JPS6240310B2 - - Google Patents
Info
- Publication number
- JPS6240310B2 JPS6240310B2 JP5171280A JP5171280A JPS6240310B2 JP S6240310 B2 JPS6240310 B2 JP S6240310B2 JP 5171280 A JP5171280 A JP 5171280A JP 5171280 A JP5171280 A JP 5171280A JP S6240310 B2 JPS6240310 B2 JP S6240310B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- ion exchange
- treatment
- less
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 34
- 238000005342 ion exchange Methods 0.000 claims description 13
- 238000011282 treatment Methods 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 9
- 238000005498 polishing Methods 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 5
- 238000004381 surface treatment Methods 0.000 claims description 5
- 239000010730 cutting oil Substances 0.000 claims 1
- 239000002173 cutting fluid Substances 0.000 description 9
- 229910000420 cerium oxide Inorganic materials 0.000 description 8
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 8
- 239000002480 mineral oil Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 235000010446 mineral oil Nutrition 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 239000005341 toughened glass Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010685 fatty oil Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- JPJALAQPGMAKDF-UHFFFAOYSA-N selenium dioxide Chemical compound O=[Se]=O JPJALAQPGMAKDF-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5171280A JPS56149349A (en) | 1980-04-21 | 1980-04-21 | Surface treatment of glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5171280A JPS56149349A (en) | 1980-04-21 | 1980-04-21 | Surface treatment of glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56149349A JPS56149349A (en) | 1981-11-19 |
| JPS6240310B2 true JPS6240310B2 (fa) | 1987-08-27 |
Family
ID=12894498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5171280A Granted JPS56149349A (en) | 1980-04-21 | 1980-04-21 | Surface treatment of glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56149349A (fa) |
-
1980
- 1980-04-21 JP JP5171280A patent/JPS56149349A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56149349A (en) | 1981-11-19 |
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