JPS6252926U - - Google Patents
Info
- Publication number
- JPS6252926U JPS6252926U JP14383285U JP14383285U JPS6252926U JP S6252926 U JPS6252926 U JP S6252926U JP 14383285 U JP14383285 U JP 14383285U JP 14383285 U JP14383285 U JP 14383285U JP S6252926 U JPS6252926 U JP S6252926U
- Authority
- JP
- Japan
- Prior art keywords
- light source
- receiving element
- cylindrical body
- light
- reaction tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 239000010409 thin film Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Description
第１図は本考案の一実施例のプラズマＣＶＤ装
置の要部断面図、第２図は別の実施例の光ＣＶＤ
装置の要部断面図である。
１：受光素子、２：光源、３：ガス供給管、４
：筒、５：真空槽、６：ヒータ、７：基板支持体
、８：透明基板、９：対向電極、１１：紫外線ラ
ンプ、１０：石英ガラス、６１，７１，９１：穴
。
Fig. 1 is a sectional view of the main parts of a plasma CVD apparatus according to one embodiment of the present invention, and Fig. 2 is a photo-CVD apparatus according to another embodiment.
FIG. 2 is a sectional view of a main part of the device. 1: Light receiving element, 2: Light source, 3: Gas supply pipe, 4
: cylinder, 5: vacuum chamber, 6: heater, 7: substrate support, 8: transparent substrate, 9: counter electrode, 11: ultraviolet lamp, 10: quartz glass, 61, 71, 91: hole.
Claims (1)
一方に光源を他方に光源に向かつて開口する筒状
体の底部に位置する受光素子を対向して備え、筒
状体の内部は槽外からのガス供給管に連通し、光
源から受光素子に至る間に存在する装置部材に光
の通路が設けられたことを特徴とする薄膜生成装
置。 A light source is provided on one side of the reaction tank wall that is parallel to the substrate placed in the reaction tank, and a light receiving element located at the bottom of a cylindrical body that opens toward the light source is provided on the other side, and the inside of the cylindrical body is located inside the tank. 1. A thin film production device, characterized in that a light path is provided in a device member that communicates with an external gas supply pipe and exists between a light source and a light receiving element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14383285U JPS6252926U (en) | 1985-09-20 | 1985-09-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14383285U JPS6252926U (en) | 1985-09-20 | 1985-09-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6252926U true JPS6252926U (en) | 1987-04-02 |
Family
ID=31053877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14383285U Pending JPS6252926U (en) | 1985-09-20 | 1985-09-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6252926U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186322A (en) * | 1981-05-11 | 1982-11-16 | Mitsubishi Electric Corp | Thin film forming device |
-
1985
- 1985-09-20 JP JP14383285U patent/JPS6252926U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186322A (en) * | 1981-05-11 | 1982-11-16 | Mitsubishi Electric Corp | Thin film forming device |