B2 (en) 1991-12-20

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