JPS6254945A - Lead frame for ic - Google Patents

Lead frame for ic

Info

Publication number
JPS6254945A
JPS6254945A JP19394485A JP19394485A JPS6254945A JP S6254945 A JPS6254945 A JP S6254945A JP 19394485 A JP19394485 A JP 19394485A JP 19394485 A JP19394485 A JP 19394485A JP S6254945 A JPS6254945 A JP S6254945A
Authority
JP
Japan
Prior art keywords
coining
lead
depth
plating
lead frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19394485A
Other languages
Japanese (ja)
Inventor
Akira Okamoto
暁 岡本
Katsuto Tani
谷 克人
Hitoshi Akazawa
赤澤 均
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP19394485A priority Critical patent/JPS6254945A/en
Publication of JPS6254945A publication Critical patent/JPS6254945A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

PURPOSE:To obtain a preferable bonding work by forming a ringlike coined portion which is shallower than the depth of a lead end coining portion and deeper than the partial plating thickness between the lead end coined portion and a lead base. CONSTITUTION:The depth DELTA2 of a ringlike coining is designed to be larger than a partial plating thickness (d), and the end of a bonding retainer jig 5 is designed to be disposed at a ringlike coining region. Accordingly, the jig 5 is not contacted with a partial silver or gold plating 4 at wire bonding time of a lead frame for an IC, and the plating materials are not bonded to the jig. The depth DELTA2 of the coining 8 is formed to be shallower than the depth DELTA1 of an inner lead coining 7 to reduce the deformation amount of the material synthetic rubber of a partial plating mask 3, thereby eliminating a gap in the coining steps.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明けIC用リードフレームの改良に係わる。[Detailed description of the invention] <Industrial application field> The present invention relates to improvements in lead frames for ICs.

〈従来の技術〉 IC用リードフレームは打抜き又はエツチング加工によ
って一第5図の平面図に示す如く成形される。第5図に
おいて、1はリードフレーム、1aはインナリード、1
bはアウタリードである。IC用リードフレームの打抜
加工の場合、打抜面に第6図(a)に示すようなだれ2
が生じる。このようなだれ2をもったまま、IC用リー
ドフレーム1のインナリード先端部1aに金、銀めっき
等を施して、ワイヤボンディングされる。このような場
合、だれ2のため、ボンディングに必要な接着面積が少
なく、接着が不充分で接着部が断線を起す事故を発生す
ることが起った。このため一般にインナリード先端部1
aにコイニングというつぶし加工音節す。第6図中)に
示す如く、つぶし量△のコイニング加工を施すことによ
ってワイヤボンディングの接着性を改善している。
<Prior Art> A lead frame for an IC is formed by punching or etching as shown in the plan view of FIG. In Fig. 5, 1 is a lead frame, 1a is an inner lead, 1
b is the outer lead. In the case of punching IC lead frames, there is an avalanche 2 on the punching surface as shown in Figure 6(a).
occurs. With such a droop 2 still in place, the inner lead tip portion 1a of the IC lead frame 1 is plated with gold, silver, etc., and then wire bonded. In such a case, due to the sag 2, the bonding area required for bonding is small, resulting in insufficient bonding and an accident in which the bonded portion breaks. For this reason, generally the inner lead tip 1
There is a mangled syllable called coining in a. As shown in FIG. 6), the adhesion of wire bonding is improved by performing a coining process with a flattening amount Δ.

〈発明が解決しようとする問題点〉 第7図(a)はコイニングを施したインナリード先端部
の側面図、第7図(b)は第7図(a)に示すa−a断
面図である。第7図(〜、(b)において、laはイン
ナリード、Δはコイニングによるつぶし量である。この
ようなリードフレームのインナリード先端部はコイニン
グが施された後、第8図に示す如く、シリコンゴム等で
できた部分めっきマスク3をインナリード先端部を残し
て蔽い、インナリード先端部の部分めっきマスク3によ
って蔽い残された部分に部分めつき4を施し、ワイヤボ
ンディングする。ワイヤメンディングの作業の安定性を
図るため、第9図に示す如く、がンデイング毎にリード
フレーム1を上から押え治具5で押える。第10図は部
分めっきを施したインナリード先端部1aと押え治具5
との関係を示す図である。第10図に示す如く、ハンデ
イング工程においてデンディングの度に押え治具5によ
ってリードフレームのリード部分を押えるとき、押え治
具5がインナリード1a部分をめっき部4を介して押え
る。このためデンディングの度び毎に押え治具5の下面
がめつき部分4に当9.めっきの材料が徐々に押え治具
5の下面に耐着し、そのうちかたibとなって突然剥げ
落ちてICチップを破損させることが起った。このよう
な押え治具5と部分めつき4との接触を避けるため。
<Problems to be solved by the invention> FIG. 7(a) is a side view of the coined inner lead tip, and FIG. 7(b) is a sectional view taken along the line a-a shown in FIG. 7(a). be. In FIG. 7 (~, (b), la is the inner lead, and Δ is the amount of crushing due to coining. After the inner lead tip of such a lead frame is coined, as shown in FIG. 8, A partial plating mask 3 made of silicone rubber or the like is covered except for the tip of the inner lead, and partial plating 4 is applied to the portion of the tip of the inner lead left covered by the partial plating mask 3, followed by wire bonding. In order to ensure the stability of the mending work, the lead frame 1 is held down from above by a holding jig 5 during each mending process, as shown in Fig. 9. Fig. 10 shows the partially plated inner lead tip 1a and the lead frame 1. Presser jig 5
FIG. As shown in FIG. 10, when the holding jig 5 presses the lead portion of the lead frame each time during the handing process, the holding jig 5 presses the inner lead 1a portion through the plating portion 4. For this reason, the lower surface of the presser jig 5 comes into contact with the plating portion 4 each time 9. The plating material gradually adhered to the lower surface of the holding jig 5, and then suddenly peeled off, causing damage to the IC chip. This is to avoid such contact between the presser jig 5 and the partial plating 4.

部分めつき4を第11図のようにインナリード1aのコ
イニング部分の途中までで止めるよう、めっきマスク3
の周辺をコイニング部分の途中まで張シ出させるように
して、露出されたインナリードの先端部をめっきするこ
とが考えられた。しかしこの場合はコイニング部分の角
部にマスク3と隙間6が生じ、この隙間6へめっき液が
進入し、インナリード側面がめつきされ、好ましくなか
った。
The plating mask 3 is applied so that the partial plating 4 is stopped halfway to the coining part of the inner lead 1a as shown in FIG.
One idea was to extend the periphery of the coining part to the middle of the coining part and plate the exposed tip of the inner lead. However, in this case, a gap 6 was formed between the corner of the coining part and the mask 3, and the plating solution entered the gap 6, causing the side surface of the inner lead to be plated, which was not preferable.

本発明はかかる従来技術の不備に鑑みてなされたもので
、コイニングの形状に改良を加えたことによって、部分
めっき工程でめっき液もれの問題を起さず、かつ押え治
具の下面が部分めっきと接触せず、良好なメンデイング
加工が得られるICリードフレームを提供することを目
的とするものである。
The present invention was made in view of the deficiencies of the prior art, and by improving the coining shape, the problem of plating solution leakage does not occur during the partial plating process, and the lower surface of the holding jig is partially removed. The object of the present invention is to provide an IC lead frame that does not come into contact with plating and can be easily mended.

〈問題点を解決するための手段〉 かかる目的を達成した本発明によるIC用リードフレー
ムの構成は、打抜加工によって製造されたIC用リード
フレームにおいて。
<Means for Solving the Problems> The structure of an IC lead frame according to the present invention that achieves the above object is an IC lead frame manufactured by punching.

リード先端部にコイニング加工部を設けるとともに、該
リード先端コイニング加工部とリード基部との間に、上
記リード先端コイニング部の深さよシ浅く1部分めっき
厚より深いリング状のコイニング加工部を設けたことを
特徴とするものである。
A coining part is provided at the lead tip, and a ring-shaped coining part is provided between the lead tip coining part and the lead base, which is shallower than the depth of the lead tip coining part and deeper than the partial plating thickness. It is characterized by this.

〈実 施 例〉 本発明によるIC用リードフレームを一実施例の図面を
参照しながら説明する。
<Example> An IC lead frame according to the present invention will be described with reference to the drawings of an example.

第1図は本発明によるIC用リードフレームの平面図で
ある。第1図中c、dはリード先端部1aのX、Y方向
のコイニング範囲を示す。本発明によれば、インナリー
ド先端部fatコイニングするに当って、第1図に示す
如くリード先端コイニングのx + Y方向の範囲c、
dで示すリード先端コイニング部7の外側に溝巾t、の
リング状コイニング部8を設けたものである。この場合
、リング状コイニング部8の深さΔ、はリード先端コイ
ニング部7の深さΔ、よシ浅く、かつ部分めっき厚dよ
シも深くしである。ま友すング状コイニング巾1.  
及び、リード先端コイニング部7とリング状コイニング
部8の間に残された土手部9の巾4 は、第3図及び第
4図に示す如く、めっき時の部分めっき用マスク3のエ
ツジ及びデンディング時の押え治具5の先端部がリング
状コイニング部8の範囲1.内にくるように予め設計し
である。
FIG. 1 is a plan view of an IC lead frame according to the present invention. In FIG. 1, c and d indicate the coining range of the lead tip 1a in the X and Y directions. According to the present invention, when coining the inner lead tip fat, the range c of the lead tip coining in the x + Y direction as shown in FIG.
A ring-shaped coining part 8 having a groove width t is provided on the outside of the lead tip coining part 7 shown by d. In this case, the depth Δ of the ring-shaped coining portion 8 is shallower than the depth Δ of the lead tip coining portion 7, and also deeper than the partial plating thickness d. Coining width 1.
As shown in FIGS. 3 and 4, the width 4 of the bank portion 9 left between the lead tip coining portion 7 and the ring-shaped coining portion 8 corresponds to the edge and den of the partial plating mask 3 during plating. The tip of the presser jig 5 at the time of loading is in the area 1 of the ring-shaped coining part 8. It is designed in advance to fit inside.

実験例 本発明によるIC用リードフレームを下記の条件の下に
製造した。
Experimental Example An IC lead frame according to the present invention was manufactured under the following conditions.

IC用リードフレーム素材は42合金、部分めっき材質
は銀、めっき厚d=6μへインナリードコイニング深さ
△、=20μ” s  ’) ”り状コイニング深さΔ
、310μm、リング状コイニングの溝巾1. = Q
、8M、リング状コイニングとリード先端コイニング部
の間の土手中4 = 0.2訝真、 かかる条件の下に製造された本発明によるIC用リード
フレームによれば、従来の欠点が取シ去られt優れた製
品が得られた。
IC lead frame material is 42 alloy, partial plating material is silver, plating thickness d = 6μ, inner lead coining depth △, = 20μ"s') "ri-shaped coining depth Δ
, 310 μm, ring-shaped coining groove width 1. = Q
, 8M, 4 in the bank between the ring-shaped coining and the lead tip coining part = 0.2 error, According to the IC lead frame of the present invention manufactured under such conditions, the drawbacks of the conventional ones can be eliminated. An excellent product was obtained.

〈発明の効果〉 本発明によるIC用リードフレームによれば、リング状
コイニングの深さΔ、が部分めっき厚dより大きく、ポ
ンディング押え治具5の先端がリング状コイニング領域
にくるように設計されてbる几め、IC用リードフレー
ムのワイヤがンデイング作業時に押工治具5が銀あるい
は金の部分めつき4と接触せず、これらのめっき材料が
押え治具に耐層することはない。
<Effects of the Invention> According to the IC lead frame according to the present invention, the depth Δ of the ring-shaped coining is larger than the partial plating thickness d, and the tip of the pounding presser jig 5 is designed to be in the ring-shaped coining area. As a result, the pressing jig 5 does not come into contact with the silver or gold partial plating 4 during the wire bonding work of the IC lead frame, and these plating materials do not adhere to the holding jig. do not have.

また、本発明によれば、リング状コイニング部8の深さ
Δ2がインナリードコイニング部7の深さ△□よυ浅く
しであることによって、部分めっき用マスク3の材質合
成コ゛ムの変形険が少なくコイニング段差部に第11図
で示したようなすき間6を生ぜず、めっき液がすき間6
へしみ出すことがなくリード先端部の不必要なめっきが
なされることがなく品質の優れたものが得られた。
Further, according to the present invention, the depth Δ2 of the ring-shaped coining portion 8 is smaller than the depth Δ□ of the inner lead coining portion 7, thereby reducing the risk of deformation of the composite material comb of the partial plating mask 3. The plating solution does not form the gap 6 as shown in Fig. 11 at the coining step, and the plating solution flows into the gap 6.
A product of excellent quality was obtained with no seepage and unnecessary plating on the tip of the lead.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明によるIC用リードフレームの平面図、
第2図は第1図に示すもののリード先端コイニング部と
リング状コイニング部を示すリード先端部の側面図、第
3図は第1図に示すものに部分めっき用マスクを使用し
たときのリード先端部の一部断面で示す側面図、第4図
は第1図に示すもののワイヤボッ14フフ時の押え治具
とリード先端部との関係を示す側面図、第5図は従来の
IC用リードフレームの平面図、第6図(IL)は打抜
き加工で生ずるダレを示す図。 第6図(b)は第6図(alに示すダレを修正するコイ
ニング加工を説明する図、第7図(alは第5図に示す
もののリード先端部の側面図、第7図(b)は第7図(
a)に示すもののa −B断面図、第8図はリード先端
部1aと部分めっき用マスクとの関係を示す図、第9図
はワイヤボンrイングの際使用する押え治具とIC用リ
ードフレームの関係を示す図、第10図は第9図の部分
図、第11図はリード先端コイニング部分に部分めっき
を施す際の部分めっき用マスクの先端部の状態を説明す
る図である。 図  面  中。 lはIC用リードフレーム、 3は部分めっき用マスク
。 4は部分めっき層、  5は押え治具、6は隙間、  
       7はリード先端コイニング部、8はリン
グ状コイニング部である。
FIG. 1 is a plan view of an IC lead frame according to the present invention;
Figure 2 is a side view of the lead tip showing the coining part and ring-shaped coining part of the lead tip shown in Figure 1, and Figure 3 is the lead tip when a partial plating mask is used for the item shown in Figure 1. FIG. 4 is a side view showing the relationship between the holding jig and the lead tip when wire-bottoming the wire bolt shown in FIG. 1, and FIG. 5 is a conventional IC lead frame. A plan view of FIG. 6 (IL) is a diagram showing sagging caused by punching. Figure 6(b) is a diagram explaining the coining process to correct the sagging shown in Figure 6(al), Figure 7(al is a side view of the lead tip of the lead shown in Figure 5, Figure 7(b) is shown in Figure 7 (
8 is a diagram showing the relationship between the lead tip 1a and the mask for partial plating, and FIG. 9 is a holding jig and IC lead frame used during wire bonding. 10 is a partial view of FIG. 9, and FIG. 11 is a diagram illustrating the state of the tip of the partial plating mask when partial plating is applied to the coining portion of the lead tip. Inside the drawing. 1 is a lead frame for IC, 3 is a mask for partial plating. 4 is the partial plating layer, 5 is the holding jig, 6 is the gap,
7 is a lead tip coining part, and 8 is a ring-shaped coining part.

Claims (2)

【特許請求の範囲】[Claims] (1)打抜加工によつて製造されたIC用リードフレー
ムにおいて、リード先端部にコイニング加工部を設ける
と共に、該リード先端コイニング加工部とリード基部の
間に上記リード先端コイニング部の深さより浅く、部分
めつき厚より深いリング状のコイニング加工部を設けた
ことを特徴とするIC用リードフレーム。
(1) In an IC lead frame manufactured by punching, a coining part is provided at the lead tip, and a depth shallower than the coining part at the lead tip is provided between the lead tip coining part and the lead base. , an IC lead frame characterized by having a ring-shaped coining part deeper than the partial plating thickness.
(2)上記リング状コイニング加工部の範囲内にリード
先端部に施されている部分めつきの後端部が位置されて
いることを特徴とする特許請求の範囲第1項記載のIC
用リードフレーム。
(2) The IC according to claim 1, wherein the rear end portion of the partial plating applied to the lead tip portion is located within the range of the ring-shaped coining processing portion.
lead frame.
JP19394485A 1985-09-04 1985-09-04 Lead frame for ic Pending JPS6254945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19394485A JPS6254945A (en) 1985-09-04 1985-09-04 Lead frame for ic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19394485A JPS6254945A (en) 1985-09-04 1985-09-04 Lead frame for ic

Publications (1)

Publication Number Publication Date
JPS6254945A true JPS6254945A (en) 1987-03-10

Family

ID=16316345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19394485A Pending JPS6254945A (en) 1985-09-04 1985-09-04 Lead frame for ic

Country Status (1)

Country Link
JP (1) JPS6254945A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03132305A (en) * 1989-10-19 1991-06-05 Kabuki Kensetsu Kk Apparatus and manufacture of pre-cast reinforced concrete beam material
EP0448942A1 (en) * 1990-03-15 1991-10-02 International Business Machines Corporation Semiconductor package
JPH0846114A (en) * 1995-06-22 1996-02-16 Yamaha Corp Semiconductor device and its manufacture
JP2006303371A (en) * 2005-04-25 2006-11-02 Renesas Technology Corp Manufacturing method of semiconductor device
EP2284886A3 (en) * 2009-06-17 2013-02-27 LSI Corporation Lead frame design to improve reliability

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03132305A (en) * 1989-10-19 1991-06-05 Kabuki Kensetsu Kk Apparatus and manufacture of pre-cast reinforced concrete beam material
JPH0617010B2 (en) * 1989-10-19 1994-03-09 株木建設株式会社 Manufacturing equipment and manufacturing method of precast reinforced concrete beam members.
EP0448942A1 (en) * 1990-03-15 1991-10-02 International Business Machines Corporation Semiconductor package
JPH0846114A (en) * 1995-06-22 1996-02-16 Yamaha Corp Semiconductor device and its manufacture
JP2006303371A (en) * 2005-04-25 2006-11-02 Renesas Technology Corp Manufacturing method of semiconductor device
JP4624170B2 (en) * 2005-04-25 2011-02-02 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor device
EP2284886A3 (en) * 2009-06-17 2013-02-27 LSI Corporation Lead frame design to improve reliability
US8869389B2 (en) 2009-06-17 2014-10-28 Lsi Corporation Method of manufacturing an electronic device package

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