JPS6248380B2 - - Google Patents
Info
- Publication number
- JPS6248380B2 JPS6248380B2 JP56210182A JP21018281A JPS6248380B2 JP S6248380 B2 JPS6248380 B2 JP S6248380B2 JP 56210182 A JP56210182 A JP 56210182A JP 21018281 A JP21018281 A JP 21018281A JP S6248380 B2 JPS6248380 B2 JP S6248380B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- wiring
- thickness
- insulating film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/022—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56210182A JPS58115834A (ja) | 1981-12-29 | 1981-12-29 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56210182A JPS58115834A (ja) | 1981-12-29 | 1981-12-29 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58115834A JPS58115834A (ja) | 1983-07-09 |
| JPS6248380B2 true JPS6248380B2 (enrdf_load_stackoverflow) | 1987-10-13 |
Family
ID=16585134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56210182A Granted JPS58115834A (ja) | 1981-12-29 | 1981-12-29 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58115834A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61196555A (ja) * | 1985-02-26 | 1986-08-30 | Nec Corp | 多層配線の形成方法 |
| JPS6324643A (ja) * | 1986-07-17 | 1988-02-02 | Nec Kyushu Ltd | 半導体装置の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5425178A (en) * | 1977-07-27 | 1979-02-24 | Fujitsu Ltd | Manufacture for semiconductor device |
| JPS54103674A (en) * | 1978-02-01 | 1979-08-15 | Nec Corp | Production of semiconductor device |
-
1981
- 1981-12-29 JP JP56210182A patent/JPS58115834A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58115834A (ja) | 1983-07-09 |