JPS6258664A - Heat-dissipasive insulation substrate - Google Patents
Heat-dissipasive insulation substrateInfo
- Publication number
- JPS6258664A JPS6258664A JP19758385A JP19758385A JPS6258664A JP S6258664 A JPS6258664 A JP S6258664A JP 19758385 A JP19758385 A JP 19758385A JP 19758385 A JP19758385 A JP 19758385A JP S6258664 A JPS6258664 A JP S6258664A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heat
- aluminum nitride
- insulating substrate
- sides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【発明の詳細な説明】
[発明の技術分野]
本発明は放熱性絶縁基板、特にサイリスタなどの電力用
半導体素子と冷却フィンとの間に用いられる放熱性絶縁
基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a heat dissipating insulating substrate, particularly to a heat dissipating insulating substrate used between a power semiconductor element such as a thyristor and a cooling fin.
[発明の技術的背景とその問題点]
窒化アルミニウム系セラミックスは高強度性および金属
なみの製放熱性と共に、電気絶縁性をも兼ね備えている
ため、半導体基板等各種の部品用材料として近年注目さ
れており、サイリスタなどの電力用半導体素子と冷却フ
ィンとの間の絶縁基板としての用途もその一つでおる。[Technical background of the invention and its problems] Aluminum nitride ceramics have attracted attention in recent years as materials for various parts such as semiconductor substrates because they have high strength and heat dissipation properties comparable to metals, as well as electrical insulation properties. One such use is as an insulating substrate between a power semiconductor device such as a thyristor and a cooling fin.
このような絶縁基板として窒化アルミニウム系セラミッ
クス基板を使用する場合、従来は図に示すように、基板
1の両面を端子2あるいは冷却フィン3としてのCu板
で挟み、これらを圧接ネジ等によって圧接することによ
り敢然と絶縁をはかるということが行なわれていた。な
お図中符号4は半導体素子、5は絶縁スペーサ、6は圧
接圧、7はボルト、8は押え板、9は皿バネ、10は止
め犬ット、11は圧接ネジを示す。When using an aluminum nitride ceramic substrate as such an insulating substrate, conventionally, as shown in the figure, both sides of the substrate 1 are sandwiched between Cu plates serving as terminals 2 or cooling fins 3, and these are pressed together using pressure welding screws or the like. For this reason, bold measures were taken to insulate them. In the figure, reference numeral 4 indicates a semiconductor element, 5 an insulating spacer, 6 a pressure contact, 7 a bolt, 8 a retaining plate, 9 a disc spring, 10 a retaining dog, and 11 a pressure contact screw.
しかしながらこの構造では窒化アルミニウム系セラミッ
クス基板に一定以上の強度か要求されるため基板の板厚
を少なくとも2■以上とる必要があり、そのために放熱
性か損われる結果となっていた。またCu板との密着性
が不充分で熱的抵抗が大きくなり、同様の問題が生じる
場合もあった。However, in this structure, the aluminum nitride ceramic substrate is required to have a certain level of strength, so the thickness of the substrate must be at least 2 mm, which results in a loss of heat dissipation. In addition, the adhesion to the Cu plate was insufficient, resulting in increased thermal resistance, which sometimes caused similar problems.
ざらに、圧接するための治具を必要とすることから半導
体装置全体の構造が複雑になるという欠点もあった。Another disadvantage is that the overall structure of the semiconductor device becomes complicated because a jig is required for pressure-welding.
[発明の目的]
本発明者は窒化アルミニウム系セラミックス基板の両面
にCu板を直接接合させることにより絶縁基板の薄肉化
が達成できると共に、取扱いも容易で圧接するための冶
具を要しない放熱性絶縁基板が得られることを見い出し
た。[Purpose of the Invention] The present inventor has developed a heat-dissipating insulation that can achieve thinning of the insulating substrate by directly bonding Cu plates to both sides of an aluminum nitride-based ceramic substrate, is easy to handle, and does not require a jig for pressure bonding. It was discovered that a substrate can be obtained.
本発明は以上のような知見に基づいてなされたもので、
放熱性が向上し、かつ簡略化された構造の放熱性絶縁基
板を(qることを目的とする。The present invention was made based on the above findings, and
The purpose is to provide a heat dissipating insulating substrate with improved heat dissipation and a simplified structure.
[発明の概要1
すなわら本発明の放熱性絶縁基板は、半導体素子と冷却
フィンとの間に設けられる放熱性絶縁基板において、こ
の放熱性絶縁基板は窒化アルミニウム系セラミックス基
板の両面にCu板が直接接合されたものであることを特
徴とする。[Summary of the Invention 1 In other words, the heat dissipating insulating substrate of the present invention is a heat dissipating insulating substrate provided between a semiconductor element and a cooling fin, and the heat dissipating insulating substrate has Cu plates on both sides of an aluminum nitride ceramic substrate. are directly joined.
本発明においては、窒化アルミニウム系レラミックス基
板は窒化アルミニウム粉末に必要に応じて酸化イツトリ
ウム、酸化アルミニウム、酸化カルシウム等の焼結助剤
を一種以上添加した粉末を圧縮成形し、焼結したものを
使用する。In the present invention, the aluminum nitride-based Relamix substrate is made by compressing and sintering aluminum nitride powder with one or more sintering aids such as yttrium oxide, aluminum oxide, and calcium oxide added as needed. use.
この窒化アルミニウム系はラミックス基板の厚ざは特に
限定されないが、薄肉のもの、たとえば0.6〜1.5
mmの板厚であっても破損することなく、かつ絶縁機能
を十分発揮できる。また接合を充分行うため窒化アルミ
ニウム系セラミックス基板は必らかしめ表面を酸化処理
して用いるか、あるいは基体中に結合剤である酸素を含
有させておくことが好ましい。The thickness of the aluminum nitride substrate is not particularly limited, but thin-walled ones, such as 0.6 to 1.5
Even with a plate thickness of mm, it will not be damaged and can fully demonstrate its insulation function. Further, in order to achieve sufficient bonding, it is preferable that the aluminum nitride ceramic substrate be caulked and the surface oxidized, or that oxygen as a binder be contained in the substrate.
窒化アルミニウム系しラミックス基板と接合させるCu
板は無酸素銅あるいは酸素を100〜2000ppm
、好ましくは300〜500ppm含有するタフピッチ
電解銅の使用が好ましく、このCu板を窒化アルミニウ
ム系セラミックス基板の両面に配置し、1065〜10
83℃に加熱することによって放熱性絶縁基板を製造す
る。Cu to be bonded to aluminum nitride-based lamic substrate
The board contains oxygen-free copper or oxygen at 100 to 2000 ppm.
It is preferable to use tough pitch electrolytic copper containing 300 to 500 ppm, and this Cu plate is placed on both sides of an aluminum nitride ceramic substrate.
A heat dissipating insulating substrate is manufactured by heating to 83°C.
得られる放熱性絶縁基板はネジ等により容易に装着する
ことができ、また両面に配置されたCu板はこれをその
まま冷却フィンまたは端子として使用しても良いし、あ
るいは異素材または同素材の冷却フィン等にCu板を接
合させて用いても良い。The resulting heat-dissipating insulating board can be easily attached with screws, etc., and the Cu plates placed on both sides can be used as they are as cooling fins or terminals, or they can be used as cooling fins or terminals made of different materials or the same material. A Cu plate may be bonded to a fin or the like.
[発明の実施例] 次に本発明を実施例によって説明する。[Embodiments of the invention] Next, the present invention will be explained by examples.
実施例
窒化アルミニウム粉末にY203を2wt%添加した混
合粉末を直径100mm X厚ざ2mmに成形し、18
00’Cで焼結した。得られた窒化アルミニウム系セラ
ミックス円板の上下面をダイヤモンド砥石で研摩して直
径80mmX厚さ1mmの平面板とした。この円板の上
下面に直径80陥×厚ざ3涌涌のタフピッチ電解銅を挟
み、窒素雰囲気中、1070°Cで5分間前処°理した
。はぼ空温まで冷却して接合状態を調べた結果強固な接
合かiqられでいた。Example A mixed powder of aluminum nitride powder added with 2 wt% of Y203 was molded into a size of 100 mm in diameter and 2 mm in thickness.
Sintered at 00'C. The upper and lower surfaces of the obtained aluminum nitride ceramic disk were ground with a diamond grindstone to obtain a flat plate with a diameter of 80 mm and a thickness of 1 mm. Tough pitch electrolytic copper with a diameter of 80 holes and a thickness of 3 inches was sandwiched between the upper and lower surfaces of this disk, and pretreated at 1070° C. for 5 minutes in a nitrogen atmosphere. After cooling to air temperature and examining the bonded state, it was found that the bond was strong.
この基板を電力用半導体素子と冷却フィンの間に挟んで
放熱性絶縁基板として使用したところ、放熱性に優れて
おり、半導体の高性能を維持発揮できることがわかった
。When this substrate was sandwiched between a power semiconductor element and a cooling fin and used as a heat dissipating insulating substrate, it was found that it had excellent heat dissipation properties and was able to maintain and exhibit the high performance of the semiconductor.
[発明の効果]
以上説明したように、本発明においては窒化アルミニウ
ム系セラミックス基板の薄肉化が達成でき、かつ窒化ア
ルミニウム系レラミックス基板とCu板との接合層に熱
伝導を阻害するものが存在しないので、製放熱性と高電
気絶縁性を兼ね備えた放熱性絶縁基板が得られる。[Effects of the Invention] As explained above, in the present invention, it is possible to achieve a thinner aluminum nitride ceramic substrate, and there is a substance that inhibits heat conduction in the bonding layer between the aluminum nitride ceramic substrate and the Cu plate. Therefore, a heat dissipating insulating substrate that has both heat dissipation properties and high electrical insulation properties can be obtained.
またCuとセラミックスが直接接合しているため密着性
が良く、従来のように絶縁基板とCu板とを圧接する必
要がないので、たとえば図においてAで囲んだ圧接する
ための部分を省略することができ、構造が簡略化される
。In addition, since the Cu and ceramics are directly bonded, the adhesion is good, and there is no need to press the insulating substrate and the Cu plate as in the conventional case, so for example, the part surrounded by A in the figure for press contact can be omitted. , and the structure is simplified.
図は従来のサイリスクの絶縁型冷却WI造を示す概略図
である。
1・・・・・・・・・・・・窒化アルミニウム系セラミ
ックス基板
2.2・・・端子
3・・・・・・・・・・・・冷却フィン4・・・・・・
・・・・・・半導体素子代理人弁理士 則 近 憲
佑
同 潟山幸夫The figure is a schematic diagram showing a conventional Cyrisk insulated cooling WI structure. 1......Aluminum nitride ceramic substrate 2.2...Terminal 3...Cooling fin 4...
...Semiconductor device patent attorney Nori Chika
Yukio Katayama
Claims (1)
性絶縁基板において、この放熱性絶縁基板は窒化アルミ
ニウム系セラミックス基板の両面にCu板が直接接合さ
れたものであることを特徴とする放熱性絶縁基板。(1) A heat dissipating insulating substrate provided between a semiconductor element and a cooling fin, characterized in that the heat dissipating insulating substrate is made of an aluminum nitride ceramic substrate with Cu plates directly bonded to both sides. Insulated substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19758385A JPS6258664A (en) | 1985-09-09 | 1985-09-09 | Heat-dissipasive insulation substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19758385A JPS6258664A (en) | 1985-09-09 | 1985-09-09 | Heat-dissipasive insulation substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6258664A true JPS6258664A (en) | 1987-03-14 |
JPH0337310B2 JPH0337310B2 (en) | 1991-06-05 |
Family
ID=16376900
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19758385A Granted JPS6258664A (en) | 1985-09-09 | 1985-09-09 | Heat-dissipasive insulation substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6258664A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01123352U (en) * | 1988-02-15 | 1989-08-22 | ||
JPH04162756A (en) * | 1990-10-26 | 1992-06-08 | Toshiba Corp | Semiconductor module |
JP2002043632A (en) * | 2000-07-21 | 2002-02-08 | Citizen Electronics Co Ltd | Light emitting diode |
-
1985
- 1985-09-09 JP JP19758385A patent/JPS6258664A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01123352U (en) * | 1988-02-15 | 1989-08-22 | ||
JPH04162756A (en) * | 1990-10-26 | 1992-06-08 | Toshiba Corp | Semiconductor module |
JP2002043632A (en) * | 2000-07-21 | 2002-02-08 | Citizen Electronics Co Ltd | Light emitting diode |
Also Published As
Publication number | Publication date |
---|---|
JPH0337310B2 (en) | 1991-06-05 |
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