JPS5853143A - イオン発生装置 - Google Patents
イオン発生装置Info
- Publication number
- JPS5853143A JPS5853143A JP56151390A JP15139081A JPS5853143A JP S5853143 A JPS5853143 A JP S5853143A JP 56151390 A JP56151390 A JP 56151390A JP 15139081 A JP15139081 A JP 15139081A JP S5853143 A JPS5853143 A JP S5853143A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cathode
- potential
- ion
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 description 51
- 230000000694 effects Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 4
- 230000035515 penetration Effects 0.000 description 2
- 241000736839 Chara Species 0.000 description 1
- 241000277331 Salmonidae Species 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000004157 plasmatron Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/04—Ion sources; Ion guns using reflex discharge, e.g. Penning ion sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56151390A JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56151390A JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5853143A true JPS5853143A (ja) | 1983-03-29 |
JPS6260788B2 JPS6260788B2 (enrdf_load_stackoverflow) | 1987-12-17 |
Family
ID=15517530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56151390A Granted JPS5853143A (ja) | 1981-09-26 | 1981-09-26 | イオン発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5853143A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03115340U (enrdf_load_stackoverflow) * | 1990-03-07 | 1991-11-28 |
-
1981
- 1981-09-26 JP JP56151390A patent/JPS5853143A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6260788B2 (enrdf_load_stackoverflow) | 1987-12-17 |
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