JPS6250194B2 - - Google Patents

Info

Publication number
JPS6250194B2
JPS6250194B2 JP54131484A JP13148479A JPS6250194B2 JP S6250194 B2 JPS6250194 B2 JP S6250194B2 JP 54131484 A JP54131484 A JP 54131484A JP 13148479 A JP13148479 A JP 13148479A JP S6250194 B2 JPS6250194 B2 JP S6250194B2
Authority
JP
Japan
Prior art keywords
coating
photoresist
liquid
coating liquid
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54131484A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5656261A (en
Inventor
Kazuhiko Tsuji
Shuji Kondo
Shigetoshi Takayanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13148479A priority Critical patent/JPS5656261A/ja
Publication of JPS5656261A publication Critical patent/JPS5656261A/ja
Publication of JPS6250194B2 publication Critical patent/JPS6250194B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP13148479A 1979-10-11 1979-10-11 Method and apparatus for rotary coating Granted JPS5656261A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13148479A JPS5656261A (en) 1979-10-11 1979-10-11 Method and apparatus for rotary coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13148479A JPS5656261A (en) 1979-10-11 1979-10-11 Method and apparatus for rotary coating

Publications (2)

Publication Number Publication Date
JPS5656261A JPS5656261A (en) 1981-05-18
JPS6250194B2 true JPS6250194B2 (enExample) 1987-10-23

Family

ID=15059052

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13148479A Granted JPS5656261A (en) 1979-10-11 1979-10-11 Method and apparatus for rotary coating

Country Status (1)

Country Link
JP (1) JPS5656261A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04504377A (ja) * 1989-04-05 1992-08-06 オー・シー・ジー・マイクロエレクトロニツク・マテリアルズ・インコーポレイテツド 基体上へフォトレジスト組成物をコーティングする方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208832A (ja) * 1983-05-13 1984-11-27 Hitachi Tokyo Electronics Co Ltd 塗布装置
JPH0669019B2 (ja) * 1984-03-12 1994-08-31 株式会社ニコン 半導体製造装置
US4590094A (en) * 1984-10-29 1986-05-20 International Business Machines Corporation Inverted apply using bubble dispense
JPH03272140A (ja) * 1990-03-22 1991-12-03 Fujitsu Ltd 半導体基板の薬品処理装置
JP4812704B2 (ja) * 2007-07-10 2011-11-09 東京エレクトロン株式会社 基板処理装置
JP2022098245A (ja) * 2020-12-21 2022-07-01 株式会社ディスコ スピンコーター、及びスピンコート方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04504377A (ja) * 1989-04-05 1992-08-06 オー・シー・ジー・マイクロエレクトロニツク・マテリアルズ・インコーポレイテツド 基体上へフォトレジスト組成物をコーティングする方法

Also Published As

Publication number Publication date
JPS5656261A (en) 1981-05-18

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