JPS6255310B2 - - Google Patents
Info
- Publication number
- JPS6255310B2 JPS6255310B2 JP57193881A JP19388182A JPS6255310B2 JP S6255310 B2 JPS6255310 B2 JP S6255310B2 JP 57193881 A JP57193881 A JP 57193881A JP 19388182 A JP19388182 A JP 19388182A JP S6255310 B2 JPS6255310 B2 JP S6255310B2
- Authority
- JP
- Japan
- Prior art keywords
- well
- substrate
- type
- channel
- semiconductor layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57193881A JPS5984462A (ja) | 1982-11-04 | 1982-11-04 | 相補型mos半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57193881A JPS5984462A (ja) | 1982-11-04 | 1982-11-04 | 相補型mos半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5984462A JPS5984462A (ja) | 1984-05-16 |
JPS6255310B2 true JPS6255310B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-11-19 |
Family
ID=16315287
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57193881A Granted JPS5984462A (ja) | 1982-11-04 | 1982-11-04 | 相補型mos半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5984462A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0714005B2 (ja) * | 1984-06-06 | 1995-02-15 | ソニー株式会社 | 半導体装置 |
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1982
- 1982-11-04 JP JP57193881A patent/JPS5984462A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5984462A (ja) | 1984-05-16 |