JPH02102722U - - Google Patents
Info
- Publication number
- JPH02102722U JPH02102722U JP1053489U JP1053489U JPH02102722U JP H02102722 U JPH02102722 U JP H02102722U JP 1053489 U JP1053489 U JP 1053489U JP 1053489 U JP1053489 U JP 1053489U JP H02102722 U JPH02102722 U JP H02102722U
- Authority
- JP
- Japan
- Prior art keywords
- frequency electrode
- flat high
- electrode
- substrate support
- plasma cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 3
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Description
第１図ａは本考案の一実施例のプラズマＣＶＤ
装置の一部水平断面図、第１図ｂは第１図ａの要
部拡大図、第２図、第３図は従来のプラズマＣＶ
Ｄ装置を示し、第２図は第３図のＢ―Ｂ線矢視断
面図、第３図は第２図のＡ―Ａ線矢視断面図であ
る。
１：成膜基板、２３：ＣＶＤ処理室、４１：真
空源、４２：ガス導入管、５：高周波電極、６：
基板支持体、７１：移動板、７３：電極フレーム
、７４：ガイド、７５：ばね。
FIG. 1a shows a plasma CVD process according to an embodiment of the present invention.
A partial horizontal sectional view of the device, FIG. 1b is an enlarged view of the main part of FIG. 1a, and FIGS. 2 and 3 are conventional plasma CV
2 is a sectional view taken along the line BB in FIG. 3, and FIG. 3 is a sectional view taken along the line AA in FIG. 2. 1: Film formation substrate, 23: CVD processing chamber, 41: Vacuum source, 42: Gas introduction tube, 5: High frequency electrode, 6:
Substrate support, 71: moving plate, 73: electrode frame, 74: guide, 75: spring.
Claims (1)
ね加熱体を備えた基板支持体と、対向して配置さ
れた平板状高周波電極を有するものにおいて、平
板状高周波電極にその電極の板面内の複数方向に
張力を加える弾性体を備えたことを特徴とするプ
ラズマＣＶＤ装置。 In a substrate support that also serves as one electrode and is equipped with a heating body in a vacuum chamber into which a reaction gas can be introduced, and a flat high-frequency electrode placed opposite to each other, the flat high-frequency electrode is A plasma CVD apparatus characterized by comprising an elastic body that applies tension in multiple directions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1053489U JPH02102722U (en) | 1989-01-31 | 1989-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1053489U JPH02102722U (en) | 1989-01-31 | 1989-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02102722U true JPH02102722U (en) | 1990-08-15 |
Family
ID=31218281
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1053489U Pending JPH02102722U (en) | 1989-01-31 | 1989-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02102722U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158982A (en) * | 2003-11-26 | 2005-06-16 | Kaneka Corp | Cvd system |
-
1989
- 1989-01-31 JP JP1053489U patent/JPH02102722U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005158982A (en) * | 2003-11-26 | 2005-06-16 | Kaneka Corp | Cvd system |
| JP4679051B2 (en) * | 2003-11-26 | 2011-04-27 | 株式会社カネカ | CVD equipment |
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