JPS6257008B2 - - Google Patents

Info

Publication number
JPS6257008B2
JPS6257008B2 JP56018004A JP1800481A JPS6257008B2 JP S6257008 B2 JPS6257008 B2 JP S6257008B2 JP 56018004 A JP56018004 A JP 56018004A JP 1800481 A JP1800481 A JP 1800481A JP S6257008 B2 JPS6257008 B2 JP S6257008B2
Authority
JP
Japan
Prior art keywords
alignment
mark
image
focusing plate
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56018004A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57133428A (en
Inventor
Fujio Kanetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP56018004A priority Critical patent/JPS57133428A/ja
Publication of JPS57133428A publication Critical patent/JPS57133428A/ja
Publication of JPS6257008B2 publication Critical patent/JPS6257008B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP56018004A 1981-02-12 1981-02-12 Alignment optical system capable of variable magnification Granted JPS57133428A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56018004A JPS57133428A (en) 1981-02-12 1981-02-12 Alignment optical system capable of variable magnification

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56018004A JPS57133428A (en) 1981-02-12 1981-02-12 Alignment optical system capable of variable magnification

Publications (2)

Publication Number Publication Date
JPS57133428A JPS57133428A (en) 1982-08-18
JPS6257008B2 true JPS6257008B2 (US20030199744A1-20031023-C00003.png) 1987-11-28

Family

ID=11959540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56018004A Granted JPS57133428A (en) 1981-02-12 1981-02-12 Alignment optical system capable of variable magnification

Country Status (1)

Country Link
JP (1) JPS57133428A (US20030199744A1-20031023-C00003.png)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101677A (ja) * 1982-12-01 1984-06-12 Ricoh Co Ltd 磁気ブラシ現像装置
JPS59141226A (ja) * 1983-02-02 1984-08-13 Canon Inc 観察装置
JPS59165419A (ja) * 1983-03-11 1984-09-18 Hitachi Ltd 原画位置整合装置
JPS60194537A (ja) * 1984-02-22 1985-10-03 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン 整列装置
NL8401710A (nl) * 1984-05-29 1985-12-16 Philips Nv Inrichting voor het afbeelden van een maskerpatroon op een substraat.
JPH0615966B2 (ja) * 1984-12-26 1994-03-02 株式会社日立製作所 パタ−ン検出装置
JP4574871B2 (ja) * 2001-01-25 2010-11-04 日東光学株式会社 アライメント装置および組立て装置
KR100442954B1 (ko) * 2002-08-26 2004-08-04 엘지전자 주식회사 광학엔진의 프리즘 정합구조 및 그 검사 방법

Also Published As

Publication number Publication date
JPS57133428A (en) 1982-08-18

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