JPS6254869B2 - - Google Patents

Info

Publication number
JPS6254869B2
JPS6254869B2 JP59280063A JP28006384A JPS6254869B2 JP S6254869 B2 JPS6254869 B2 JP S6254869B2 JP 59280063 A JP59280063 A JP 59280063A JP 28006384 A JP28006384 A JP 28006384A JP S6254869 B2 JPS6254869 B2 JP S6254869B2
Authority
JP
Japan
Prior art keywords
gas
vapor deposition
chemical vapor
deposited
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59280063A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61157681A (ja
Inventor
Kimio Nakada
Hiroshi Mikita
Nobuatsu Watanabe
Takeshi Nakajima
Yoho Tei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toho Kinzoku Co Ltd
Original Assignee
Toho Kinzoku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toho Kinzoku Co Ltd filed Critical Toho Kinzoku Co Ltd
Priority to JP28006384A priority Critical patent/JPS61157681A/ja
Publication of JPS61157681A publication Critical patent/JPS61157681A/ja
Publication of JPS6254869B2 publication Critical patent/JPS6254869B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP28006384A 1984-12-28 1984-12-28 化学蒸着法 Granted JPS61157681A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28006384A JPS61157681A (ja) 1984-12-28 1984-12-28 化学蒸着法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28006384A JPS61157681A (ja) 1984-12-28 1984-12-28 化学蒸着法

Publications (2)

Publication Number Publication Date
JPS61157681A JPS61157681A (ja) 1986-07-17
JPS6254869B2 true JPS6254869B2 (enrdf_load_stackoverflow) 1987-11-17

Family

ID=17619785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28006384A Granted JPS61157681A (ja) 1984-12-28 1984-12-28 化学蒸着法

Country Status (1)

Country Link
JP (1) JPS61157681A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874642A (en) * 1987-09-03 1989-10-17 Air Products And Chemicals, Inc. Method for depositing a hard, fine-grained, non-columnar alloy of tungsten and carbon on a substrate
US5006371A (en) * 1988-02-08 1991-04-09 Air Products And Chemicals, Inc. Low temperature chemical vapor deposition method for forming tungsten and tungsten carbide
US5024901A (en) * 1988-02-08 1991-06-18 Air Products And Chemicals, Inc. Method for depositing highly erosive and abrasive wear resistant composite coating system on a substrate
US5262202A (en) * 1988-02-17 1993-11-16 Air Products And Chemicals, Inc. Heat treated chemically vapor deposited products and treatment method
JP2748881B2 (ja) * 1995-02-03 1998-05-13 日本電気株式会社 半導体製造装置および製造方法
JP4456279B2 (ja) 1999-02-11 2010-04-28 ハーダイド・リミテツド 炭化タングステン被膜およびそれの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6184375A (ja) * 1984-09-29 1986-04-28 Toho Kinzoku Kk 化学蒸着法

Also Published As

Publication number Publication date
JPS61157681A (ja) 1986-07-17

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