JPS62297476A - 塩化銅エツチング廃液の再生方法及び再生装置 - Google Patents
塩化銅エツチング廃液の再生方法及び再生装置Info
- Publication number
- JPS62297476A JPS62297476A JP14173186A JP14173186A JPS62297476A JP S62297476 A JPS62297476 A JP S62297476A JP 14173186 A JP14173186 A JP 14173186A JP 14173186 A JP14173186 A JP 14173186A JP S62297476 A JPS62297476 A JP S62297476A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- etching waste
- waste liquid
- soln
- copper chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title claims abstract description 81
- 239000002699 waste material Substances 0.000 title claims abstract description 77
- 238000000034 method Methods 0.000 title claims abstract description 26
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 title claims abstract description 18
- 230000001172 regenerating effect Effects 0.000 title claims description 15
- 239000010949 copper Substances 0.000 claims abstract description 46
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052802 copper Inorganic materials 0.000 claims abstract description 38
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910001431 copper ion Inorganic materials 0.000 claims abstract description 19
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 16
- 239000003085 diluting agent Substances 0.000 claims abstract description 14
- 239000012895 dilution Substances 0.000 claims abstract description 14
- 238000010790 dilution Methods 0.000 claims abstract description 14
- 238000002156 mixing Methods 0.000 claims abstract description 12
- 229910001514 alkali metal chloride Inorganic materials 0.000 claims abstract description 7
- 239000007788 liquid Substances 0.000 claims description 71
- 239000000243 solution Substances 0.000 claims description 35
- 229910000831 Steel Inorganic materials 0.000 claims description 30
- 239000010959 steel Substances 0.000 claims description 30
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 27
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 10
- 238000007865 diluting Methods 0.000 claims description 5
- 239000011780 sodium chloride Substances 0.000 claims description 5
- 239000003792 electrolyte Substances 0.000 claims description 3
- 150000001805 chlorine compounds Chemical class 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000002244 precipitate Substances 0.000 claims 1
- 239000000460 chlorine Substances 0.000 abstract description 8
- 239000000203 mixture Substances 0.000 abstract description 8
- 229910052801 chlorine Inorganic materials 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 7
- 239000002184 metal Substances 0.000 abstract description 7
- 230000033116 oxidation-reduction process Effects 0.000 abstract description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 5
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 abstract 1
- 238000011069 regeneration method Methods 0.000 description 19
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 230000008929 regeneration Effects 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011259 mixed solution Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- -1 chlorine ions Chemical class 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000001376 precipitating effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 241001454694 Clupeiformes Species 0.000 description 1
- 235000019513 anchovy Nutrition 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical group I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Electrolytic Production Of Metals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14173186A JPS62297476A (ja) | 1986-06-17 | 1986-06-17 | 塩化銅エツチング廃液の再生方法及び再生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14173186A JPS62297476A (ja) | 1986-06-17 | 1986-06-17 | 塩化銅エツチング廃液の再生方法及び再生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62297476A true JPS62297476A (ja) | 1987-12-24 |
JPS6353267B2 JPS6353267B2 (enrdf_load_stackoverflow) | 1988-10-21 |
Family
ID=15298898
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14173186A Granted JPS62297476A (ja) | 1986-06-17 | 1986-06-17 | 塩化銅エツチング廃液の再生方法及び再生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62297476A (enrdf_load_stackoverflow) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04285182A (ja) * | 1990-11-16 | 1992-10-09 | Macdermid Inc | アンモニア性塩化物エッチング剤の改良再生法 |
JPH04314899A (ja) * | 1990-11-16 | 1992-11-06 | Macdermid Inc | 廃物浴から重金属を電解採取する方法及び装置 |
WO2012163238A1 (zh) * | 2011-05-31 | 2012-12-06 | 无锡尚德太阳能电力有限公司 | 处理已使用蚀刻液的再循环系统及方法 |
CN103422154A (zh) * | 2012-05-24 | 2013-12-04 | 叶福祥 | 电路板酸性废蚀刻液氯化亚铜(Cu+,CuCL)离子隔膜电积再生 |
CN103757635A (zh) * | 2013-12-13 | 2014-04-30 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN105177584A (zh) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | 一种具有再生液处理功能的酸性蚀刻废液循环再生系统 |
-
1986
- 1986-06-17 JP JP14173186A patent/JPS62297476A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04285182A (ja) * | 1990-11-16 | 1992-10-09 | Macdermid Inc | アンモニア性塩化物エッチング剤の改良再生法 |
JPH04314899A (ja) * | 1990-11-16 | 1992-11-06 | Macdermid Inc | 廃物浴から重金属を電解採取する方法及び装置 |
WO2012163238A1 (zh) * | 2011-05-31 | 2012-12-06 | 无锡尚德太阳能电力有限公司 | 处理已使用蚀刻液的再循环系统及方法 |
CN103422154A (zh) * | 2012-05-24 | 2013-12-04 | 叶福祥 | 电路板酸性废蚀刻液氯化亚铜(Cu+,CuCL)离子隔膜电积再生 |
CN103757635A (zh) * | 2013-12-13 | 2014-04-30 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN103757635B (zh) * | 2013-12-13 | 2016-11-23 | 陶克(苏州)机械设备有限公司 | 电解槽及使用该电解槽的再生酸性蚀刻液设备及再生方法 |
CN105177584A (zh) * | 2015-09-09 | 2015-12-23 | 成都虹华环保科技股份有限公司 | 一种具有再生液处理功能的酸性蚀刻废液循环再生系统 |
Also Published As
Publication number | Publication date |
---|---|
JPS6353267B2 (enrdf_load_stackoverflow) | 1988-10-21 |
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