JPS627002A - 位相シフト回折格子の製造方法 - Google Patents

位相シフト回折格子の製造方法

Info

Publication number
JPS627002A
JPS627002A JP14582685A JP14582685A JPS627002A JP S627002 A JPS627002 A JP S627002A JP 14582685 A JP14582685 A JP 14582685A JP 14582685 A JP14582685 A JP 14582685A JP S627002 A JPS627002 A JP S627002A
Authority
JP
Japan
Prior art keywords
diffraction grating
area
grating
substrate
whole surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14582685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0461331B2 (enrdf_load_stackoverflow
Inventor
Shigeyuki Akiba
重幸 秋葉
Katsuyuki Uko
宇高　勝之
Yuichi Matsushima
松島　裕一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KDDI Corp
Original Assignee
Kokusai Denshin Denwa KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Denshin Denwa KK filed Critical Kokusai Denshin Denwa KK
Priority to JP14582685A priority Critical patent/JPS627002A/ja
Publication of JPS627002A publication Critical patent/JPS627002A/ja
Publication of JPH0461331B2 publication Critical patent/JPH0461331B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP14582685A 1985-07-04 1985-07-04 位相シフト回折格子の製造方法 Granted JPS627002A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14582685A JPS627002A (ja) 1985-07-04 1985-07-04 位相シフト回折格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14582685A JPS627002A (ja) 1985-07-04 1985-07-04 位相シフト回折格子の製造方法

Publications (2)

Publication Number Publication Date
JPS627002A true JPS627002A (ja) 1987-01-14
JPH0461331B2 JPH0461331B2 (enrdf_load_stackoverflow) 1992-09-30

Family

ID=15394013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14582685A Granted JPS627002A (ja) 1985-07-04 1985-07-04 位相シフト回折格子の製造方法

Country Status (1)

Country Link
JP (1) JPS627002A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5792528A (en) * 1994-06-17 1998-08-11 Atomic Energy Corporation Of South Africa Limited Process for the production of plastic components for containing and/or transporting fluids
CN111480262A (zh) * 2017-11-21 2020-07-31 应用材料公司 制造波导组合器的方法
US11327218B2 (en) 2017-11-29 2022-05-10 Applied Materials, Inc. Method of direct etching fabrication of waveguide combiners

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5792528A (en) * 1994-06-17 1998-08-11 Atomic Energy Corporation Of South Africa Limited Process for the production of plastic components for containing and/or transporting fluids
CN111480262A (zh) * 2017-11-21 2020-07-31 应用材料公司 制造波导组合器的方法
US11327218B2 (en) 2017-11-29 2022-05-10 Applied Materials, Inc. Method of direct etching fabrication of waveguide combiners
US11662516B2 (en) 2017-11-29 2023-05-30 Applied Materials, Inc. Method of direct etching fabrication of waveguide combiners

Also Published As

Publication number Publication date
JPH0461331B2 (enrdf_load_stackoverflow) 1992-09-30

Similar Documents

Publication Publication Date Title
EP0188919B1 (en) A method for the formation of a diffraction grating
US5238785A (en) Method of manufacturing a diffraction grating for a semiconductor laser
JPS61190368A (ja) 微細パタ−ンの形成方法
US4826291A (en) Method for manufacturing diffraction grating
JPS627002A (ja) 位相シフト回折格子の製造方法
JPS62278508A (ja) 回折格子の製造方法
US5221429A (en) Method of manufacturing phase-shifted diffraction grating
JPH03238454A (ja) 干渉露光用マスクの製造方法
JP2527833B2 (ja) 回折格子の製造方法
JPH05343806A (ja) 位相シフト型回折格子の製造方法
JPH0323884B2 (enrdf_load_stackoverflow)
JPS6398608A (ja) 回折格子の製造方法
JP2735589B2 (ja) 回折格子の製造方法
JPS61138202A (ja) 回折格子の製造方法
JPS6218503A (ja) 回折格子の製造方法
JPH0374804B2 (enrdf_load_stackoverflow)
JPH01225189A (ja) 回折格子の製造方法
JPH10326746A (ja) マスクパターンの形成方法
JPH07101302B2 (ja) 回折格子の作製方法及びそれに用いるオートマスク
JPH052201B2 (enrdf_load_stackoverflow)
JPS60191209A (ja) 回折格子の製造方法
JPH02213182A (ja) 回折格子の製造方法
JPH04239791A (ja) 回折格子の製造方法
JPS6218561A (ja) 凹凸面形成方法
JPS62297722A (ja) 回折格子の製造方法