JPS6245307B2 - - Google Patents
Info
- Publication number
- JPS6245307B2 JPS6245307B2 JP2926383A JP2926383A JPS6245307B2 JP S6245307 B2 JPS6245307 B2 JP S6245307B2 JP 2926383 A JP2926383 A JP 2926383A JP 2926383 A JP2926383 A JP 2926383A JP S6245307 B2 JPS6245307 B2 JP S6245307B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- reaction tube
- plasma
- wafer
- negative electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001947 vapour-phase growth Methods 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims 1
- 230000010355 oscillation Effects 0.000 description 5
- 239000012495 reaction gas Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 235000013842 nitrous oxide Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2926383A JPS59156426A (ja) | 1983-02-25 | 1983-02-25 | プラズマ気相成長装置のプラズマ発生用電極 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2926383A JPS59156426A (ja) | 1983-02-25 | 1983-02-25 | プラズマ気相成長装置のプラズマ発生用電極 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59156426A JPS59156426A (ja) | 1984-09-05 |
| JPS6245307B2 true JPS6245307B2 (enrdf_load_stackoverflow) | 1987-09-25 |
Family
ID=12271389
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2926383A Granted JPS59156426A (ja) | 1983-02-25 | 1983-02-25 | プラズマ気相成長装置のプラズマ発生用電極 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59156426A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01111109U (enrdf_load_stackoverflow) * | 1988-01-20 | 1989-07-26 |
-
1983
- 1983-02-25 JP JP2926383A patent/JPS59156426A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01111109U (enrdf_load_stackoverflow) * | 1988-01-20 | 1989-07-26 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59156426A (ja) | 1984-09-05 |
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