JPS5560017A - Hafnium carbide coating method - Google Patents

Hafnium carbide coating method

Info

Publication number
JPS5560017A
JPS5560017A JP13226678A JP13226678A JPS5560017A JP S5560017 A JPS5560017 A JP S5560017A JP 13226678 A JP13226678 A JP 13226678A JP 13226678 A JP13226678 A JP 13226678A JP S5560017 A JPS5560017 A JP S5560017A
Authority
JP
Japan
Prior art keywords
hfc
films
mixed
hfi4
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13226678A
Other languages
Japanese (ja)
Other versions
JPS6137353B2 (en
Inventor
Moriaki Fuyama
Mitsuru Ura
Haruhiko Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP13226678A priority Critical patent/JPS5560017A/en
Priority to US06/053,731 priority patent/US4264682A/en
Publication of JPS5560017A publication Critical patent/JPS5560017A/en
Publication of JPS6137353B2 publication Critical patent/JPS6137353B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/36—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Abstract

PURPOSE:To enahance the wear resistance of a sintered hard alloy by mixing hydrocarbon into HfI4; feeding this mixed gas onto substrates heated to a specified temp.; and forming HfC in plasma to coat the substrates with HfC films. CONSTITUTION:A fixed quantity of I2 vapor is generated from I2 10 with thermostat 11 and temp. controller 12. This I2 vapor is mixed with Ar and contacted to Hf 9 heated with sub-heater 8. C4H10 is mixed into the resulting HfI4, and this mixed gas is passed through uniform distribution plate 13 and fed onto substrates 6 of 890-1200 deg.C mounted on holders 7 in reaction tube 1 to form HfC films in plasma produced under a reduced press. of 0.25 Torr or below. By this method dense HfC films with superior uniform adherence are obtd. easily and rapidly.
JP13226678A 1978-10-27 1978-10-27 Hafnium carbide coating method Granted JPS5560017A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP13226678A JPS5560017A (en) 1978-10-27 1978-10-27 Hafnium carbide coating method
US06/053,731 US4264682A (en) 1978-10-27 1979-07-02 Surface hafnium-titanium compound coated hard alloy material and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13226678A JPS5560017A (en) 1978-10-27 1978-10-27 Hafnium carbide coating method

Publications (2)

Publication Number Publication Date
JPS5560017A true JPS5560017A (en) 1980-05-06
JPS6137353B2 JPS6137353B2 (en) 1986-08-23

Family

ID=15077254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13226678A Granted JPS5560017A (en) 1978-10-27 1978-10-27 Hafnium carbide coating method

Country Status (1)

Country Link
JP (1) JPS5560017A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5995170U (en) * 1982-12-17 1984-06-28 富士通株式会社 chemical vapor deposition equipment
JP2015081375A (en) * 2013-10-23 2015-04-27 株式会社デンソー Film deposition apparatus, and manufacturing method for hard film coated cutting tool

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5995170U (en) * 1982-12-17 1984-06-28 富士通株式会社 chemical vapor deposition equipment
JP2015081375A (en) * 2013-10-23 2015-04-27 株式会社デンソー Film deposition apparatus, and manufacturing method for hard film coated cutting tool

Also Published As

Publication number Publication date
JPS6137353B2 (en) 1986-08-23

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