JPS6233016Y2 - - Google Patents

Info

Publication number
JPS6233016Y2
JPS6233016Y2 JP1982030612U JP3061282U JPS6233016Y2 JP S6233016 Y2 JPS6233016 Y2 JP S6233016Y2 JP 1982030612 U JP1982030612 U JP 1982030612U JP 3061282 U JP3061282 U JP 3061282U JP S6233016 Y2 JPS6233016 Y2 JP S6233016Y2
Authority
JP
Japan
Prior art keywords
etching
liquid
solution
tank
seal block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982030612U
Other languages
English (en)
Japanese (ja)
Other versions
JPS58135465U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3061282U priority Critical patent/JPS58135465U/ja
Publication of JPS58135465U publication Critical patent/JPS58135465U/ja
Application granted granted Critical
Publication of JPS6233016Y2 publication Critical patent/JPS6233016Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP3061282U 1982-03-03 1982-03-03 表面処理装置 Granted JPS58135465U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3061282U JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3061282U JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Publications (2)

Publication Number Publication Date
JPS58135465U JPS58135465U (ja) 1983-09-12
JPS6233016Y2 true JPS6233016Y2 (enrdf_load_stackoverflow) 1987-08-24

Family

ID=30042318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3061282U Granted JPS58135465U (ja) 1982-03-03 1982-03-03 表面処理装置

Country Status (1)

Country Link
JP (1) JPS58135465U (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS58135465U (ja) 1983-09-12

Similar Documents

Publication Publication Date Title
US5071488A (en) Method for subjecting an object to a liquid treatment
JPH04154122A (ja) 基板処理装置及び同方法
JPH04114777A (ja) 電子部品の乾燥方法
US4251317A (en) Method of preventing etch masking during wafer etching
JPS6233016Y2 (enrdf_load_stackoverflow)
JP3145080B2 (ja) 薄膜トランジスタ液晶ディスプレイ用ガラスの自動エッチング装置
JP3916003B2 (ja) 引き上げ式乾燥方法及び乾燥装置
JP2677275B2 (ja) 冷却媒体
JPH02130827A (ja) 半導体基板の洗浄方法およびそれに用いる洗浄装置
JPS6367735A (ja) 基体収容装置及び基体乾燥方法
GB1446636A (en) Treating a printed circuit board so that the conductive areas thereof have a substantially uniform coating of solder thereon
JPS58123730A (ja) 半導体ウエハ−エツチング装置
CN214716773U (zh) 一种加热均匀的低温恒温反应浴
CN218175110U (zh) 材料表面处理装置
JP2003273054A (ja) 液晶表示装置の製造方法
JPH0322427A (ja) 半導体基板乾燥方法
CN211867583U (zh) 多个方片式衬底用工艺夹具
JPS55138714A (en) Manufacture of liquid crystal cell
CN207996607U (zh) 一种耐高温长寿命球形锰酸锂生产用高速分散机
JPH02142129A (ja) ウエハの前処理方法
JPS60234975A (ja) 板状物の浸漬処理方法
TWI286799B (en) Method and apparatus for treating a substrate surface by bubbling
Toko et al. Electrical characteristics in an excitable element of lipid membrane
CN119480800A (zh) 一种含能器件基座结构及其制备方法
JPH067611A (ja) 被洗浄物の水分分離方法