JPS6237529B2 - - Google Patents

Info

Publication number
JPS6237529B2
JPS6237529B2 JP60261110A JP26111085A JPS6237529B2 JP S6237529 B2 JPS6237529 B2 JP S6237529B2 JP 60261110 A JP60261110 A JP 60261110A JP 26111085 A JP26111085 A JP 26111085A JP S6237529 B2 JPS6237529 B2 JP S6237529B2
Authority
JP
Japan
Prior art keywords
reticle
wafer
pattern
mirror
reference pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60261110A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61166027A (ja
Inventor
Shinji Kunyoshi
Akihiro Takanashi
Tsuneo Terasawa
Toshishige Kurosaki
Sumio Hosaka
Yoshio Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60261110A priority Critical patent/JPS61166027A/ja
Publication of JPS61166027A publication Critical patent/JPS61166027A/ja
Publication of JPS6237529B2 publication Critical patent/JPS6237529B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60261110A 1985-11-22 1985-11-22 縮小投影露光装置 Granted JPS61166027A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60261110A JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS61166027A JPS61166027A (ja) 1986-07-26
JPS6237529B2 true JPS6237529B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-08-13

Family

ID=17357223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60261110A Granted JPS61166027A (ja) 1985-11-22 1985-11-22 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS61166027A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136716U (ja) * 1991-06-12 1992-12-18 三菱農機株式会社 作業用走行車におけるアクセル機構の無人操作装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04136716U (ja) * 1991-06-12 1992-12-18 三菱農機株式会社 作業用走行車におけるアクセル機構の無人操作装置

Also Published As

Publication number Publication date
JPS61166027A (ja) 1986-07-26

Similar Documents

Publication Publication Date Title
US4402596A (en) Projection type exposure device
US4870452A (en) Projection exposure apparatus
US6016186A (en) Alignment device and method with focus detection system
JPS62188317A (ja) 位置合わせ方法
US4614432A (en) Pattern detector
US5448350A (en) Surface state inspection apparatus and exposure apparatus including the same
JPS6237529B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH10172900A (ja) 露光装置
JPH0612752B2 (ja) 投影式アライメント方法及びその装置
JPS60249325A (ja) 投影露光装置
JPS6018917A (ja) 投影露光装置
JP3448663B2 (ja) 投影露光装置
KR890011009A (ko) 반도체 집적회로 장치의 제조 방법 및 그것에 사용되는 노출장치
JPH079500B2 (ja) アライメント光学装置
JPH0344242B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR960026075A (ko) 웨이퍼 스텝퍼에서 정렬광의 경사조명에 의한 웨이퍼 정렬방법과 그 장치
JPH0562812B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2569442B2 (ja) アライメント装置
JPS5927526A (ja) 縮小投影露光装置
JPS6352767B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH01121703A (ja) アラインメント方法
JP2949328B2 (ja) 光露光方法
JPS61231719A (ja) パタ−ン検出装置
JPH03222343A (ja) パターン検査装置
JPS60194521A (ja) 縮小投影露光装置