JPS6248886B2 - - Google Patents
Info
- Publication number
- JPS6248886B2 JPS6248886B2 JP55046879A JP4687980A JPS6248886B2 JP S6248886 B2 JPS6248886 B2 JP S6248886B2 JP 55046879 A JP55046879 A JP 55046879A JP 4687980 A JP4687980 A JP 4687980A JP S6248886 B2 JPS6248886 B2 JP S6248886B2
- Authority
- JP
- Japan
- Prior art keywords
- conductor
- magnetic film
- transformer
- laminated
- conductors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004020 conductor Substances 0.000 claims description 43
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 239000010408 film Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 24
- 238000010586 diagram Methods 0.000 description 6
- 239000000696 magnetic material Substances 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/046—Printed circuit coils structurally combined with ferromagnetic material
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Insulating Of Coils (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Coils Or Transformers For Communication (AREA)
Description
【発明の詳細な説明】 本発明は積層トランスの製造方法に関する。[Detailed description of the invention] The present invention relates to a method for manufacturing a laminated transformer.
従来のトランスはE・I形、E形、E・ヨ形等
の形状を有する磁心の任意の脚部に絶縁被覆導線
を巻装して一対のコイルを形成したものから成
る。しかし、このような方式によるトランスは複
雑な巻線工程を必要とし、また製造されたトラン
スが大型化するなどの問題点があつた。 A conventional transformer consists of a magnetic core having an E-I shape, an E-shape, an E-Y shape, etc., and an insulated conductor wire wound around any leg of the core to form a pair of coils. However, the transformer using this method requires a complicated winding process, and the manufactured transformer becomes large.
本発明者等は従来の巻線方式によるトランスの
問題点を解決するために積層方式によるトランス
の製造方法を特願昭54−127899号において提案し
た。同出願の方法は磁性体粉末を含むペースト
と、導電紛末を含むペーストとを用意し、これら
を印刷技術を応用して適当な順序で印刷積層し、
全体として2本の等価的なコイルと、これらのコ
イルを貫く磁路に対する透磁性磁心とを与えるよ
うにしたものである。印刷されて出来た積層体は
焼成炉において高温で焼結される。従つて導電粉
末としてはPd,Ag−Pd等の高価な耐熱性金属材
料が必要であるし、また高温処理が必要となる。
さらに、積層された層はあまり薄く出来ないので
寸法の減少は未だ不十分であり、また大きな相互
及び自己誘導係数が出し難い。また精度の点も十
分に制御できない場合がある。 The present inventors proposed a method of manufacturing a transformer using a lamination method in Japanese Patent Application No. 127899/1989 in order to solve the problems of the conventional transformer using a winding method. The method of the same application prepares a paste containing magnetic powder and a paste containing conductive powder, and applies printing technology to print and laminate them in an appropriate order.
The overall arrangement is to provide two equivalent coils and a magnetically permeable core for the magnetic path passing through these coils. The printed laminate is sintered at high temperature in a firing furnace. Therefore, an expensive heat-resistant metal material such as Pd or Ag-Pd is required as the conductive powder, and high-temperature treatment is also required.
Furthermore, the stacked layers cannot be made very thin, so the reduction in size is still insufficient, and it is difficult to achieve large mutual and self-induction coefficients. Furthermore, accuracy may not be sufficiently controlled in some cases.
本発明は積層トランスの製造技術をさらに改良
することを目的とし、印刷法によらないでスパツ
タリング法による膜形成技術を利用して積層トラ
ンスを製造する方法を提供する。本発明の方法は
焼成工程を必要としないから、Cu,Al,Ag等の
任意の導電材料を使用できるのみならず、各層の
厚みが一様でしかも薄くできると共に、精度も良
好な積層トランスを提供できる。 The present invention aims to further improve the manufacturing technology of laminated transformers, and provides a method for manufacturing laminated transformers using a film forming technique using sputtering instead of printing. Since the method of the present invention does not require a firing process, it not only allows the use of any conductive material such as Cu, Al, Ag, etc., but also enables the creation of a laminated transformer with uniform and thin thickness for each layer and with good precision. Can be provided.
本発明はスパツタリング法を用いて実施され
る。トランスの2つ以上のコイルの形成にはコイ
ル状または渦巻状の導電パターンを形成するため
の金属と、導電パターンを絶縁する磁性体とが必
要である。スパツタリング法によれば、MO・
Fe2O3(M:金属)で示される酸化物フエライト
等の磁性体層の形成と、これらの層に対する
Al,Cu,Ag等の導電性金属層の形成が困難なく
実施できる。従つて、焼成工程が不要となり、安
価な金属の使用で十分に本発明の目的を達成する
ことができる。 The invention is implemented using a sputtering method. Forming two or more coils of a transformer requires metal for forming a coiled or spiral conductive pattern and a magnetic material for insulating the conductive pattern. According to the sputtering method, MO・
Formation of magnetic layers such as oxide ferrite represented by Fe 2 O 3 (M: metal) and
Conductive metal layers such as Al, Cu, and Ag can be formed without difficulty. Therefore, a firing process is not necessary, and the object of the present invention can be sufficiently achieved using inexpensive metals.
本発明の方法で得られる積層トランスの大きな
特徴は、各層の厚みがオングストローム単位
(10-1〓m)に近いものまで可能になるために、
比較的薄い積層体でも大きな相互インダクタンス
を有することができること、従つてまた非常に広
範囲の相互インダクタンス値を有する積層トラン
スが自由に製造できることである。 The major feature of the multilayer transformer obtained by the method of the present invention is that the thickness of each layer can be close to the angstrom unit (10 -1 〓m).
The advantage is that even relatively thin stacks can have large mutual inductances, and that laminated transformers with a very wide range of mutual inductance values can therefore be produced at will.
スパツタリング法は膜形成速度が他の方法に比
してやや遅いが、最近では高速スパツタリング法
も開発されている。スパツタリング法は絶縁体源
または金属源の組成をほぼそのまま生成膜の組成
に移行させることができる特徴があり、さらに付
着強度が大きく、生成膜が一様であるので特に好
ましい方法である。なおスパツタリング法では回
り込み現象が大きくなるので、マスクは基板の面
に出来るだけ接近させる。 Although the sputtering method has a somewhat slower film formation rate than other methods, high-speed sputtering methods have recently been developed. The sputtering method has the characteristic that the composition of the insulator source or metal source can be transferred almost directly to the composition of the produced film, and furthermore, the adhesion strength is high and the produced film is uniform, so it is a particularly preferred method. Note that the sputtering method increases the wrap-around phenomenon, so the mask is placed as close to the surface of the substrate as possible.
以下、図面に関連して本発明の実施例を詳しく
説明する。 Embodiments of the invention will now be described in detail with reference to the drawings.
第1図はスパツタリング法の原理を示す図であ
り、10-3〜10-2トール程度のアルゴンガスを封じ
た真空室に、マイナス電極Aと接地電極Bとを対
向させ、この間に高周波電圧(〜10MHz等)を印
加する。マイナス電極Aの面には蒸着しようとす
る金属または酸化物の板Cを保持させ、接地電極
Bの面には蒸着用の基板Dを位置づけ、そして基
板Dの面にはマスクEを配置する。高周波電圧を
電極A,Bの間に印加すると、金属または酸化物
の板Cは正イオン化されたガスの衝撃を受けて金
属または酸化物の原子または分子が板Cの表面か
ら放出され、大きな速度で基板Dへ向けてスパツ
ターし薄膜状に付着する。なお、スパツタリング
法は公知であるから、これ以上詳しい説明は必要
がないと思う。 Figure 1 is a diagram showing the principle of the sputtering method, in which a negative electrode A and a ground electrode B are placed facing each other in a vacuum chamber sealed with argon gas of about 10 -3 to 10 -2 Torr, and a high-frequency voltage ( ~10MHz, etc.). A plate C of metal or oxide to be vapor-deposited is held on the surface of the negative electrode A, a substrate D for vapor deposition is positioned on the surface of the ground electrode B, and a mask E is placed on the surface of the substrate D. When a high frequency voltage is applied between electrodes A and B, the metal or oxide plate C is bombarded with positively ionized gas, and atoms or molecules of the metal or oxide are ejected from the surface of the plate C at a large speed. It is sputtered toward the substrate D to form a thin film. Incidentally, since the sputtering method is well known, there is no need for further detailed explanation.
第2図ないし第7図は本発明の積層トランス製
造方法の第1実施例を示す工程図であり、第8図
は同積層トランスの等価回路図である。先ず第2
図のように、適当なマスク(図示せず)を通して
絶縁性のフエライト磁性膜1を基板(第1図の
D)にスパツターで付着させる。基板としては例
えば剥離性の面を有する金属板、或いは適当な厚
みを有し磁性膜1と同じ大きさを有する板等であ
り、これら基板は後で剥離されるか、或いは積層
体の一体的一部にしてもよい。またマスクには同
一形の通過孔ないしパターンを多数形成して同時
に多数の積層トランスを製造してもよい。なお以
下で磁性膜に言及するときは同一のフエライト磁
性体を、また導体に言及するときは同一の導体
(Al,Cu,Ag等)を指すものとする。 2 to 7 are process diagrams showing a first embodiment of the method for manufacturing a laminated transformer according to the present invention, and FIG. 8 is an equivalent circuit diagram of the same laminated transformer. First, the second
As shown, an insulating ferrite magnetic film 1 is sputtered onto a substrate (D in FIG. 1) through a suitable mask (not shown). The substrate is, for example, a metal plate with a removable surface, or a plate with an appropriate thickness and the same size as the magnetic film 1, and these substrates can be peeled off later, or can be used as an integral part of the laminate. It may be a part of it. Furthermore, a large number of identical-shaped through holes or patterns may be formed on the mask to manufacture a large number of laminated transformers at the same time. In the following, when referring to a magnetic film, we refer to the same ferrite magnetic material, and when referring to a conductor, we refer to the same conductor (Al, Cu, Ag, etc.).
第2図の説明に戻るに、磁性膜1の形成が終つ
たら、対称なフツク状の導体2,3をマスク(図
示せず)を通してスパツタリング法により磁性膜
1の面に形成する。4,5は磁性膜1の下辺に露
出する単体2,3の引出部であり、6,7は導体
2,3の内端である。次に第3図のように導体
2,3の内端6,7を残して他の部分に磁性体
8,9をスパツタリング法により形成する。次に
ほぼ円形をなす導体10,11を第4図のように
内端が下側導体2,3の内端6,7へ重畳し、外
端が積層体の上辺へ露出する引出部12,13と
なるようにして形成する。このようにして各1タ
ーンから成る2つの接近したコイルが形成される
ことになる。なお上記のコイルは僅かに1ターン
から成るが、必要に応じて磁性膜及び導体の積層
数を増加して必要なターン数を得てもよい。最後
に第5図のように全面に磁性体膜16を形成して
積層工程を終る。積層体を真空室から取出した
上、適当な導電ペースト(金属粉末入りの導電ペ
ースト)を第6図及び第7図に示すように積層体
の四辺の隅部へ焼付けて外部端子17,18,1
9,20とする。外部端子の位置は導体の引出部
4,5,12,13に接触する位置である。 Returning to the explanation of FIG. 2, after the formation of the magnetic film 1 is completed, symmetrical hook-shaped conductors 2 and 3 are formed on the surface of the magnetic film 1 by sputtering through a mask (not shown). Reference numerals 4 and 5 are lead-out portions of the single bodies 2 and 3 exposed at the lower side of the magnetic film 1, and 6 and 7 are inner ends of the conductors 2 and 3. Next, as shown in FIG. 3, magnetic materials 8 and 9 are formed by sputtering on the other portions of the conductors 2 and 3, except for the inner ends 6 and 7. Next, as shown in FIG. 4, the substantially circular conductors 10, 11 are overlapped with the inner ends 6, 7 of the lower conductors 2, 3, and the outer ends are exposed to the upper side of the laminate. 13. In this way two closely spaced coils of one turn each are formed. Although the above-mentioned coil consists of only one turn, the number of laminated magnetic films and conductors may be increased to obtain the required number of turns, if necessary. Finally, as shown in FIG. 5, a magnetic film 16 is formed on the entire surface to complete the lamination process. After taking out the laminate from the vacuum chamber, a suitable conductive paste (conductive paste containing metal powder) is baked into the corners of the four sides of the laminate as shown in FIGS. 6 and 7 to form external terminals 17, 18, 1
9,20. The external terminals are located in contact with the lead-out portions 4, 5, 12, and 13 of the conductors.
第7図は完成した積層トランスであり、第8図
はその等価回路図である。 FIG. 7 shows the completed laminated transformer, and FIG. 8 is its equivalent circuit diagram.
上記の例は並列形のトランスであつたが、結合
度の大きい積層トランスの製造方法を第9−18
図に示す。本例もまたスパツタリング法によるも
のとする。第9図を参照するに、先ず磁性体膜2
1を形成し、次にL字形の導体22を形成する。
導体22の外端23は磁性体膜21の下辺に露出
し、また内端24は磁性体膜21の内部にとどま
る。次に第10図のように導体22の内端24を
残して磁性体膜21の左部分に磁性体25を形成
し、次で第11図のように外端27が積層体の上
辺に露出しまた内端28が磁性体膜25上に終端
する導体26を形成する。第12図に示すように
導体22,26の端部24,28を残して広幅の
L字形の磁性体膜29を形成し、次に第13図の
ように導体26の末端28から延長する導体30
を形成する。第14図のように、導体30の末端
32を残して磁性体膜33を形成し、次で第15
図のように、導体22の末端24から延長するほ
ぼU字形の導体34を形成し、その外端36を積
層体の上辺に露出させる。第16図の工程に移つ
て導体30の末端を残して全面に磁性体膜37を
形成し、次に第17図のように導体30の末端3
2から延長して積層体の下辺に終端する外端40
を有する導体38を形成する。以上のように積層
が終つたら、真空室から積層体を取出して第18
図のように導体の外端23,27,36,40に
それぞれ接続する外部端子42,44,43,4
5を焼付ける。第18図に示される積層トランス
は各コイルの磁路が他方のコイルの磁路とほぼ同
一となる。 The above example was a parallel type transformer, but the method for manufacturing a laminated transformer with a high degree of coupling is described in Section 9-18.
As shown in the figure. This example also uses the sputtering method. Referring to FIG. 9, first, the magnetic film 2
1 is formed, and then an L-shaped conductor 22 is formed.
The outer end 23 of the conductor 22 is exposed at the lower side of the magnetic film 21, and the inner end 24 remains inside the magnetic film 21. Next, as shown in FIG. 10, a magnetic material 25 is formed on the left part of the magnetic film 21, leaving the inner end 24 of the conductor 22, and then the outer end 27 is exposed on the upper side of the laminate as shown in FIG. Furthermore, a conductor 26 is formed whose inner end 28 terminates on the magnetic film 25 . As shown in FIG. 12, a wide L-shaped magnetic film 29 is formed leaving the ends 24 and 28 of the conductors 22 and 26, and then a conductor extending from the end 28 of the conductor 26 is formed as shown in FIG. 30
form. As shown in FIG. 14, a magnetic film 33 is formed leaving the end 32 of the conductor 30, and then the 15th
As shown, a generally U-shaped conductor 34 is formed extending from the distal end 24 of the conductor 22, with its outer end 36 exposed at the top side of the laminate. Moving on to the process shown in FIG. 16, a magnetic film 37 is formed on the entire surface leaving the end of the conductor 30, and then as shown in FIG.
An outer end 40 extending from 2 and terminating at the bottom edge of the laminate.
A conductor 38 is formed. When the lamination is completed as described above, take out the laminated body from the vacuum chamber and
External terminals 42, 44, 43, 4 connected to the outer ends 23, 27, 36, 40 of the conductor, respectively, as shown in the figure.
Burn 5. In the laminated transformer shown in FIG. 18, the magnetic path of each coil is almost the same as the magnetic path of the other coil.
第19〜29図は本発明の方法をロータリート
ランスに応用した例を示す。ロータリートランス
の1例は第29図に示されるように、固定子Sに
所定のコイルを形成したもの(これも本発明の方
法で製作できるが特に説明しない)に、回転軸7
6に保持したロータRを近接配置し、ロータRの
回転でコイルの結合を変えるようにしたものであ
る。本発明に従つて、ロータRは以下のように製
造される。 19 to 29 show an example in which the method of the present invention is applied to a rotary transformer. An example of a rotary transformer, as shown in FIG.
The rotor R held at 6 is placed close to the rotor R, and the coupling of the coils is changed by the rotation of the rotor R. According to the invention, rotor R is manufactured as follows.
第19図に示すように、先ず円板状に磁性体膜
51を形成し、次にS1を始端として磁性体膜51
の下辺に露出し、端部50に終端する小円弧を有
する導体52を形成する。第20図に示すよう
に、導体52の端部50を露出する孔53を有す
る磁性体膜51の全面に磁性体膜54を形成す
る。次に第21図に示すように導体52の末端5
0に接続する小円弧となる導体55及びS2を始端
とし、58を終端とする大円弧を画く導体56を
形成し、さらに第22図のように端部57,58
を露出する孔59,60を有する磁性体膜61を
全面に形成する。第23図の工程に移つて、下側
導体の末端57,58に接続する小円弧及び大円
弧の導体62,63を形成し、その上に第24図
のように導体62,63の末端64,65を露出
する孔67,68を有する磁性体膜66を形成
し、第25図のようにさらに導体69,70を下
側の導体の末端64,65に接続するように形成
し、導体69の末端は積層体の下辺に露出させて
終端F1とする。第26図に示すように導体70
の末端71を露出する孔72を有する磁性体膜7
3を全面に被着し、次に第27図のように導体7
4を下側導体70の末端71に接続するように形
成し、その外端を積層体の周辺に露出させて終端
F2とする。次に第28図のように、全面に磁性
体膜75を形成し、最後に終端S1,S2,F1,F2
に接続する外部端子77,78,79,80を導
電ぺーストの焼付けで形成する。以上により積層
トランスのロータRが形成されるので、これに回
転軸76を接着するとステータSと共に使用でき
る。第29図の等価回路は第30図に示す通りで
ある。 As shown in FIG. 19, the magnetic film 51 is first formed in a disk shape, and then the magnetic film 51 is formed with S 1 as the starting point.
A conductor 52 having a small circular arc exposed at the lower side and terminating at the end 50 is formed. As shown in FIG. 20, a magnetic film 54 is formed over the entire surface of a magnetic film 51 having holes 53 that expose the ends 50 of the conductors 52. As shown in FIG. Next, as shown in FIG.
A conductor 55 forming a small arc connected to S 2 and a conductor 56 forming a large arc starting from S 2 and terminating at 58 are formed, and the ends 57 and 58 are formed as shown in FIG.
A magnetic film 61 having holes 59 and 60 exposing the magnetic material is formed over the entire surface. 23, small arc and large arc conductors 62, 63 connected to the ends 57, 58 of the lower conductor are formed, and the ends 62, 63 of the conductors 62, 63 are formed thereon as shown in FIG. , 65 is formed, and as shown in FIG. The end of is exposed at the bottom side of the laminate to form the terminal end F1 . Conductor 70 as shown in FIG.
A magnetic film 7 having a hole 72 exposing an end 71 of the magnetic film 7
3 on the entire surface, then conductor 7 as shown in Fig. 27.
4 is formed so as to be connected to the end 71 of the lower conductor 70, and its outer end is exposed around the laminate and terminated.
Let it be F 2 . Next, as shown in FIG. 28, a magnetic film 75 is formed on the entire surface, and finally the terminal ends S 1 , S 2 , F 1 , F 2
External terminals 77, 78, 79, and 80 to be connected to are formed by baking conductive paste. Since the rotor R of the laminated transformer is formed as described above, it can be used together with the stator S by adhering the rotating shaft 76 to the rotor R. The equivalent circuit of FIG. 29 is as shown in FIG. 30.
以上、3つの実施例についてスパツタリング法
による積層トランスの製造法を説明した。 The method for manufacturing a laminated transformer using the sputtering method has been described above for three embodiments.
以上のように、本発明はスパツタリング法によ
る薄膜形成技術を利用するから一貫した工程で積
層トランスを精度良く製造することができる。積
層体の各層は極く薄いものであるから製品の寸法
は小さくできると共に、導体のターン数は任意に
調整できるから小型の積層トランスで極めて広範
囲のインダクタンス値を与えることができる。し
かも、本発明で得られる積層トランスは外部端子
を有するチツプ形であるから、プリント基板への
直づけや半田付けに便利である。また焼成が必要
でないから、導体として安価な金属を利用でき
る。 As described above, since the present invention utilizes a thin film forming technique using a sputtering method, a laminated transformer can be manufactured with high precision through a consistent process. Since each layer of the laminate is extremely thin, the dimensions of the product can be made small, and the number of conductor turns can be adjusted arbitrarily, making it possible to provide an extremely wide range of inductance values with a small laminate transformer. Moreover, since the laminated transformer obtained by the present invention is in the form of a chip having external terminals, it is convenient for direct attachment to a printed circuit board or soldering. Furthermore, since no firing is required, inexpensive metals can be used as conductors.
第1図は本発明の方法を実施する装置の1例を
示す正面図、第2図ないし第6図は本発明の第1
実施例の順次工程を示す平面図、第7図は完成し
た積層トランスの斜視図、第8図は同等価回路
図、第9図ないし第18図は本発明の第2実施例
の順次工程を示す平面図、第19図ないし第28
図は本発明の第3実施例の順次工程を示す平面
図、第29図は完成したロータをステータと組合
せた側面図、及び第30図は第29図の等価回路
図である。図中、主な部材は次の通りである。
1,8,9,16:磁性体膜、2,3,10,
11:導体、17,18,19,20:外部端
子、21,25,29,33,37,41:磁性
体膜、22,26,30,34,38:導体、4
2,43,44,45:外部端子、51,54,
61,66,73,75:磁性体膜、52,5
6,62,63,69,70,74:導体、7
7,78,79,80:外部端子。
FIG. 1 is a front view showing an example of an apparatus for carrying out the method of the present invention, and FIGS.
FIG. 7 is a perspective view of a completed multilayer transformer, FIG. 8 is an equivalent circuit diagram, and FIGS. 9 to 18 are plan views showing the sequential steps of the second embodiment of the present invention. Plan views shown in Figures 19 to 28
29 is a side view of a completed rotor combined with a stator, and FIG. 30 is an equivalent circuit diagram of FIG. 29. In the figure, the main members are as follows. 1, 8, 9, 16: magnetic film, 2, 3, 10,
11: Conductor, 17, 18, 19, 20: External terminal, 21, 25, 29, 33, 37, 41: Magnetic film, 22, 26, 30, 34, 38: Conductor, 4
2, 43, 44, 45: external terminal, 51, 54,
61, 66, 73, 75: magnetic film, 52, 5
6, 62, 63, 69, 70, 74: Conductor, 7
7, 78, 79, 80: External terminals.
Claims (1)
2組の金属導体とをスパツタリング法により交互
に積層し、その際に前記各組の導体は前記磁性体
層の間から間へと連続して周回する一本のコイル
状の導電路を構成するようにし、次いで前記導体
の末端に接続する外部端子を積層体の外面に設け
ることを特徴とする積層トランスの製造方法。1. An insulating oxide magnetic layer and at least two sets of metal conductors are alternately laminated on a substrate by a sputtering method, and at that time, the conductors of each set are continuously stacked from between the magnetic layers. 1. A method of manufacturing a laminated transformer, comprising forming a single coil-shaped conductive path that circulates around the conductor, and then providing an external terminal connected to an end of the conductor on the outer surface of the laminated body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4687980A JPS56144513A (en) | 1980-04-11 | 1980-04-11 | Manufacture of laminated transformer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4687980A JPS56144513A (en) | 1980-04-11 | 1980-04-11 | Manufacture of laminated transformer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56144513A JPS56144513A (en) | 1981-11-10 |
JPS6248886B2 true JPS6248886B2 (en) | 1987-10-16 |
Family
ID=12759636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4687980A Granted JPS56144513A (en) | 1980-04-11 | 1980-04-11 | Manufacture of laminated transformer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56144513A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5922304A (en) * | 1982-07-28 | 1984-02-04 | Tdk Corp | Laminated transformer |
JPH0453213A (en) * | 1990-06-20 | 1992-02-20 | Sansha Electric Mfg Co Ltd | Winding of high frequency transformer, etc., and manufacture thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4930861A (en) * | 1972-07-21 | 1974-03-19 | ||
JPS5036013A (en) * | 1973-07-11 | 1975-04-04 |
-
1980
- 1980-04-11 JP JP4687980A patent/JPS56144513A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4930861A (en) * | 1972-07-21 | 1974-03-19 | ||
JPS5036013A (en) * | 1973-07-11 | 1975-04-04 |
Also Published As
Publication number | Publication date |
---|---|
JPS56144513A (en) | 1981-11-10 |
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