JPS6260788B2 - - Google Patents
Info
- Publication number
- JPS6260788B2 JPS6260788B2 JP56151390A JP15139081A JPS6260788B2 JP S6260788 B2 JPS6260788 B2 JP S6260788B2 JP 56151390 A JP56151390 A JP 56151390A JP 15139081 A JP15139081 A JP 15139081A JP S6260788 B2 JPS6260788 B2 JP S6260788B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cathode
- potential
- hole
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000000149 penetrating effect Effects 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 47
- 230000000694 effects Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 238000005315 distribution function Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000005658 nuclear physics Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56151390A JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56151390A JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5853143A JPS5853143A (ja) | 1983-03-29 |
JPS6260788B2 true JPS6260788B2 (enrdf_load_stackoverflow) | 1987-12-17 |
Family
ID=15517530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56151390A Granted JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5853143A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03115340U (enrdf_load_stackoverflow) * | 1990-03-07 | 1991-11-28 |
-
1981
- 1981-09-26 JP JP56151390A patent/JPS5853143A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03115340U (enrdf_load_stackoverflow) * | 1990-03-07 | 1991-11-28 |
Also Published As
Publication number | Publication date |
---|---|
JPS5853143A (ja) | 1983-03-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4714860A (en) | Ion beam generating apparatus | |
EP0200035B1 (en) | Electron beam source | |
US3138729A (en) | Ultra-soft X-ray source | |
JPH03500109A (ja) | 乱れた形態のクロム冷陰極を有するプラズマスイッチ | |
CA2011644C (en) | Vacuum switch apparatus | |
US3414702A (en) | Nonthermionic electron beam apparatus | |
US4506160A (en) | Ion source apparatus | |
JPS6260788B2 (enrdf_load_stackoverflow) | ||
JP3140636B2 (ja) | プラズマ発生装置 | |
JP3021762B2 (ja) | 電子衝撃型イオン源 | |
JP3077697B1 (ja) | イオン源 | |
JPH043056B2 (enrdf_load_stackoverflow) | ||
JPH0334178B2 (enrdf_load_stackoverflow) | ||
JP3143016B2 (ja) | プラズマ発生装置 | |
US3452237A (en) | Sputtering protection for tantalum cathodes in plasma devices | |
JP2586836B2 (ja) | イオン源装置 | |
JP2620474B2 (ja) | イオンプレーティング装置 | |
JPS5853140A (ja) | イオン発生装置 | |
JPS58157033A (ja) | イオン発生装置 | |
JPS586259B2 (ja) | イオン発生装置 | |
JPS5820090B2 (ja) | 電子衝撃加熱方式によるマグネトロン型イオン発生装置 | |
JPH06150858A (ja) | 電子銃 | |
JPH0159694B2 (enrdf_load_stackoverflow) | ||
JPS593812B2 (ja) | イオン発生装置 | |
JPH06338279A (ja) | 電子銃 |