JPS6231071B2 - - Google Patents

Info

Publication number
JPS6231071B2
JPS6231071B2 JP57134124A JP13412482A JPS6231071B2 JP S6231071 B2 JPS6231071 B2 JP S6231071B2 JP 57134124 A JP57134124 A JP 57134124A JP 13412482 A JP13412482 A JP 13412482A JP S6231071 B2 JPS6231071 B2 JP S6231071B2
Authority
JP
Japan
Prior art keywords
etching
silicon
sio
plasma
dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57134124A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5923875A (ja
Inventor
Yoshitsugu Nishimoto
Shingo Kadomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP13412482A priority Critical patent/JPS5923875A/ja
Publication of JPS5923875A publication Critical patent/JPS5923875A/ja
Publication of JPS6231071B2 publication Critical patent/JPS6231071B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP13412482A 1982-07-30 1982-07-30 ドライエツチング方法 Granted JPS5923875A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13412482A JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13412482A JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Publications (2)

Publication Number Publication Date
JPS5923875A JPS5923875A (ja) 1984-02-07
JPS6231071B2 true JPS6231071B2 (OSRAM) 1987-07-06

Family

ID=15121020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13412482A Granted JPS5923875A (ja) 1982-07-30 1982-07-30 ドライエツチング方法

Country Status (1)

Country Link
JP (1) JPS5923875A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63183077U (OSRAM) * 1987-05-19 1988-11-25
JPH0162723U (OSRAM) * 1987-10-14 1989-04-21
JPH01257439A (ja) * 1987-07-17 1989-10-13 Nippon Flour Mills Co Ltd パスタ類、麺類の調理方法および調理用耐熱容器、包装麺類

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2654003B2 (ja) * 1986-06-30 1997-09-17 株式会社東芝 ドライエツチング方法
US20060017043A1 (en) * 2004-07-23 2006-01-26 Dingjun Wu Method for enhancing fluorine utilization

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5565364A (en) * 1978-11-08 1980-05-16 Toshiba Corp Etching method
US4264409A (en) * 1980-03-17 1981-04-28 International Business Machines Corporation Contamination-free selective reactive ion etching or polycrystalline silicon against silicon dioxide

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63183077U (OSRAM) * 1987-05-19 1988-11-25
JPH01257439A (ja) * 1987-07-17 1989-10-13 Nippon Flour Mills Co Ltd パスタ類、麺類の調理方法および調理用耐熱容器、包装麺類
JPH0162723U (OSRAM) * 1987-10-14 1989-04-21

Also Published As

Publication number Publication date
JPS5923875A (ja) 1984-02-07

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