JPH0379867B2 - - Google Patents

Info

Publication number
JPH0379867B2
JPH0379867B2 JP22812485A JP22812485A JPH0379867B2 JP H0379867 B2 JPH0379867 B2 JP H0379867B2 JP 22812485 A JP22812485 A JP 22812485A JP 22812485 A JP22812485 A JP 22812485A JP H0379867 B2 JPH0379867 B2 JP H0379867B2
Authority
JP
Japan
Prior art keywords
hole
metal substrate
wiring board
chip carrier
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP22812485A
Other languages
Japanese (ja)
Other versions
JPS6286845A (en
Inventor
Tooru Higuchi
Toshuki Yamaguchi
Takeshi Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP22812485A priority Critical patent/JPS6286845A/en
Publication of JPS6286845A publication Critical patent/JPS6286845A/en
Publication of JPH0379867B2 publication Critical patent/JPH0379867B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0097Processing two or more printed circuits simultaneously, e.g. made from a common substrate, or temporarily stacked circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/403Edge contacts; Windows or holes in the substrate having plural connections on the walls thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/44Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits

Landscapes

  • Lead Frames For Integrated Circuits (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Description

【発明の詳細な説明】 [技術分野] 本発明は、ICパツケージらどの電子素子の基
板として用いられる金属ベースチツプキヤリアの
製造法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for manufacturing a metal-based chip carrier used as a substrate for electronic devices such as IC packages.

[背景技術] ICパツケージなどのような電子素子は、半導
体チツプなどの電子部品チツプをリードフレーム
に取り付けた状態で樹脂封止や気密封止してパツ
ケージングすることによつて作成されている。そ
してこのような電子素子にあつて、端子数の増加
に伴つて電子部品チツプを支持するキヤリアとし
てリードフレームの替わりに配線板を用いる試み
がなされている。さらに端子数の増加に対応して
端子をキヤリアとしての配線板の四方から引き出
すようにした試みもなされている。
[Background Art] Electronic devices such as IC packages are manufactured by packaging an electronic component chip such as a semiconductor chip attached to a lead frame by resin sealing or airtight sealing. As the number of terminals in such electronic devices increases, attempts are being made to use wiring boards instead of lead frames as carriers for supporting electronic component chips. Furthermore, in response to the increase in the number of terminals, attempts have been made to draw out the terminals from all sides of the wiring board as a carrier.

第4図はかかる端子を四方から引き出すように
したチツプキヤリアAの一例を示すものであり、
配線基板5の表面にリード線用の導体回路9を設
けると共に配線基板5の四方端部にそれぞれ設け
た半円状のスルーホール6の内周にスルーホール
メツキ層7を形成してこのスルーホールメツキ層
7と導体回路9とを連続させ、配線基板5の中央
部に実装した半導体チツプなどの電子部品チツプ
11と各導体回路9とをワイヤーボンデイングな
どボンデイング12よつて接続することによつて
形成されている。このチツプキヤリアAはプリン
ト配線などが施された配線ボード等の表面に実装
され、配線ボードの配線回路に端子部となるスル
ーホールメツキ層7を半田付けなどで接続するこ
とによつて使用に供される。
Figure 4 shows an example of a chip carrier A in which such terminals are pulled out from all sides.
A conductor circuit 9 for lead wires is provided on the surface of the wiring board 5, and a through-hole plating layer 7 is formed on the inner periphery of the semicircular through-holes 6 provided at each of the four ends of the wiring board 5. It is formed by making the plating layer 7 and the conductor circuit 9 continuous, and connecting each conductor circuit 9 to an electronic component chip 11 such as a semiconductor chip mounted in the center of the wiring board 5 by bonding 12 such as wire bonding. has been done. This chip carrier A is mounted on the surface of a wiring board etc. on which printed wiring etc. are applied, and is put into use by connecting the through-hole plating layer 7, which will become the terminal part, to the wiring circuit of the wiring board by soldering or the like. Ru.

ここに、近年の電子部品チツプ11の高集積化
は発熱を伴い、この発熱を逃がす工夫が必要とさ
れる。そこでチツプキヤリアAを構成する配線基
板5を金属板を基板として作成し、金属基板2の
良好な熱伝導性によつて電子部品チツプ11の発
熱を逃がすことが検討されるところである。そし
てこのように金属板を基板として第4図のような
チツプキヤリアAを製造するにあたつては、金属
基板2とスルーホールメツキ層7や導体回路9と
の絶縁性を確保する必要があり、例えば第5図、
第6図に示すような方法が提案されている。
Here, the recent increase in the degree of integration of electronic component chips 11 is accompanied by heat generation, and a device for dissipating this heat is required. Therefore, consideration is being given to creating the wiring board 5 constituting the chip carrier A using a metal plate as a substrate and allowing the heat generated by the electronic component chip 11 to escape through the good thermal conductivity of the metal board 2. In manufacturing the chip carrier A as shown in FIG. 4 using a metal plate as a substrate, it is necessary to ensure insulation between the metal substrate 2 and the through-hole plating layer 7 and the conductor circuit 9. For example, Figure 5,
A method as shown in FIG. 6 has been proposed.

すなわち、まず第5図a及び第6図aに示すよ
うに鋼板、鉄板、アルミニウム板さらにこれらの
合金板などで形成される金属基板2に貫通孔1を
形成する。貫通孔1は四角の外形線上に沿つて配
列されるように設けられるもので、チツプキヤリ
アAの端子数に応じた個数で設けられる。次に第
7図に示すようにこの金属基板2の表面にプリプ
レグ13を介して銅箔やアルミニウム箔などの金
属箔14を重ね、加熱加圧成形する。プリプレグ
13はガラス布などを基板としてこれにエポキシ
樹脂やフエノール樹脂など熱硬化性樹脂のワニス
を含浸して乾燥することによつて作成される。こ
のように金属基板2にプリプレグ13と金属箔1
4とを重ねて熱圧成形すると、第5図bや第6図
bに示すようにプリプレグ13内の樹脂が熔融し
て貫通孔1内に流入して絶縁樹脂4として貫通孔
1内を充填することになると共にプリプレグ13
が溶融硬化した絶縁層3によつて金属箔14は金
属基板2に積層されることになり、配線基板5を
作成することができる。そしてこの配線基板5に
おいて貫通孔1の部分で貫通孔1よりも径の小さ
いスルーホール6を貫通孔1と同心で貫通形成
し、次いでエツチングなどの常用手段で金属箔1
4を処理して不要部分を除去して、第5図cのよ
うに導体回路9、導体回路9と連続してスルーホ
ール6の周縁部に形成されるスルーホール部ラン
ド8及びスルーホール部ランド8と連続して形成
されるメツキリード線15を設け、さらにメツキ
リード線15からの通電で第6図cのようにスル
ーホール6の内周に銅メツキなどの金属メツキを
おこなつてスルーホールメツキ層7を設けるよう
にする。この後に、第5図cの鎖線で示す各貫通
孔1を通る線lで配線基板5の外形打ち抜き加工
をおこない、第4図に示すような外周端面に半円
状でスルーホールメツキ層7が端子部として露出
して形成されたチツプキヤリアAを得るのであ
る。このよう作成されるチツプキヤリアAでは、
絶縁層3によつて導体回路9と金属基板2との間
の絶縁性が、絶縁樹脂4によつてスルーホールメ
ツキ層7と金属基板2との間の絶縁性がそれぞれ
確保されることになる。
That is, first, as shown in FIGS. 5a and 6a, a through hole 1 is formed in a metal substrate 2 made of a steel plate, an iron plate, an aluminum plate, or an alloy plate thereof. The through holes 1 are provided so as to be arranged along the outline of a square, and are provided in a number corresponding to the number of terminals of the chip carrier A. Next, as shown in FIG. 7, a metal foil 14 such as copper foil or aluminum foil is layered on the surface of this metal substrate 2 via a prepreg 13, and molded under heat and pressure. The prepreg 13 is created by using a glass cloth or the like as a substrate and impregnating it with a varnish of thermosetting resin such as epoxy resin or phenolic resin and drying the impregnated material. In this way, prepreg 13 and metal foil 1 are placed on metal substrate 2.
4 are overlapped and hot-press molded, the resin in the prepreg 13 melts and flows into the through hole 1 as insulating resin 4, filling the inside of the through hole 1 as shown in FIGS. 5b and 6b. Prepreg 13
The metal foil 14 is laminated on the metal substrate 2 by the insulating layer 3 which is melted and hardened, and the wiring board 5 can be created. A through hole 6 having a smaller diameter than the through hole 1 is formed concentrically with the through hole 1 at the through hole 1 portion of the wiring board 5, and then the metal foil 1 is formed by a common method such as etching.
4 and remove unnecessary portions, and as shown in FIG. A plating lead wire 15 is provided which is formed continuously with the plating lead wire 8, and metal plating such as copper plating is performed on the inner periphery of the through hole 6 as shown in FIG. 7 should be provided. After this, the outer shape of the wiring board 5 is punched out along lines l passing through each through hole 1 as shown by chain lines in FIG. A chip carrier A formed as an exposed terminal portion is obtained. In Chippukiyaria A created in this way,
The insulation layer 3 ensures insulation between the conductor circuit 9 and the metal substrate 2, and the insulation resin 4 ensures insulation between the through-hole plating layer 7 and the metal substrate 2. .

しかしこのものにあつて、チツプキヤリアAの
側端面は金属基板2を芯材とした配線基板5の切
断端面であるために、第8図に示すように金属基
板2の端面が露出していることになるところ、外
形打ち抜き加工の際にプレス刃物の打ち抜き方向
にスルーホール部ランド8の切断端部や金属基板
2の切断端部がだれとして垂れ下がり、第9図に
示すようにこのだれ16によつてスルーホール部
ランド8と金属基板2との間に接触が生じて、ス
ルーホール部ランド8と金属基板2との間が導通
状態となり、導体回路9やスルーホールメツキ層
7と金属基板2との間の絶縁層が損なわれるおそ
れがあるという問題が生じるものであつた。
However, in this case, since the side end surface of the chip carrier A is the cut end surface of the wiring board 5 whose core material is the metal substrate 2, the end surface of the metal substrate 2 is exposed as shown in FIG. However, during the punching process, the cut end of the through-hole land 8 and the cut end of the metal substrate 2 sag in the punching direction of the press cutter, and as shown in FIG. As a result, contact occurs between the through-hole land 8 and the metal substrate 2, and conduction occurs between the through-hole land 8 and the metal substrate 2, and the conductor circuit 9, the through-hole plating layer 7, and the metal substrate 2 become electrically connected. A problem arises in that the insulating layer between the two may be damaged.

[発明の目的] 本発明は、上記の点に鑑みて為されたものであ
り、導体回路やスルーホールメツキ層と金属基板
との間の絶縁性が損なわれるおそれのないチツプ
キヤリアの製造法を提供することを目的とするも
のである。
[Objective of the Invention] The present invention has been made in view of the above points, and provides a method for manufacturing a chip carrier that is free from the risk of impairing the insulation between the conductor circuit or through-hole plating layer and the metal substrate. The purpose is to

[発明の開示] しかして本発明に係るチツプキヤリアの製造法
は、複数の貫通孔1を設けた金属基板2の表面に
絶縁層3を積層すると共に各貫通孔1内に絶縁樹
脂4を充填して配線基板5を作成し、この配線基
板5の貫通孔1内に貫通孔1の径よりも小さなス
ルーホール6を貫通孔1と同心で貫通形成し、ス
ルーホール6の内周にスルーホールメツキ層7
を、絶縁樹脂4の表面にスルーホールメツキ層7
と連続するスルーホール部ランド8を、絶縁層3
の表面にスルーホール部ランド8と連続する導体
回路9をそれぞれ設けた後に、配線基板5をスル
ーホール6を通る線で切断してチツプキヤリアA
を作成するにあたつて、スルーホール部ランド8
の外径を貫通孔1の内径よりも小さな寸法に形成
することを特徴とするものであり、スルーホール
部ランド8の外径を貫通孔1の内径よりも小さな
寸法に形成するようにして外形切断時のだれがス
ルーホール部ランド8と金属基板2との間で作用
することがないようにしたものであつて、以下本
発明を実施例により詳述する。
[Disclosure of the Invention] The method for manufacturing a chip carrier according to the present invention includes laminating an insulating layer 3 on the surface of a metal substrate 2 provided with a plurality of through holes 1, and filling each through hole 1 with an insulating resin 4. A wiring board 5 is created using the above method, and a through hole 6 smaller than the diameter of the through hole 1 is formed in the through hole 1 of the wiring board 5 concentrically with the through hole 1, and the inner periphery of the through hole 6 is plated. layer 7
A through-hole plating layer 7 is formed on the surface of the insulating resin 4.
The through-hole land 8 that is continuous with the insulating layer 3
After providing a conductor circuit 9 continuous with the through-hole land 8 on the surface of the chip carrier A, the wiring board 5 is cut along a line passing through the through-hole 6.
When creating the through-hole part land 8
The outer diameter of the through-hole land 8 is smaller than the inner diameter of the through-hole 1, and the outer diameter of the through-hole land 8 is smaller than the inner diameter of the through-hole 1. The present invention is designed to prevent sagging during cutting from acting between the through-hole land 8 and the metal substrate 2, and the present invention will be described in detail below with reference to examples.

配線基板5は前述の第5図a,b,cや第6図
a,b,c、第7図に示したと同様にして作成す
ることができる。そして第5図bや第6図bのよ
うに配線基板5を作成し、この配線基板5におい
て円孔に形成される貫通孔1の中央にて貫通孔1
と同心に円孔のスルーホール6を穿設し、次いで
エツチングなどの常用手段で金属箔14を処理し
て不要部分を除去して、配線基板5の絶縁層3の
表面に導体回路9を、絶縁樹脂4の表面に導体回
路9と連続してスルーホール6の周縁部にリング
状に形成されるスルーホール部ランド8を、絶縁
層3の表面にスルーホール部ランド8と連続して
形成されるメツキリード線15をそれぞれ設け
る。このとき、第2図に示すようにスルーホール
部ランド8はその外形が貫通孔1と同心円になる
ように形成されるもので、さらにスルーホール部
ランド8の外径寸法は貫通孔1の内径寸法よりも
小さな寸法に形成されるものである。そしてメツ
キリード線15からの通電で第6図cのようにス
ルーホール6の内周に銅メツキなどの金属メツキ
をおこなつてスルーホールメツキ層7を設けるよ
うにする。
The wiring board 5 can be produced in the same manner as shown in FIGS. 5a, b, c, FIGS. 6a, b, c, and FIG. 7 described above. Then, a wiring board 5 is created as shown in FIG. 5b and FIG.
A circular through hole 6 is drilled concentrically with the metal foil 14, and unnecessary portions are removed by processing the metal foil 14 by common means such as etching, and a conductor circuit 9 is formed on the surface of the insulating layer 3 of the wiring board 5. A through-hole land 8 is formed in a ring shape at the periphery of the through-hole 6 on the surface of the insulating resin 4 so as to be continuous with the conductor circuit 9. A mating lead wire 15 is provided respectively. At this time, as shown in FIG. 2, the through-hole land 8 is formed so that its outer shape is concentric with the through-hole 1, and the outer diameter of the through-hole land 8 is the inner diameter of the through-hole 1. It is formed to have a smaller size than the actual size. Then, by applying current from the plating lead wire 15, metal plating such as copper plating is performed on the inner periphery of the through hole 6 as shown in FIG. 6c, thereby providing a through hole plating layer 7.

このようにして配線基板5にスルーホールメツ
キ層7やスルーホール部ランド8及び導体回路9
を形成したのちに、第5図c及び第2図に鎖線で
示す各スルーホール6を通る線lで配線基板5を
打ち抜き切断加工して、第4図のような外径加工
されたチツプキヤリアAを得ることができるので
ある。そしてこのように配線基板5を打ち抜きで
切断加工するにあたつて、チツプキヤリアAの切
断端面において打ち抜き方向に沿つて第9図にお
いて既に説明したようにスルーホール部ランド8
の切断端面や金属基板2の切断端面にだれ16が
生じても、第1図に示すようにスルーホール部ラ
ンド8の外径aは貫通孔1の内径bよりも小さ
く、スルーホール部ランド8と金属基板2との間
で表裏方向に重複する部分がなく、スルーホール
部ランド8の切断端面に発生するだれ16が金属
基板2の切断端面に接触したり、金属基板2の切
断端面に発生するだれ16がスルーホール部ラン
ド8の切断端面に接触したりすることを防止する
ことができることになる。従つてスルーホール部
ランド8と金属基板2との間の短絡を防止して、
導体回路9やスルーホールメツキ層7と金属基板
2との間の絶縁性が損なわれることを防止するこ
とができるものである。
In this way, the wiring board 5 is coated with the through-hole plating layer 7, through-hole lands 8, and conductor circuits 9.
After forming the wiring board 5, the wiring board 5 is punched and cut along a line 1 passing through each through hole 6 shown by a chain line in FIG. 5c and FIG. can be obtained. When cutting the wiring board 5 by punching in this way, the through-hole land 8 is cut along the punching direction on the cut end surface of the chip carrier A as already explained in FIG.
Even if droop 16 occurs on the cut end surface of the metal substrate 2 or the cut end surface of the metal substrate 2, the outer diameter a of the through-hole land 8 is smaller than the inner diameter b of the through-hole 1, as shown in FIG. There is no overlapping part in the front and back direction between the metal board 2 and the through-hole land 8, and the sag 16 generated on the cut end surface of the through-hole land 8 may come into contact with the cut end surface of the metal substrate 2 or occur on the cut end surface of the metal substrate 2. This makes it possible to prevent the welt 16 from coming into contact with the cut end surface of the through-hole land 8. Therefore, short circuit between the through-hole land 8 and the metal substrate 2 is prevented,
This can prevent the insulation between the conductive circuit 9 and the through-hole plating layer 7 and the metal substrate 2 from being impaired.

そしてこのものでは、スルーホール部ランド8
の外径を貫通孔1の内径よりも小さく形成するこ
とでスルーホール部ランド8と金属基板2との間
の短絡を防止し、導体回路9やスルーホールメツ
キ層7と金属基板2との間の絶縁性が損なわれる
ことを防止することができるものであつて、スル
ーホール6の径を小さくするような必要はなく、
チツプキヤリアAの端子部となるスルーホールメ
ツキ層7の壁面面積は十分に確保することがで
き、チツプキヤリアAをプリントボードなどに実
装する際の接続信頼性を低下させることはないも
のである。さらにスルーホール部ランド8の外径
が貫通孔1の内径よりも小さいために、スルーホ
ール部ランド8と金属基板2との絶縁距離を大き
く確保できることになり、このスルーホール部ラ
ンド8にメツキリード線15を接続してスルーホ
ールメツキ層7を形成する際のメツキリード線1
5と金属基板2との間の短絡も確実に防止される
ことになる。
And in this one, through hole part land 8
By making the outer diameter of the through hole smaller than the inner diameter of the through hole 1, short circuit between the through hole land 8 and the metal substrate 2 is prevented, and the short circuit between the conductor circuit 9, the through hole plating layer 7, and the metal substrate 2 is prevented. It is possible to prevent the insulation properties of the through hole 6 from being impaired, and there is no need to reduce the diameter of the through hole 6.
A sufficient wall surface area of the through-hole plating layer 7, which serves as the terminal portion of the chip carrier A, can be secured, and connection reliability when mounting the chip carrier A on a printed board etc. is not reduced. Furthermore, since the outer diameter of the through-hole land 8 is smaller than the inner diameter of the through-hole 1, it is possible to secure a large insulation distance between the through-hole land 8 and the metal substrate 2. Plating lead wire 1 when connecting 15 to form through-hole plating layer 7
5 and the metal substrate 2 will also be reliably prevented.

[発明の効果] 上述のように本発明にあつては、配線基板をス
ルーホールを通る線で切断してチツプキヤリアを
作成するにあたつて、スルーホール部ランドの外
径を貫通孔の内径よりも小さな寸法に形成するよ
うにしたので、チツプキヤリアの切断端面におい
て打ち抜き方向にスルーホール部ランドの切断端
面や金属基板の切断端面にだれが生じても、スル
ーホール部ランドと金属基板との間で表裏方向に
重複する部分がなく、スルーホール部ランドや金
属基板の切断端面に発生するだれでスルーホール
部ランドと金属基板との間の短絡が生じるおそれ
がないものであつて、導体回路やスルーホールメ
ツキ層と金属基板との間の絶縁性が損なわれるこ
とを防止することができるものである。
[Effects of the Invention] As described above, in the present invention, when creating a chip carrier by cutting a wiring board along a line passing through a through hole, the outer diameter of the through hole land is set to be smaller than the inner diameter of the through hole. Since the cut end surface of the chip carrier is formed to have a small size, even if there is a drop in the cut end surface of the through hole land or the cut end surface of the metal substrate in the punching direction on the cut end surface of the chip carrier, there will be no damage between the through hole land and the metal substrate. There are no overlapping parts in the front and back directions, and there is no risk of a short circuit between the through-hole land and the metal substrate due to droop occurring on the through-hole land or the cut end surface of the metal substrate, and there is no risk of short circuits between the through-hole land and the metal substrate, and there is no risk of short circuits between the through-hole land and the metal substrate. This can prevent the insulation between the hole plating layer and the metal substrate from being impaired.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によつて製造したチツプキヤリ
アの一部の拡大斜視図、第2図は同上の一部の平
面図、第3図は同上の正面図、第4図はチツプキ
ヤリアの斜視図、第5図a,b,cはチツプキヤ
リアの製造の各工程での平面図、第6図a,b,
cは同上の製造の各工程での一部の拡大断面図、
第7図は同上の製造の一工程での一部の拡大分解
断面図、第8図は従来例のチツプキヤリアの一部
の拡大斜視図、第9図は第8図のL−L線の断面
図である。 1は貫通孔、2は金属基板、3は絶縁層、4は
絶縁樹脂、5は配線基板、6はスルーホール、7
はスルーホールメツキ層、8はスルーホール部ラ
ンド、9は導体回路である。
FIG. 1 is an enlarged perspective view of a part of the chip carrier manufactured according to the present invention, FIG. 2 is a plan view of a part of the same, FIG. 3 is a front view of the same, and FIG. 4 is a perspective view of the chip carrier. Figures 5a, b, and c are plan views of each step in the manufacturing process of chipukiyaria; Figures 6a, b, and
c is an enlarged cross-sectional view of a part of the same manufacturing process as above;
Fig. 7 is an enlarged exploded cross-sectional view of a part of the same manufacturing process as above, Fig. 8 is an enlarged perspective view of a part of the conventional chip carrier, and Fig. 9 is a cross-section taken along line L-L in Fig. 8. It is a diagram. 1 is a through hole, 2 is a metal substrate, 3 is an insulating layer, 4 is an insulating resin, 5 is a wiring board, 6 is a through hole, 7
8 is a through-hole plating layer, 8 is a through-hole land, and 9 is a conductor circuit.

Claims (1)

【特許請求の範囲】[Claims] 1 複数の貫通孔を設けた金属基板の表面に絶縁
層を積層すると共に各貫通孔内に絶縁樹脂を充填
して配線基板を作成し、この配線基板の貫通孔内
に貫通孔の径よりも小さなスルーホールを貫通孔
と同心で貫通形成し、スルーホールの内周にスル
ーホールメツキ層を、絶縁樹脂の表面にスルーホ
ールメツキ層と連続するスルーホール部ランド
を、絶縁層の表面にスルーホール部ランドと連続
する導体回路をそれぞれ設けた後に、配線基板を
スルーホールを通る線で切断してチツプキヤリア
を作成するにあたつて、スルーホール部ランドの
外径を貫通孔の内径よりも小さな寸法に形成する
ことを特徴とする金属ベースチツプキヤリアの製
造法。
1. A wiring board is created by laminating an insulating layer on the surface of a metal board with a plurality of through holes and filling each through hole with insulating resin. A small through hole is formed concentrically with the through hole, a through hole plating layer is formed on the inner periphery of the through hole, a through hole part land continuous with the through hole plating layer is formed on the surface of the insulating resin, and a through hole is formed on the surface of the insulating layer. After providing conductor circuits continuous with the through-hole lands, cut the wiring board along the line passing through the through-holes to create a chip carrier. A method for manufacturing a metal-based chip carrier characterized by forming a metal base chip carrier.
JP22812485A 1985-10-14 1985-10-14 Manufacture of metal base chip carrier Granted JPS6286845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22812485A JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22812485A JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Publications (2)

Publication Number Publication Date
JPS6286845A JPS6286845A (en) 1987-04-21
JPH0379867B2 true JPH0379867B2 (en) 1991-12-20

Family

ID=16871586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22812485A Granted JPS6286845A (en) 1985-10-14 1985-10-14 Manufacture of metal base chip carrier

Country Status (1)

Country Link
JP (1) JPS6286845A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100209263B1 (en) * 1996-12-31 1999-07-15 이해규 Chip carrier and its manufacturing method, semiconductor accessory using its chip carrier

Also Published As

Publication number Publication date
JPS6286845A (en) 1987-04-21

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