JPS6239813B2 - - Google Patents

Info

Publication number
JPS6239813B2
JPS6239813B2 JP9384381A JP9384381A JPS6239813B2 JP S6239813 B2 JPS6239813 B2 JP S6239813B2 JP 9384381 A JP9384381 A JP 9384381A JP 9384381 A JP9384381 A JP 9384381A JP S6239813 B2 JPS6239813 B2 JP S6239813B2
Authority
JP
Japan
Prior art keywords
pattern
corner
signals
binary
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9384381A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57210627A (en
Inventor
Yasuhiko Hara
Keiichi Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9384381A priority Critical patent/JPS57210627A/ja
Publication of JPS57210627A publication Critical patent/JPS57210627A/ja
Publication of JPS6239813B2 publication Critical patent/JPS6239813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP9384381A 1981-06-19 1981-06-19 Detecting method for defect of pattern Granted JPS57210627A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9384381A JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9384381A JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Publications (2)

Publication Number Publication Date
JPS57210627A JPS57210627A (en) 1982-12-24
JPS6239813B2 true JPS6239813B2 (xx) 1987-08-25

Family

ID=14093675

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9384381A Granted JPS57210627A (en) 1981-06-19 1981-06-19 Detecting method for defect of pattern

Country Status (1)

Country Link
JP (1) JPS57210627A (xx)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (xx) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131469A (xx) * 1974-04-03 1975-10-17
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus

Also Published As

Publication number Publication date
JPS57210627A (en) 1982-12-24

Similar Documents

Publication Publication Date Title
US4776023A (en) Pattern inspection method
US4589139A (en) Apparatus for detecting defects in pattern
US4547895A (en) Pattern inspection system
EP0117559A2 (en) Pattern checking apparatus
JPH0621769B2 (ja) パタ−ン欠陥検出方法およびその装置
US6456318B1 (en) Defect inspection apparatus and method by comparing two pairs of areas adjacent to one another
US6643394B1 (en) Visual inspection apparatus and method
US4472738A (en) Pattern testing apparatus
JPS5924361B2 (ja) ２次元画像比較検査装置
JPS6239813B2 (xx)
JP3207931B2 (ja) 画像検査装置
JPH0727708A (ja) ウエハの欠陥検査方法
JPH0160766B2 (xx)
JP3116438B2 (ja) プリント配線基板の検査装置および検査方法
JPS6057929A (ja) パターン欠陥検出装置
JP3684707B2 (ja) レチクルパターン検査方法
JP2765339B2 (ja) スルーホール検査装置
JPS6160635B2 (xx)
JPS5860538A (ja) パタ−ン検査方法
JPS59167782A (ja) ２次元画像比較検査装置
JPS63177276A (ja) 画像情報の伝送ノイズ検出方法
JPH0417361B2 (xx)
JPH0325357A (ja) 画像欠陥検出方法
JPH0410565B2 (xx)
JPH0480427B2 (xx)