JPS6237530B2 - - Google Patents

Info

Publication number
JPS6237530B2
JPS6237530B2 JP53088937A JP8893778A JPS6237530B2 JP S6237530 B2 JPS6237530 B2 JP S6237530B2 JP 53088937 A JP53088937 A JP 53088937A JP 8893778 A JP8893778 A JP 8893778A JP S6237530 B2 JPS6237530 B2 JP S6237530B2
Authority
JP
Japan
Prior art keywords
pattern
film
metal
etching
spacer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53088937A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5516423A (en
Inventor
Toshiki Kadota
Akira Ozawa
Toshiro Ono
Seitaro Matsuo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8893778A priority Critical patent/JPS5516423A/ja
Publication of JPS5516423A publication Critical patent/JPS5516423A/ja
Publication of JPS6237530B2 publication Critical patent/JPS6237530B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8893778A 1978-07-22 1978-07-22 Forming method of thick metal film pattern Granted JPS5516423A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8893778A JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8893778A JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Publications (2)

Publication Number Publication Date
JPS5516423A JPS5516423A (en) 1980-02-05
JPS6237530B2 true JPS6237530B2 (enrdf_load_stackoverflow) 1987-08-13

Family

ID=13956791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8893778A Granted JPS5516423A (en) 1978-07-22 1978-07-22 Forming method of thick metal film pattern

Country Status (1)

Country Link
JP (1) JPS5516423A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3119682A1 (de) * 1981-05-18 1982-12-02 Philips Patentverwaltung Gmbh, 2000 Hamburg "verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels strahlungslithographie"
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
JPH0682727B2 (ja) * 1986-02-18 1994-10-19 ホ−ヤ株式会社 検査用基板とその製造方法
JPH0795506B2 (ja) * 1986-12-19 1995-10-11 株式会社日立製作所 Ｘ線露光用マスクの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5633857B2 (enrdf_load_stackoverflow) * 1972-12-31 1981-08-06
JPS50132872A (enrdf_load_stackoverflow) * 1974-04-06 1975-10-21

Also Published As

Publication number Publication date
JPS5516423A (en) 1980-02-05

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