JPS6252850B2 - - Google Patents

Info

Publication number
JPS6252850B2
JPS6252850B2 JP12507280A JP12507280A JPS6252850B2 JP S6252850 B2 JPS6252850 B2 JP S6252850B2 JP 12507280 A JP12507280 A JP 12507280A JP 12507280 A JP12507280 A JP 12507280A JP S6252850 B2 JPS6252850 B2 JP S6252850B2
Authority
JP
Japan
Prior art keywords
pattern
electron beam
light
thin film
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12507280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5748731A (en
Inventor
Yoshihiro Todokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP12507280A priority Critical patent/JPS5748731A/ja
Publication of JPS5748731A publication Critical patent/JPS5748731A/ja
Publication of JPS6252850B2 publication Critical patent/JPS6252850B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electron Beam Exposure (AREA)
JP12507280A 1980-09-08 1980-09-08 Manufacture of mask Granted JPS5748731A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12507280A JPS5748731A (en) 1980-09-08 1980-09-08 Manufacture of mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12507280A JPS5748731A (en) 1980-09-08 1980-09-08 Manufacture of mask

Publications (2)

Publication Number Publication Date
JPS5748731A JPS5748731A (en) 1982-03-20
JPS6252850B2 true JPS6252850B2 (en, 2012) 1987-11-07

Family

ID=14901121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12507280A Granted JPS5748731A (en) 1980-09-08 1980-09-08 Manufacture of mask

Country Status (1)

Country Link
JP (1) JPS5748731A (en, 2012)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02968A (ja) * 1988-06-08 1990-01-05 Fujitsu Ltd フォトマスク
JP3784136B2 (ja) * 1997-06-02 2006-06-07 株式会社ルネサステクノロジ 投影露光装置および投影露光方法

Also Published As

Publication number Publication date
JPS5748731A (en) 1982-03-20

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