JPS6286846A - Manufacture of chip carrier - Google Patents

Manufacture of chip carrier

Info

Publication number
JPS6286846A
JPS6286846A JP22812585A JP22812585A JPS6286846A JP S6286846 A JPS6286846 A JP S6286846A JP 22812585 A JP22812585 A JP 22812585A JP 22812585 A JP22812585 A JP 22812585A JP S6286846 A JPS6286846 A JP S6286846A
Authority
JP
Japan
Prior art keywords
hole
wiring board
chip carrier
line
plating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22812585A
Other languages
Japanese (ja)
Inventor
Toru Higuchi
徹 樋口
Toshiyuki Yamaguchi
敏行 山口
Takeshi Kano
武司 加納
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP22812585A priority Critical patent/JPS6286846A/en
Publication of JPS6286846A publication Critical patent/JPS6286846A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0097Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/241Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To reduce an exfoliation occurring at a through hole plating layer in case of cutting a circuit board by cutting the board along a line displaced from the center of the hole to cut the board along a line passing the hole to form a chip carrier. CONSTITUTION:A round through hole 2 is formed in an insulating substrate 1, a through hole plating layer 3 is formed on the inner periphery of the hole 2, and a conductor circuit 3 continued to the layer 3 is formed on the substrate 1 to form a circuit board 5. The board 5 is punched by a line l passing the hole 2. At this time, the line l is displaced from the center O of the circle of the hole 2, the layer 3 is exposed to form the circular arc section of nonsemicircular shape, and the layer 3 is used as a terminal of a chip carrier A.

Description

【発明の詳細な説明】 [技術分野1 本発明は、ICパッケージなどの電子素子の基板として
用いられるチップキャリアの製造法に関するものである
DETAILED DESCRIPTION OF THE INVENTION [Technical Field 1] The present invention relates to a method for manufacturing a chip carrier used as a substrate for an electronic device such as an IC package.

[背弁扶術] ICパッケージなどのような電子素子は、半導体チップ
などの電子部品チップをリードフレームに取り付けた状
態で樹脂封止や気密封止してパフケーソングすることに
よって作成されている。そしてこのような電子素子にあ
って、端子数の増加に伴って電子部品チップを支持釘る
キャリアとしてリードフレームの替わりに配線板を用い
る試みがなされている。さらに端子数の増加に対応して
端子をキャリアとしての配#i@の四方から引き出すよ
うにした試みもなされている。
[Back valve technique] Electronic devices such as IC packages are manufactured by attaching an electronic component chip such as a semiconductor chip to a lead frame, sealing it with resin or airtight, and then puffing it. As the number of terminals for such electronic devices increases, attempts have been made to use wiring boards instead of lead frames as carriers for supporting electronic component chips. Furthermore, in response to an increase in the number of terminals, attempts have been made to draw out the terminals from all sides of the wiring #i@ as a carrier.

第5図はかかる端子を四方から引き出すようにしたチッ
プキャリアAの一例を示すものであり、配線基板5の表
面にリード線用の導体回路4を設けると共に配線基板5
の四方端部にそれぞれ設けた半円状のスルーホール2の
内周にスルーホールメッキN3を形成してこのスルーホ
ール/ツキ層3と導体回路4とを連続させ、配線基板5
の中央部に実装した半導体チップなどの電子部品チップ
11と各導体回路4とをワイヤーボンディングなどボン
ディング12よって接続することによって形成されてい
る。このチップキャリアAはプリント配線などが施され
た配線ボード等の表面に実装され、配線ボードの配線回
路に端子部となるスルーホールメッキ層3を半田付けな
どで接続することによって使用に供される。
FIG. 5 shows an example of a chip carrier A in which such terminals are drawn out from all sides, and a conductive circuit 4 for lead wires is provided on the surface of the wiring board 5.
Through-hole plating N3 is formed on the inner periphery of the semicircular through-holes 2 provided at the four ends of the wiring board 5, and the through-hole/stack layer 3 and the conductor circuit 4 are connected to each other.
It is formed by connecting an electronic component chip 11 such as a semiconductor chip mounted in the center of the board to each conductor circuit 4 by bonding 12 such as wire bonding. This chip carrier A is mounted on the surface of a wiring board etc. on which printed wiring etc. are applied, and is put into use by connecting the through-hole plating layer 3, which will serve as a terminal part, to the wiring circuit of the wiring board by soldering etc. .

このtJIJ5図に示すチップキャリアAを製造するに
あたっては第6図、第7図に示すようにしておこなわれ
る。すなわち、まず第6図(a)に示すように絶縁基板
1の表面にt14Mやアルミニウム箔などの金属箔14
を8!1層接着する。絶縁基@1は、例えばガラス布な
どを基材としてこれにエポキシ樹脂やフェノール樹脂な
ど熱硬化性樹脂のフェスを含浸して乾燥することによっ
て作成されるプリプレグを複数枚重ねて加熱加圧成形す
ることによって得られるもので、この成形の際にプリプ
レグの最外層表面に金属箔14を重ねた状態で加熱加圧
成形をおこなうことによって、絶縁基板1の成形と同時
に金属箔14の積層をもおこなうことができる6絶縁基
板1としては金属板を基板として表面に絶M 01 W
t Mを設けるようにしたものら用いることができ、こ
のように金属板を基板とすることによって、金属板の優
れた熱伝導性で電子部品チップの発熱を良好に放熱させ
ることのできるチップキャリアを作成することができる
The manufacturing of the chip carrier A shown in FIG. 5 is carried out as shown in FIGS. 6 and 7. That is, first, as shown in FIG. 6(a), a metal foil 14 such as t14M or aluminum foil is coated on the surface of the insulating substrate 1.
Glue 8!1 layer. The insulating base @1 is made by stacking multiple sheets of prepreg made by impregnating a glass cloth or the like with a thermosetting resin face such as epoxy resin or phenol resin and drying it, then molding it under heat and pressure. During this molding, the metal foil 14 is laminated at the same time as the insulating substrate 1 is molded by performing heat and pressure molding with the metal foil 14 overlaid on the surface of the outermost layer of the prepreg. 6 As the insulating substrate 1, a metal plate is used as the substrate and the surface is absolutely M01W.
tM can be used, and by using a metal plate as a substrate in this way, the chip carrier can effectively dissipate the heat generated by the electronic component chip due to the excellent thermal conductivity of the metal plate. can be created.

次ぎにこのように金属箔14を積層した絶縁基板1に第
6図(b)のように表裏に貫通する丸孔のスルーホール
2を穿設加工する。スルーホール2は四角を構成する線
上に複数個設けられるものである。こののちにエツチン
グなどの常用手段で金属@14を処理して不要部分を除
去して、第7図のように導体回路4、導体回路4と連続
してスルーホール2の周縁部に形成されるスルーホール
部ランド8及びスルーホール部ランド8と連続して形成
されるメッキリード線15を設け、さらにメッキリード
線15からの通電で第6図(c)のようにスルーホール
2の内周に銅メッキなどの金属メッキをおこなってスル
ーホールメッキ層3を設けるようにする。このようにし
て第7図のような絶縁基板1に導体回路4、スルーホー
ル部ランド8、メッキリード線15が施された配線基板
5を得ることができる。この後に、第7図の鎖線で示す
各スルーホール2を通る線lで配線基板5の外形打ち抜
き加工をおこない、第5図に示すような外周端面におい
て半円状のスルーホール2に設けられたスルーホール7
71層3が端子部として露出するチップキャリアAを得
るのである。
Next, as shown in FIG. 6(b), round through holes 2 are formed in the insulating substrate 1 on which the metal foils 14 are laminated in this manner, penetrating both sides. A plurality of through holes 2 are provided on a line forming a square. Thereafter, the metal @ 14 is processed by common means such as etching to remove unnecessary parts, and a conductor circuit 4 is formed at the periphery of the through hole 2 in continuity with the conductor circuit 4 as shown in FIG. A through-hole land 8 and a plated lead wire 15 formed continuously with the through-hole land 8 are provided, and electricity is applied from the plated lead wire 15 to the inner periphery of the through hole 2 as shown in FIG. 6(c). The through-hole plating layer 3 is provided by performing metal plating such as copper plating. In this way, it is possible to obtain a wiring board 5 in which a conductive circuit 4, through-hole lands 8, and plated lead wires 15 are provided on an insulating board 1 as shown in FIG. After this, the outer shape of the wiring board 5 is punched along a line l passing through each through hole 2 shown by the chain line in FIG. 7, and semicircular through holes 2 are formed on the outer peripheral end surface as shown in FIG. Through hole 7
A chip carrier A is obtained in which the 71 layer 3 is exposed as a terminal portion.

そしてこのように配線基板5を外径打ち抜き加工をおこ
なうにあたって従来は、配線基板5は各スルーホール2
の円の中心を通るM&lで切断されるようにしていたが
、このように配線基板5をスルーホール2の中心を通る
mlで打ち抜き切断をすると、第8図にC矢印で示すよ
うにスルーホールメッキ層3がスルーホール2の内周面
から剥離し、スルーホールメツ!fI饅3をチップキャ
リアAの端子部として用いる場合の信頼性が低下すると
いう問題が発生するものであった。このスルーホールメ
ッキ層3の剥離は、スルーホール2の中心を通る線pで
切断をおこなうことによって切断はスルーホールメッキ
層3を最も厚みの薄い部分に、おいておこなわれること
になり、切断の際の応力がスルーホールメッキ層3の最
も17みの薄くなる切断端面に作用することでスルーホ
ールメッキ層3を座屈変形させることになるなどの理由
によって発生するものであろと考りられろ、従って、配
線基板5の厚みが厚くなると、特に厚みが0.8IB−
程度以上になると、配線基板5を切断する際の応力がス
ルーホールメッキM3に大きく加わって、スルーホール
/ツキ層3の剥離が発生し易くなるものであった。
Conventionally, when punching the outer diameter of the wiring board 5 in this way, the wiring board 5 has been punched through each through hole 2.
However, if the wiring board 5 is punched and cut at ml passing through the center of the through-hole 2, the through-hole will be cut as shown by arrow C in Fig. 8. The plating layer 3 peels off from the inner peripheral surface of the through hole 2, causing the through hole to fail! When the fI rice cake 3 is used as a terminal portion of the chip carrier A, a problem arises in that reliability is reduced. This peeling of the through-hole plating layer 3 is performed by cutting along the line p passing through the center of the through-hole 2, so that the through-hole plating layer 3 is cut at the thinnest part. This is thought to be caused by the fact that the stress applied to the thinnest cut end surface of the through-hole plating layer 3 causes the through-hole plating layer 3 to buckle. , Therefore, when the thickness of the wiring board 5 increases, especially when the thickness becomes 0.8IB-
If the temperature exceeds this level, a large amount of stress is applied to the through-hole plating M3 when cutting the wiring board 5, and peeling of the through-hole/plating layer 3 is likely to occur.

[発明の目的] 本発明は、上記の点に鑑みて為されたものであり、配線
基板を切断する際にスルーホールメッキ層に生じる剥離
を低減することができるチップキャリアの製造法を提供
することを目的とするものである。
[Object of the Invention] The present invention has been made in view of the above points, and provides a method for manufacturing a chip carrier that can reduce peeling that occurs in the through-hole plating layer when cutting a wiring board. The purpose is to

[発明の開示1 しかして本発明に係るチップキャリアの製造法は、絶縁
基板1に丸孔のスルーホール2を貫通形成し、スルーホ
ール2の内周にスルーホールメッキNJ3を、絶縁基板
1の表面にスルーホールメッキM3と接続される導体回
路4をそれぞれ設けて配線基板5を作成し、この配線基
板5をスルーホ−ル2を通りかつスルーホール2の中心
から外れる線で切断することを特徴とするものであり、
配線基板5をスルーホール2の中心から外れる線で切断
するようにしてスルーホールメッキ層3の剥離が低減さ
れるようにしたものであって、以下本発明を実施例によ
り詳述する。
[Disclosure of the Invention 1 The method for manufacturing a chip carrier according to the present invention is to form a circular through hole 2 in an insulating substrate 1, and to apply through hole plating NJ3 on the inner periphery of the through hole 2 to the insulating substrate 1. A wiring board 5 is prepared by providing conductor circuits 4 connected to the through-hole plating M3 on the surface thereof, and the wiring board 5 is cut along a line that passes through the through-hole 2 and deviates from the center of the through-hole 2. and
The wiring board 5 is cut along a line that deviates from the center of the through hole 2 to reduce peeling of the through hole plating layer 3.The present invention will be described in detail below with reference to examples.

配線基板5は前述の第6図(a)(b)(c)や第7図
に示したと同様にして作成することができる。そして前
述したように、第6図(b)のように絶縁基板1に金属
箔14を積層して配線基板5を作成し、この配線基板5
において丸孔のスルーホール2を四角を構成する線上で
複数穿設し、次いでエツチングなどの常用手段で金属箔
14を処理して不要部分を除去して、配線基!!i5の
表面に導体回路4を、導体回路4と連続してスルーホー
ル9の周縁部にリング状に形成されるスルーホール部ラ
ンド8を、スルーホール部ランド8と連続して形成され
るメッキリード線15をそれぞれ設ける。こののちにメ
ッキ+7−)’#i15からの通電で第6図(C)のよ
うにスルーホール2の内周に全面に亘って銅メッキなど
の金属メッキをおこなってスルーホールメッキ層3を設
けるようにする。
The wiring board 5 can be produced in the same manner as shown in FIGS. 6(a), 6(b), and 7(c) and FIG. 7 described above. Then, as described above, the wiring board 5 is created by laminating the metal foil 14 on the insulating board 1 as shown in FIG. 6(b).
Then, a plurality of round through holes 2 are drilled along the lines forming the square, and then the metal foil 14 is processed by conventional means such as etching to remove unnecessary parts, and the wiring base! ! A conductor circuit 4 is formed on the surface of i5, a through-hole land 8 is formed in a ring shape at the periphery of the through-hole 9 continuous with the conductor circuit 4, and a plated lead is formed continuously with the through-hole land 8. A line 15 is provided respectively. After this, by applying current from plating +7-)'#i15, metal plating such as copper plating is applied to the entire inner circumference of the through-hole 2 as shown in Fig. 6 (C) to form a through-hole plating layer 3. Do it like this.

このようにして配線基板5にスルーホールメッキ層3や
スルーホール部ランド8及び導体回路4を形成したのち
に、第1図(a)に鎖線で示す各スルーホール2を通る
4[で配線基板5を打ち抜き切断加工して、第5図のよ
うな外径加工されたチップキャリアAを得ることができ
るのである。このとき、線Iは各スルーホール2の円の
中心Oを外れるように設定されるものであり、この線l
に沿って配線基板5を切断することによって第2図に示
すように半円ではない円弧の断面形状にスルーホールメ
ッキ層3を露出させて、この露出したスルーホールメッ
キ層3をチップキャリアAの端子部として用いるもので
ある。
After forming the through-hole plating layer 3, through-hole land 8, and conductor circuit 4 on the wiring board 5 in this way, the wiring board By punching and cutting 5, a chip carrier A having an outer diameter as shown in FIG. 5 can be obtained. At this time, the line I is set so as to deviate from the center O of the circle of each through hole 2, and this line I
By cutting the wiring board 5 along the lines shown in FIG. It is used as a terminal section.

このように配線基板5の切断をスルーホール2の中心を
外したllAlに沿って切断するようにすると、第1図
(b)に示されるようにスルーホール2の中心0を通る
線10で切断をおこなう場合にスルーホールメッキ層3
が切断される切断端面の幅aよりも切Wr端面の幅すを
大きくすることができ、スルーホールメッキM3を厚い
厚みでり断できることになり、配線基板5を切断する際
の応力にこのスルーホールメッキ層3の面積大きくなる
切断端面が酎えて、スルーホールメッキM3が座屈され
たり破i!!されたりしてスルーホール2内周面から剥
離針るようなことを防止できることになるものである。
If the wiring board 5 is cut along llAl, which is off the center of the through hole 2, as shown in FIG. Through-hole plating layer 3
The width of the cut Wr end surface can be made larger than the width a of the cut end surface where the wiring board 5 is cut, and the through-hole plating M3 can be cut with a large thickness. The cut end surface of the hole plating layer 3 becomes larger in area, causing the through hole plating M3 to buckle or break! ! This makes it possible to prevent the peeling needle from coming off the inner peripheral surface of the through hole 2 due to the peeling.

このとき線lのスルーホール2の中心からずれる方向は
配線基[5のチップキャリアAとなるべき部分の外画寄
りと内側寄りとのいずれでもよい。
At this time, the direction in which the line 1 is deviated from the center of the through hole 2 may be either toward the outside of the portion of the wiring base [5 that is to become the chip carrier A] or toward the inside.

そして配線基板5の絶縁基板1の厚みが大きくなるに従
って切断の際の応力も大きくなるために、スルーホール
2の中心からの切断線lの変位量を大きくとる必要があ
る。すなわち、第3図に示すようにスルーホール2の半
径をR(mm)、スルーホール2の中心Oを通る線ムが
らMAlを変位させるべき寸法をr(m−)とし、そし
てx=r/RXJOOとして定義すると、すなわち×を
M/を線1゜がちスルーホールの半径Rの何%の寸法で
ずらせるべきかの数値とすると、絶縁基板1の厚みL(
mm)に対して次の式を満足するXに適合するようにM
a2の位置を設定するようにするのがよい。
As the thickness of the insulating substrate 1 of the wiring board 5 increases, the stress during cutting also increases, so it is necessary to increase the amount of displacement of the cutting line l from the center of the through hole 2. That is, as shown in FIG. 3, the radius of the through hole 2 is R (mm), the dimension by which MAl should be displaced along the line passing through the center O of the through hole 2 is r (m-), and x=r/ If defined as RXJOO, that is, if x is the value of the percentage of the radius R of the through hole by which M/ should be shifted by 1°, then the thickness L of the insulating substrate 1 (
M so that it fits X that satisfies the following formula for mm)
It is preferable to set the position of a2.

100>x≧(200/11)Xt−i00/11この
Xとtとの関係を図で示すと第4図のようになり、左右
の斜#i領域内に入るようにXの数値を選択すればよい
。尚、第3図において線ρ。より右側を配線基板5のチ
ップキャリアAとなるべき部分の外側寄りとして、@ 
1 oより左側を配線基板5のチップキャリアAとなる
べき部分の内側寄りとしてそれぞれ示し、またMS4図
においで中心より右側を配411.基板5のチップキャ
リアAとなるべき部分の外側寄りとして、中心より左側
を配線基板5のチップキャリアAとなるべき部分の内側
寄りとしてそれぞれ示した。第4図のグラフより、例え
ば絶縁基板1の厚みが1.5mm+のときはXを20%
程度以上に設定するのがよく、線lは#lρ。よりもス
ルーホール2の半径Rの20%程度以上外側寄り又は内
側よりに位置を設定するのがよいことがわかる。
100>x≧(200/11)Xt-i00/11 The relationship between X and t is shown in Figure 4, and the value of do it. In addition, in FIG. 3, the line ρ. With the right side closer to the outside of the part of the wiring board 5 that should become the chip carrier A, @
The left side of 1 o is shown as being closer to the inside of the portion of the wiring board 5 that should become the chip carrier A, and the right side of the center in the MS4 diagram is shown as 411. The portion to the left of the center is shown as being closer to the outside of the portion of the circuit board 5 that should become the chip carrier A, and the portion to the left of the center is shown as being closer to the inside of the portion of the wiring board 5 that should become the chip carrier A. From the graph in Figure 4, for example, when the thickness of the insulating substrate 1 is 1.5 mm+, X is 20%.
It is best to set the line l to #lρ. It can be seen that it is better to set the position closer to the outside or inside by about 20% or more of the radius R of the through hole 2.

[発明の効果] 上述のように本発明にあっては、配線基板をスルーホー
ルを通る線で切断してチップキャリアを作成するにあた
って、配線基板をスルーホールの中心から外れる線で切
断するようにしたので、スルーホールメッキ層が切断さ
れる切断端面の幅を大きくしてスルーホールメッキ層を
厚い厚みで切断することができ、配線基板を切断する際
の応力にこのスルーホールメッキ層の面積が大きくなる
切断端面が耐えて、スルーホールメッキ層がスルーホー
ル内周面から剥離することを低減で訃るものであり、ス
ルーホールメッキ層をチップキャリアの端子部として用
いる場合の信頼性が低下することを防止できるものであ
る。
[Effects of the Invention] As described above, in the present invention, when cutting a wiring board along a line passing through a through hole to create a chip carrier, the wiring board is cut along a line that deviates from the center of the through hole. Therefore, by increasing the width of the cut end surface where the through-hole plating layer is cut, it is possible to cut the through-hole plating layer with a thicker thickness, and the area of the through-hole plating layer is reduced by the stress when cutting the wiring board. This reduces the risk of the through-hole plating layer peeling off from the inner peripheral surface of the through-hole due to the increased cut end surface, which reduces reliability when the through-hole plating layer is used as a terminal part of a chip carrier. This can be prevented.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(aHb)は本発明における製造の一工程での配
線基板の一部の平面図とスルーホールメッキ層部分の拡
大図、第2図は同上の一部の拡大斜視図、第3図は同上
のスルーホール部分の拡大図、第4図は切断線の変位量
と絶縁基板の厚みとの関係を示すグラフ、第5図はチッ
プキャリアの斜視図、Pt56図(a)(b)(c)は
チップキャリアの製造の各工程での一部の断面図、第7
図は同上の製造の一工程での平面図、第8図は従来例の
チップキャリアの一部の拡大斜視図である。 1は絶縁基板、2はスルーホール、3はスルーホールメ
ッキ層、4は導体回路、5は配#1基板である。
Fig. 1 (aHb) is a plan view of a part of the wiring board and an enlarged view of the through-hole plating layer part in one manufacturing step in the present invention, Fig. 2 is an enlarged perspective view of a part of the same, and Fig. 3 is an enlarged view of the same through-hole part as above, Figure 4 is a graph showing the relationship between the displacement of the cutting line and the thickness of the insulating substrate, Figure 5 is a perspective view of the chip carrier, and Pt56 diagrams (a), (b) ( c) is a cross-sectional view of a part of each step of manufacturing the chip carrier, 7th
The figure is a plan view of one of the steps of manufacturing the same as above, and FIG. 8 is an enlarged perspective view of a part of the conventional chip carrier. 1 is an insulating substrate, 2 is a through hole, 3 is a through hole plating layer, 4 is a conductor circuit, and 5 is a #1 wiring board.

Claims (1)

【特許請求の範囲】[Claims] (1)絶縁基板に丸孔のスルーホールを貫通形成し、ス
ルーホールの内周にスルーホールメッキ層を、絶縁基板
の表面にスルーホールメッキ層と接続される導体回路を
それぞれ設けて配線基板を作成し、この配線基板をスル
ーホールを通りかつスルーホールの中心から外れる線で
切断することを特徴とするチップキャリアの製造法。
(1) A wiring board is formed by forming a round through hole through the insulating substrate, providing a through hole plating layer on the inner periphery of the through hole, and providing a conductor circuit connected to the through hole plating layer on the surface of the insulating substrate. A method for manufacturing a chip carrier, which comprises creating a wiring board, and cutting the wiring board along a line that passes through a through hole and deviates from the center of the through hole.
JP22812585A 1985-10-14 1985-10-14 Manufacture of chip carrier Pending JPS6286846A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22812585A JPS6286846A (en) 1985-10-14 1985-10-14 Manufacture of chip carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22812585A JPS6286846A (en) 1985-10-14 1985-10-14 Manufacture of chip carrier

Publications (1)

Publication Number Publication Date
JPS6286846A true JPS6286846A (en) 1987-04-21

Family

ID=16871603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22812585A Pending JPS6286846A (en) 1985-10-14 1985-10-14 Manufacture of chip carrier

Country Status (1)

Country Link
JP (1) JPS6286846A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0888038A1 (en) * 1997-06-24 1998-12-30 TDK Corporation Surface mounted electronic parts and manufacturing method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0888038A1 (en) * 1997-06-24 1998-12-30 TDK Corporation Surface mounted electronic parts and manufacturing method therefor

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