JPS6229032A - 高安定フイ−ルドエミツタ−の製造方法 - Google Patents
高安定フイ−ルドエミツタ−の製造方法Info
- Publication number
- JPS6229032A JPS6229032A JP60168727A JP16872785A JPS6229032A JP S6229032 A JPS6229032 A JP S6229032A JP 60168727 A JP60168727 A JP 60168727A JP 16872785 A JP16872785 A JP 16872785A JP S6229032 A JPS6229032 A JP S6229032A
- Authority
- JP
- Japan
- Prior art keywords
- emitter
- field emitter
- surface treatment
- treatment
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000004381 surface treatment Methods 0.000 claims description 18
- 239000013078 crystal Substances 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 15
- 230000005684 electric field Effects 0.000 claims description 12
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 150000002430 hydrocarbons Chemical class 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 4
- 230000001747 exhibiting effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Landscapes
- Carbon And Carbon Compounds (AREA)
- Cold Cathode And The Manufacture (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60168727A JPS6229032A (ja) | 1985-07-31 | 1985-07-31 | 高安定フイ−ルドエミツタ−の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60168727A JPS6229032A (ja) | 1985-07-31 | 1985-07-31 | 高安定フイ−ルドエミツタ−の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6229032A true JPS6229032A (ja) | 1987-02-07 |
JPH0533487B2 JPH0533487B2 (enrdf_load_stackoverflow) | 1993-05-19 |
Family
ID=15873302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60168727A Granted JPS6229032A (ja) | 1985-07-31 | 1985-07-31 | 高安定フイ−ルドエミツタ−の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6229032A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009300070A (ja) * | 2008-06-11 | 2009-12-24 | Kingtec Korea Co Ltd | ジャケット型個人冷房装置 |
-
1985
- 1985-07-31 JP JP60168727A patent/JPS6229032A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009300070A (ja) * | 2008-06-11 | 2009-12-24 | Kingtec Korea Co Ltd | ジャケット型個人冷房装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0533487B2 (enrdf_load_stackoverflow) | 1993-05-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7829377B2 (en) | Diamond medical devices | |
JPH02504444A (ja) | 集中イオンビームを使用する金属化学蒸着用の選択エリア核および成長方法 | |
US20090214169A1 (en) | Structures formed in diamond | |
EP1842227A2 (en) | Diamond medical devices | |
JPS6229032A (ja) | 高安定フイ−ルドエミツタ−の製造方法 | |
JPH06115915A (ja) | 新炭素材料の製造方法 | |
JPS6280938A (ja) | チタン化合物フイ−ルドエミツタ−の製造方法 | |
JPS5982732A (ja) | 半導体装置の製造方法 | |
JPS62222633A (ja) | 半導体素子の製造方法 | |
JP3438038B2 (ja) | 電子放出陰極およびその製造方法 | |
JPS61190830A (ja) | チタンオキシカーバイドエミッターの製造方法 | |
JPS6280937A (ja) | 高性能フイ−ルドエミツタ−の製造方法 | |
JPH0461724A (ja) | 炭化ニオブフィールドエミッターの作製方法 | |
JPS6280936A (ja) | フイ−ルドエミツタ−の製造方法 | |
DE69704539T2 (de) | Verfahren zur Behandlung der Oberfläche eines Silizium-Einkristalles und Verfahren zur Herstellung einer Dünnschicht aus monokristallinem Silizium | |
JPS58209844A (ja) | 電界電離型イオン源 | |
JPS61153918A (ja) | 高安定電子放射特性を示すフイ−ルドエミツタ−の製造方法 | |
JPS6091528A (ja) | 遷移金属化合物からなるフイ−ルド・エミツタ− | |
JP2562921B2 (ja) | 気相法ダイヤモンドの合成方法 | |
JPS59148230A (ja) | イオン源用チツプの製造方法 | |
KR19990051970A (ko) | 실리콘 발광소자의 적외선 발광층 형성방법 | |
JPH0590155A (ja) | 単結晶薄膜の製造装置及び製造方法 | |
SU763841A1 (ru) | Способ получени бессеребр ных изображений | |
JPH0418408B2 (enrdf_load_stackoverflow) | ||
EP4367300A1 (de) | Verfahren zur herstellung eines optisch adressierbaren farbzentrums |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |