JPH0250194B2 - - Google Patents

Info

Publication number
JPH0250194B2
JPH0250194B2 JP57232073A JP23207382A JPH0250194B2 JP H0250194 B2 JPH0250194 B2 JP H0250194B2 JP 57232073 A JP57232073 A JP 57232073A JP 23207382 A JP23207382 A JP 23207382A JP H0250194 B2 JPH0250194 B2 JP H0250194B2
Authority
JP
Japan
Prior art keywords
gas
tungsten
vapor deposition
deposited layer
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57232073A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59123765A (ja
Inventor
Hiroshi Mikita
Kazuhiko Tanizawa
Nobuyuki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toho Kinzoku Co Ltd
Original Assignee
Toho Kinzoku Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toho Kinzoku Co Ltd filed Critical Toho Kinzoku Co Ltd
Priority to JP23207382A priority Critical patent/JPS59123765A/ja
Publication of JPS59123765A publication Critical patent/JPS59123765A/ja
Publication of JPH0250194B2 publication Critical patent/JPH0250194B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14—Deposition of only one other metal element
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP23207382A 1982-12-28 1982-12-28 化学蒸着法 Granted JPS59123765A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23207382A JPS59123765A (ja) 1982-12-28 1982-12-28 化学蒸着法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23207382A JPS59123765A (ja) 1982-12-28 1982-12-28 化学蒸着法

Publications (2)

Publication Number Publication Date
JPS59123765A JPS59123765A (ja) 1984-07-17
JPH0250194B2 true JPH0250194B2 (enrdf_load_stackoverflow) 1990-11-01

Family

ID=16933561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23207382A Granted JPS59123765A (ja) 1982-12-28 1982-12-28 化学蒸着法

Country Status (1)

Country Link
JP (1) JPS59123765A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5547767A (en) * 1991-10-14 1996-08-20 Commissariat A L'energie Atomique Multilayer material, anti-erosion and anti-abrasion coating incorporating said multilayer material and process for producing said multilayer material
FR2693477B1 (fr) * 1992-07-09 1994-09-02 France Etat Armement Revêtement multicouche pour la protection de surface contre l'érosion et/ou l'abrasion.
US5702829A (en) * 1991-10-14 1997-12-30 Commissariat A L'energie Atomique Multilayer material, anti-erosion and anti-abrasion coating incorporating said multilayer material
CN104018135B (zh) * 2014-04-25 2016-08-24 厦门虹鹭钨钼工业有限公司 一种用于短弧高压气体放电灯阳极表面粗糙化的方法
CN104213096B (zh) * 2014-08-12 2017-01-11 厦门虹鹭钨钼工业有限公司 一种含钨涂层坩埚的制备方法
CN105063573B (zh) * 2015-07-15 2017-09-29 中国电子科技集团公司第四十六研究所 一种两步法制备二硫化钼薄膜的工艺

Also Published As

Publication number Publication date
JPS59123765A (ja) 1984-07-17

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