JPS625334B2 - - Google Patents

Info

Publication number
JPS625334B2
JPS625334B2 JP54145258A JP14525879A JPS625334B2 JP S625334 B2 JPS625334 B2 JP S625334B2 JP 54145258 A JP54145258 A JP 54145258A JP 14525879 A JP14525879 A JP 14525879A JP S625334 B2 JPS625334 B2 JP S625334B2
Authority
JP
Japan
Prior art keywords
ray
exposure
membrane
pattern
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54145258A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5669828A (en
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14525879A priority Critical patent/JPS5669828A/ja
Publication of JPS5669828A publication Critical patent/JPS5669828A/ja
Publication of JPS625334B2 publication Critical patent/JPS625334B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP14525879A 1979-11-09 1979-11-09 Checking method for x-ray exposure condition Granted JPS5669828A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14525879A JPS5669828A (en) 1979-11-09 1979-11-09 Checking method for x-ray exposure condition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14525879A JPS5669828A (en) 1979-11-09 1979-11-09 Checking method for x-ray exposure condition

Publications (2)

Publication Number Publication Date
JPS5669828A JPS5669828A (en) 1981-06-11
JPS625334B2 true JPS625334B2 (enrdf_load_stackoverflow) 1987-02-04

Family

ID=15380967

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14525879A Granted JPS5669828A (en) 1979-11-09 1979-11-09 Checking method for x-ray exposure condition

Country Status (1)

Country Link
JP (1) JPS5669828A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53107276A (en) * 1977-03-01 1978-09-19 Fujitsu Ltd Mask for x-ray exposure

Also Published As

Publication number Publication date
JPS5669828A (en) 1981-06-11

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